Abstract: A process for the modification of a surface of a solid material, having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein the solid material has surface groups selected from C—OH, Si—OH, C?O and C—O—C groups and wherein the surface-modifying composition has at least a hydrosilane and at least one reactive compound (A) other than the hydrosilane, wherein the reactive compound (A) has at least two functional groups selected from (meth)acrylate, (meth)acrylamide, hydroxyl, carboxylic acid, alkene, alkyne and epoxy, and wherein the amount of hydrosilane in the composition ranges between 0.5 and 99 vol %, and wherein the vol % is determined at 20° C. relative to the total of the surface modifying composition. A solid material having a partial surface modification layer.

Abstract: A process for the modification of a surface of a solid material having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm, optionally in the presence of a photoinitiator, wherein the solid material is chosen from the group consisting of polyesters, polyethers, polycarbonates, polyketones polyamides, polyurethanes, (meth)acrylate and (meth)acrylamide polymers and polyetherimides and wherein the surface modifying composition includes at least a hydrosilane.

Abstract: A process for the modification of a surface of a solid material having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm, optionally in the presence of a photoinitiator, wherein the solid material is chosen from the group consisting of polyesters, polyethers, polycarbonates, polyketones polyamides, polyurethanes, (meth)acrylate and (meth)acrylamide polymers and polyetherimides and wherein the surface modifying composition includes at least a hydrosilane.

Abstract: A process for the modification of a surface of a solid material, having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein the solid material has surface groups selected from C—OH, Si—OH, C?O and C—O—C groups and wherein the surface-modifying composition has at least a hydrosilane and at least one reactive compound (A) other than the hydrosilane, wherein the reactive compound (A) has at least two functional groups selected from (meth)acrylate, (meth)acrylamide, hydroxyl, carboxylic acid, alkene, alkyne and epoxy, and wherein the amount of hydrosilane in the composition ranges between 0.5 and 99 vol %, and wherein the vol % is determined at 20° C. relative to the total of the surface modifying composition. A solid material having a partial surface modification layer.

Abstract: A process for the modification of a surface of a solid material, said solid material comprising a polymer material arranged at the surface of the solid material. Said process comprises the step of: contacting the polymer at the surface of the solid material with an oxygen source and a catalytic amount of a transition metal compound under such conditions that oxygen is incorporated into the polymer surface, wherein a hydroxy group is formed, which is attached to a carbon atom of the polymer.

Abstract: A process for the modification of a solid material, said process comprising contacting a surface of the solid material comprising nucleophilic groups with a hydrosilane in a first step to produce a hydrosilanized surface, and contacting said hydrosilanized surface with at least one alkene and/or alkyne under irradiation with visible and/or ultraviolet light in a second step.

Abstract: A process for the modification of a surface of a solid material, including the step of contacting the surface with a surface-modifying compound under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein a) the surface has Si—OH groups, C—OH groups or epoxy groups and the surface-modifying compound is a hydrosilane, or b) the surface has O—Si—H groups and the surface-modifying compound is a silanol or an alcohol.

Abstract: A process for the modification of a solid material, said process comprising contacting a surface of the solid material comprising nucleophilic groups with a hydrosilane in a first step to produce a hydrosilanized surface, and contacting said hydrosilanized surface with at least one alkene and/or alkyne under irradiation with visible and/or ultraviolet light in a second step.

Abstract: The present invention relates to a process for modifying or functionalizing oxide surfaces, such as surfaces of SiO2 and Al2O3, but also metals including alloys such as stainless steel with alkenes or alkynes under mild conditions by photochemical reaction. The process is very well suited to form patterned modified surfaces which are of use for example in microelectronics, biosensing and catalysis.

Abstract: The invention relates to a poly(arylsulfone), the poly(arylsulfone) having an aryl group grafted with a covalently attached substituent of the Formula (I): The invention also relates to a process for grafting a poly(arylsulfone), in the presence of an enzyme, for the preparation of said grafted poly(arylsulfone). The poly(arylsulfone) according to the invention shows beneficial properties for application in a membrane. The invention therefore further relates to a membrane comprising a poly(arylsulfone) according to the invention, and to the use of a poly(arylsulfone) according to the invention in a separation process. In addition, the invention relates to a polymer blend and a copolymer comprising a grafted poly(arylsulfone) according to the invention, and to a membrane comprising such polymer blend or copolymer.

Abstract: The invention relates to a poly(arylsulfone), the poly(arylsulfone) having an aryl group grafted with a covalently attached substituent of the Formula (I): The invention also relates to a process for grafting a poly(arylsulfone), in the presence of an enzyme, for the preparation of said grafted poly(arylsulfone). The poly(arylsulfone) according to the invention shows beneficial properties for application in a membrane. The invention therefore further relates to a membrane comprising a poly(arylsulfone) according to the invention, and to the use of a poly(arylsulfone) according to the invention in a separation process. In addition, the invention relates to a polymer blend and a copolymer comprising a grafted poly(arylsulfone) according to the invention, and to a membrane comprising such polymer blend or copolymer.

Abstract: The present invention relates to a process for preparing a functionalized Si/Ge-surface, wherein an unfunctionalised Si/Ge-surface is contacted in the presence of ultraviolet radiation with a C2-C50 alkene and/or a C2-C50 alkyne, the alkene and/or alkyne being optionally substituted and/or being optionally interrupted by one or more heteroatoms. The present invention further relates to articles or substrates comprising the functionalized Si/Ge-surface and the use of the functionalised Si/Ge-surface to prevent or to reduce adsorption of a biomolecule to an article or a substrate.

Abstract: The present invention relates to functionalized silicon and/or germanium surfaces, methods for the preparation of such tailor-made functionalized silicon and/or germanium surfaces, the use of such tailor-made functionalized silicon and/or germanium surfaces for the preparation of surface-bonded organic materials and the use in industrial devices. The silicon and/or germanium surfaces comprise silicon nitride, silicon carbide, germanium nitride, germanium carbide and silicon germanium surfaces.

Abstract: The present invention relates to a process for modifying or functionalizing oxide surfaces, such as surfaces of SiO2 and Al2O3, but also metals including alloys such as stainless steel with alkenes or alkynes under mild conditions by photochemical reaction. The process is very well suited to form patterned modified surfaces which are of use for example in microelectronics, biosensing and catalysis.

Abstract: The present invention relates to a process for preparing a functionalized Si/Ge-surface, wherein an unfunctionalised Si/Ge-surface is contacted in the presence of ultraviolet radiation with a C2-C50 alkene and/or a C2-C50 alkyne, and/or alkyne being optionally substituted and/or being optionally interrupted by one or more heteroatoms. The present invention further relates to articles or substrates comprising the functionalized Si/Ge-surface and the use of the functionalised Si/Ge-surface to prevent or to reduce adsorption of a biomolecule to an article or a substrate.

Abstract: The present invention relates to functionalized silicon and/or germanium surfaces, methods for the preparation of such tailor-made functionalized silicon and/or germanium surfaces, the use of such tailor-made functionalized silicon and/or germanium surfaces for the preparation of surface-bonded organic materials and the use in industrial devices. The silicon and/or germanium surfaces comprise silicon nitride, silicon carbide, germanium nitride, germanium carbide and silicon germanium surfaces.

Abstract: A method for patterning a polished silicon surface is disclosed, the method including steps leading to an organic monolayer on at least a part of the silicon surface, the monolayer being functionalized in specific desired locations. The method can be used to produce a device comprising one or more FET structures, the gate of the FET being formed by the functionalized organic monolayer. The functionalized monolayer preferably contains oligosaccharides or oligopeptides which are capable of interacting with biological substance, such that the device acts as a bio-sensor.