Patents by Inventor Johannes Peterus Henricus De Kuster

Johannes Peterus Henricus De Kuster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for manufacturing a pellicle, and a pellicle
    Patent number: 10365558
    Abstract: An apparatus for manufacturing a pellicle, the apparatus comprising: a stressing assembly for stressing a film; and a substrate support for supporting a substrate, the stressing assembly and the substrate support being capable of relative movement so as to bring the substrate into contact with the film when the film is stressed.
    Type: Grant
    Filed: November 19, 2014
    Date of Patent: July 30, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Mathijs Marinus Jansen, Juan Diego Arias Espinoza, Johannes Peterus Henricus De Kuster
  • Apparatus and Method for Manufacturing a Pellicle, and a Pellicle
    Publication number: 20160313637
    Abstract: An apparatus for manufacturing a pellicle, the apparatus comprising: a stressing assembly for stressing a film; and a substrate support for supporting a substrate, the stressing assembly and the substrate support being capable of relative movement so as to bring the substrate into contact with the film when the film is stressed.
    Type: Application
    Filed: November 19, 2014
    Publication date: October 27, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Mathijs Marinus Jansen, Juan Diego Arias Espinoza, Johannes Peterus Henricus De Kuster
  • Lithographic apparatus, and device manufacturing method
    Patent number: 7928412
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Grant
    Filed: March 17, 2009
    Date of Patent: April 19, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van der Velden, Wouter Anthon Soer, Thomas Stein, Kurt Gielissen
  • Lithographic apparatus, and device manufacturing method
    Patent number: 7629594
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: December 8, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van Der Velden, Wouter Anthon Soer, Thomas Stein, Kurt Gielissen
  • Lithographic Apparatus, and Device Manufacturing Method
    Publication number: 20090173360
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Application
    Filed: March 17, 2009
    Publication date: July 9, 2009
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Maarten Marinus Johannes Wilhelmus VAN HERPEN, Vadim Yevgenyevich BANINE, Johannes Peterus Henricus DE KUSTER, Johannes Hubertus Josephina MOORS, Lucas Henricus Johannes STEVENS, Bastiaan Theodoor WOLSCHRIJN, Yurii Victorovitch SIDELNIKOV, Marc Hubertus Lorenz VAN DER VELDEN, Wouter Anthon SOER, Thomas STEIN, Kurt Gielissen
  • Lithographic apparatus, and device manufacturing method
    Publication number: 20080083885
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Application
    Filed: October 10, 2006
    Publication date: April 10, 2008
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van Der Velden, Wouter Anton Soer, Thomas Stein, Kurt Gielissen
  • Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus
    Patent number: 7167232
    Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.
    Type: Grant
    Filed: December 30, 2003
    Date of Patent: January 23, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans, Lucas Henricus Johannes Stevens