Abstract: The current invention relates to a system for fast and accurate filling of a two-phase cooling device, comprising a binding device (30) intended to be hermetically mounted onto the cooling device, the binding device (30) comprising a through-hole (32) able to be in fluid contact with the cooling device, said through-hole (32) being extending between a lower surface adapted to the cooling device's surface, and an essentially plane upper surface, the binding device (30) further comprising a gripping head essentially level with said upper surface, allowing for a filling tool (400) to be put in hermetic contact with said upper surface. In a preferred embodiment, the through-hole (32) can be hermetically sealed by forced insertion of a pin-shaped plug (33). The invention also relates to the filling tool (400) to be used in combination with the binding device (30), allowing gas removal from the cooling device, filling of a working fluid, and hermetic sealing of the cooling device.

Abstract: A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.

Abstract: A piezo pump for use in a pressurized circuit includes a pump chamber with an inlet provided with a one way inlet valve, for connection to a feeding line of the pressurized circuit and an outlet provided with a one way outlet valve, for connection to a discharge line of the pressurized circuit and a piezo pump diaphragm closing one end of the pump chamber. A pressure chamber, which can function as a second pump chamber if desired, is defined at the side of the piezo pump diaphragm facing away from the pump chamber, wherein said pressure chamber is connected to a pressure source, which may be the feeding line.

Abstract: The current invention relates to a system for fast and accurate filling of a two-phase cooling device, comprising a binding device (30) intended to be hermetically mounted onto the cooling device, the binding device (30) comprising a through-hole (32) able to be in fluid contact with the cooling device, said through-hole (32) being extending between a lower surface adapted to the cooling device's surface, and an essentially plane upper surface, the binding device (30) further comprising a gripping head essentially level with said upper surface, allowing for a filling tool (400) to be put in hermetic contact with said upper surface. In a preferred embodiment, the through-hole (32) can be hermetically sealed by forced insertion of a pin-shaped plug (33). The invention also relates to the filling tool (400) to be used in combination with the binding device (30), allowing gas removal from the cooling device, filling of a working fluid, and hermetic sealing of the cooling device.

Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.

Abstract: A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force additional to gravity to liquid to transport liquid away from the condensing surface towards the reservoir, wherein the condensing surface is shaped such that condensed liquid moves along it towards the liquid transporter.

Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.

Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.

Abstract: The invention relates to recombinant collagen like polypeptides that are not glycosylated thereby reducing the immunogenicity of recombinant collagen-like polypeptides while at the same time preventing or reducing phosphorylation of these polypeptides. Such non-glycosylated polypeptides may be used in a wide variety of medical or cosmetic applications.

Abstract: The invention relates to the field of biochemistry and medicine. More specifically the invention relates to methods and pharmaceuticals for the treatment of intestinal neoplasia. The invention discloses the surprising finding that inhibitors of Notch pathway activation (for example ?-secretase inhibitors) are extremely useful in the treatment of intestinal adenoma and/or adenocarcinoma.

Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.