Abstract: A measurement apparatus and method for determining a substrate grid describing a deformation of a substrate prior to exposure of the substrate in a lithographic apparatus configured to fabricate one or more features on the substrate. Position data for a plurality of first features and/or a plurality of second features on the substrate is obtained. Asymmetry data for at least a feature of the plurality of first features and/or the plurality of second features is obtained. The substrate grid based on the position data and the asymmetry data is determined. The substrate grid and asymmetry data are passed to the lithographic apparatus for controlling at least part of an exposure process to fabricate one or more features on the substrate.

Abstract: Method for depositing sliver formed of textile fibers in cycloidal loops in a rotating can, which includes feeding the sliver through a rotating funnel wheel having a guide canal formed therein with an opening extending toward the can, and rotating the funnel wheel with periodically changing angular velocity to reduce variation in silver deposit velocity and device for implementing the method.