Patents by Inventor Johannes Paul Marie DE LA ROSETTE

Johannes Paul Marie DE LA ROSETTE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Measurement substrate and a measurement method
    Patent number: 10508896
    Abstract: A measurement substrate for measuring a condition pertaining in an apparatus for processing production substrates during operation thereof, the measurement substrate including: a body having dimensions compatible with the apparatus; a plurality of sensor modules embedded in the body, each sensor module having: a sensor configured generate an analog measurement signal, an analog to digital converter to generate digital measurement information from the analog measurement signal, and a module controller configured to output the digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and to communicate the digital measurement information to an external device.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: December 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Stoyan Nihtianov, Ruud Hendrikus Martinus Johannes Bloks, Johannes Paul Marie De La Rosette, Thibault Simon Mathieu Laurent, Kofi Afolabi Anthony Makinwa, Patricius Jacobus Neefs, Johannes Petrus Martinus Bernardus Vermeulen
  • Lithographic apparatus
    Patent number: 10268128
    Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: April 23, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Johannes Joseph Janssen, Johannes Paul Marie De La Rosette, Edwin Cornelis Kadijk, Nicolas Alban Lallemant, Jan Liefooghe, Markus Rolf Werner Matthes, Marcel Johannus Elisabeth Hubertus Muitjens, Hubert Matthieu Richard Steijns, André Gillis Van De Velde, Marinus Aart Van Den Brink
  • MEASUREMENT SUBSTRATE AND A MEASUREMENT METHOD
    Publication number: 20180340767
    Abstract: A measurement substrate for measuring a condition pertaining in an apparatus for processing production substrates during operation thereof, the measurement substrate including: a body having dimensions compatible with the apparatus; a plurality of sensor modules embedded in the body, each sensor module having: a sensor configured generate an analog measurement signal, an analog to digital converter to generate digital measurement information from the analog measurement signal, and a module controller configured to output the digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and to communicate the digital measurement information to an external device.
    Type: Application
    Filed: November 23, 2016
    Publication date: November 29, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stoyan NIHTIANOV, Ruud Hendrikus Martinus Johannes BLOKS, Johannes Paul Marie DE LA ROSETTE, Thibault Simon Mathieu LAURENT, Kofi Afoiabi MAKINWA, Jacobus NEEFS, Johannes Petrus Martinus Bernardus VERMEULEN
  • Lithographic Apparatus
    Publication number: 20180196361
    Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.
    Type: Application
    Filed: June 14, 2016
    Publication date: July 12, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Franciscus Johannes Joseph JANSSEN, Johannes Paul Marie DE LA ROSETTE, Edwin Cornelis KADIJK, Nicolas Alban LALLEMANT, Jan LIEFOOGHE, Markus Rolf Werner MATTHES, Marcel Johannus Elisabeth MUITJENS, Hubert Matthieu Richard STEIJNS, André Gillis VAN DE VELDE, Marinus Aart VAN DEN BRINK