Abstract: The invention relates to a method for removing at least one constituent from a solution, comprising:—forming a liquid mixture by bringing together said solution (1) and a particulate seed material (6) under conditions or in the presence of one or more substances which cause the constituent to be removed to crystallize out on the surface of the seed material; and—separating the seed material having the constituent to be removed crystallized out thereon from the liquid mixture by passing the liquid mixture through a filter (3), wherein the pore size of the filter (3) is greater than or equal to the particle size of the seed material (6). The invention also relates to a method for preparing a particulate material wherein use is made of the method according to the present invention. The invention also relates to the particulate material obtainable by this method. The invention further relates to an apparatus that can be used in the process of the present invention.

Abstract: A method for forming raised source and drain regions in a semiconductor manufacturing process employs double disposable spacers. A deposited oxide is provided between the first and second disposable spacers, and serves to protect the gate electrode, first disposable spacers and a cap layer during the dry etching of the larger, second disposable spacers. Mouse ears are thereby prevented, while the use of a second disposable spacer avoids shadow-effects during halo ion-implants.