Patents by Inventor Johannes Petrus Maria Smeulers

Johannes Petrus Maria Smeulers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110273675
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: July 19, 2011
    Publication date: November 10, 2011
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelius Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens
  • Turbo machine and method to reduce vibration in turbo machines
    Publication number: 20110255953
    Abstract: A turbo machine (1) comprises a casing (2) and a first volute tongue (12), an impeller (3) with at least one vane (4), and a flow splitter plate (5) comprising a second volute tongue (13) for splitting a flow of a fluidic medium produced by the impeller. The flow splitter plate comprises at least one opening (10) connecting the first surface (8) and the second, opposite surface (9) so as to reduce or eliminate vibrations.
    Type: Application
    Filed: October 27, 2009
    Publication date: October 20, 2011
    Applicant: Nederlandse Organisatie voor toegepastnatuurwetenscappelijk onderzoek TNO
    Inventor: Johannes Petrus Maria Smeulers
  • Lithographic apparatus and device manufacturing method
    Patent number: 8031325
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: March 1, 2010
    Date of Patent: October 4, 2011
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110051107
    Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
    Type: Application
    Filed: November 9, 2010
    Publication date: March 3, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stefan Philip Christiaan BELFROID, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Johannes Petrus Maria Smeulers, Arno Willem Frederik Volker, Rene Breeuwer
  • LITHOGRAPHIC APPARATUS
    Publication number: 20100321653
    Abstract: A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
    Type: Application
    Filed: August 31, 2010
    Publication date: December 23, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Joost Jeroen Ottens, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov
  • Lithographic apparatus and device manufacturing method
    Patent number: 7852457
    Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: December 14, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Philip Christiaan Belfroid, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Johannes Petrus Maria Smeulers, Arno Willem Frederik Volker, Rene Breeuwer
  • Lithographic apparatus
    Patent number: 7804577
    Abstract: A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: September 28, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Joost Jeroen Ottens, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov
  • CONTROLLED FORMATION OF HYDRATES
    Publication number: 20100180952
    Abstract: The invention relates to a method for reducing or avoiding deposition of a hydrocarbon hydrate on a surface that is in contact with a hydrocarbon flow which contains water, the method comprising controlling the nucleation of dry hydrocarbon hydrate crystals in the flow. The invention further relates to a method for transporting a hydrocarbon flow which contains a hydrocarbon hydrate and to a method for preparing a dry hydrocarbon hydrate.
    Type: Application
    Filed: August 21, 2007
    Publication date: July 22, 2010
    Applicant: NEDERLANDS ORGANISATIE VOOR TOEGPAST-NATUURWETENS ONDERZOEK TNO
    Inventors: Frédérique José Paul Christian Marie Ghislain Verhelst, Aris Twerda, Johannes Petrus Maria Smeulers, Marinus Carolus Adrianus Maria Peters, Stefan Philip Christiaan Belfroid, Wouter Schiferli
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100149514
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: March 1, 2010
    Publication date: June 17, 2010
    Applicants: ASML Netherlands B.V., ASML Holding NV
    Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Lithographic apparatus and device manufacturing method
    Patent number: 7701550
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: August 19, 2004
    Date of Patent: April 20, 2010
    Assignees: ASML Netherlands B.V., ASML Holding NV
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Lithographic apparatus
    Patent number: 7656501
    Abstract: A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface which faces the substrate. The extractor assembly includes a plate which splits the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and a meniscus is formed in a lower channel between the plate and the substrate.
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: February 2, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens, Johannes Petrus Maria Smeulers
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090303455
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: August 14, 2009
    Publication date: December 10, 2009
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens
  • Lithographic apparatus and device manufacturing method
    Patent number: 7602470
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: August 29, 2005
    Date of Patent: October 13, 2009
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christian Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Lithographic apparatus and device manufacturing method
    Publication number: 20090009734
    Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
    Type: Application
    Filed: June 20, 2008
    Publication date: January 8, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stefan Philip Christiaan Belfroid, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Johannes Petrus Maria Smeulers, Arno Willem Frederik Volker, Rene Breeuwer
  • Lithographic apparatus and device manufacturing method
    Patent number: 7414699
    Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: August 19, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Philip Christiaan Belfroid, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Johannes Petrus Maria Smeulers, Arno Willem Frederik Volker, Rene Breeuwer