Patents by Inventor Johannes Wilhelmus De Klerk
Johannes Wilhelmus De Klerk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8514365Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.Type: GrantFiled: June 1, 2007Date of Patent: August 20, 2013Assignee: ASML Netherlands B.V.Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
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Patent number: 8068210Abstract: Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity.Type: GrantFiled: March 17, 2008Date of Patent: November 29, 2011Assignee: ASML Netherlands B.V.Inventor: Johannes Wilhelmus De Klerk
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Patent number: 7889316Abstract: A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.Type: GrantFiled: May 15, 2006Date of Patent: February 15, 2011Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Petrus De Boeij, Simon De Groot, Ewoud Vreugdenhil, Johannes Wilhelmus De Klerk
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Patent number: 7732110Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.Type: GrantFiled: February 25, 2009Date of Patent: June 8, 2010Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk
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Patent number: 7724351Abstract: A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.Type: GrantFiled: January 30, 2006Date of Patent: May 25, 2010Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Erik Roelof Loopstra, Adrianus Franciscus Petrus Engelen, Bernardus Antonius Johannes Luttikhuis, Maria Johanna Agnes Rubingh, Johannes Martinus Andreas Hazenberg, Laurentius Catrinus Jorritsma, Johannes Wilhelmus De Klerk, Bernhard Geuppert, Aart Adrianus Van Beuzekom, Petrus Franciscus Wilhelmus Maria Mandigers, Franz Sorg, Peter Deufel, Peter Schaap
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Patent number: 7670731Abstract: A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally distributed function, wherein the effective probability density function of the first apparatus is substantially similar to the probability density function of the second apparatus.Type: GrantFiled: October 18, 2006Date of Patent: March 2, 2010Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Johannes Anna Quaedackers, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk, Alexander Serebryakov
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Patent number: 7655368Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.Type: GrantFiled: September 9, 2004Date of Patent: February 2, 2010Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk
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Patent number: 7595863Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and includes a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: GrantFiled: December 23, 2005Date of Patent: September 29, 2009Assignee: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus Kruif, Richard Joseph Bruls, Thomas Josephus Maria Castenmiller, Johannes Wilhelmus De Klerk, Erik Petrus Buurman
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Patent number: 7580113Abstract: A method of reducing a wave front aberration is provided for a lithographic process whereby the reducing is based on the selected pattern to be printed and the selected illumination mode used for exposure. Wave front aberrations of a projection system of a lithographic apparatus are measured and reduced by calculating adjustments of optical elements of the projection system and applying the calculated adjustments to the projection system. The calculation of adjustments is based on information on a spatial distribution of radiant intensity in a pupil of the projection system as present during exposing the radiation sensitive layer, and is limited to aberrations in projection lens pupil areas of relative high radiant flux.Type: GrantFiled: June 23, 2006Date of Patent: August 25, 2009Assignee: ASML Netherlands B.V.Inventors: Wim Tjibbo Tel, Freerk Adriaan Stoffels, Laurentius Catrinus Jorritsma, Tammo Uitterdijk, Johannes Wilhelmus De Klerk
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Publication number: 20090190115Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.Type: ApplicationFiled: February 25, 2009Publication date: July 30, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Jozef Maria FINDERS, Judocus Marie Dominicus STOELDRAIJER, Johannes Wilhelmus DE KLERK
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Patent number: 7511799Abstract: A lithographic apparatus wherein a dipole illumination mode used for printing a line pattern, is arranged to provide quadrupole illumination. Radiation emanating from the two additional poles and passing the mask pattern without being affected by diffraction is prevented from reaching the wafer by a radiation blocking aperture disposed in the projection system. Astigmatism aberration due to lens heating associated with the dipole illumination mode is reduced by lens heating associated with the additional poles of the quadrupole illumination mode.Type: GrantFiled: January 27, 2006Date of Patent: March 31, 2009Assignee: ASML Netherlands B.V.Inventors: Wim Tjibbo Tel, Johannes Wilhelmus De Klerk, Peter Hanzen Wardenier
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Publication number: 20080297744Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.Type: ApplicationFiled: June 1, 2007Publication date: December 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
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Publication number: 20080165340Abstract: Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity.Type: ApplicationFiled: March 17, 2008Publication date: July 10, 2008Applicant: ASML NETHERLANDS B.V.Inventor: Johannes Wilhelmus De Klerk
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Patent number: 7355674Abstract: Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity.Type: GrantFiled: September 28, 2004Date of Patent: April 8, 2008Assignee: ASML Netherlands B.V.Inventor: Johannes Wilhelmus De Klerk
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Publication number: 20070296938Abstract: A method of reducing a wave front aberration is provided for a lithographic process whereby the reducing is based on the selected pattern to be printed and the selected illumination mode used for exposure. Wave front aberrations of a projection system of a lithographic apparatus are measured and reduced by calculating adjustments of optical elements of the projection system and applying the calculated adjustments to the projection system. The calculation of adjustments is based on information on a spatial distribution of radiant intensity in a pupil of the projection system as present during exposing the radiation sensitive layer, and is limited to aberrations in projection lens pupil areas of relative high radiant flux.Type: ApplicationFiled: June 23, 2006Publication date: December 27, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo Tel, Freerk Adriaan Stoffels, Laurentius Catrinus Jorritsma, Tammo Uitterdijk, Johannes Wilhelmus De Klerk