Patents by Inventor Johannes Quaedackers

Johannes Quaedackers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method and substrate
    Publication number: 20070216883
    Abstract: An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.
    Type: Application
    Filed: March 20, 2006
    Publication date: September 20, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Quaedackers, Koen Van Ingen Schenau, Patrick Wong, Michel Franciscus Van Rooy
  • Method for exposing a substrate and lithographic projection apparatus
    Publication number: 20070099100
    Abstract: A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally distributed function, wherein the effective probability density function of the first apparatus is substantially similar to the probability density function of the second apparatus.
    Type: Application
    Filed: October 18, 2006
    Publication date: May 3, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Jozef Finders, Johannes Quaedackers, Judocus Stoeldraijer, Johannes De Klerk, Alexander Serebryakov
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070046920
    Abstract: A lithographic apparatus having a controller that sets at lest one system parameter such that the difference between the critical dimension of pattern features formed on the substrate in regions of relatively high and relatively low pattern feature density is minimised for an area on the substrate on which a patterned beam of radiation is to be projected and which re-sets the at least one system parameter between a projection of the patterned radiation beam onto two areas of the substrate.
    Type: Application
    Filed: August 23, 2005
    Publication date: March 1, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Laan, Johannes Quaedackers
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060033898
    Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: August 17, 2005
    Publication date: February 16, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Cadee, Johannes Jacobs, Nicolaas Kate, Erik Loopstra, Aschwin Lodewijk Vermeer, Jeroen Maria Mertens, Christianus De Mol, Marcel Hubertus Muitjens, Antonius Van Der Net, Joost Ottens, Johannes Quaedackers, Maria Reuhman-Huisken, Marco Stavenga, Patricius Tinnemans, Martinus Verhagen, Jacobus Johannus Hendricus Verspay, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Smeets, Bart Schoondermark, Franciscus Janssen, Michel Riepen