Patents by Inventor Johannes Wilhelmus Teeuwsen

Johannes Wilhelmus Teeuwsen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060227310
    Abstract: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
    Type: Application
    Filed: March 21, 2006
    Publication date: October 12, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Buurman, Thomas Castenmiller, Johannes Wilhelmus Teeuwsen, Bearrach Moest, Marc Haast
  • Publication number: 20060215134
    Abstract: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
    Type: Application
    Filed: March 23, 2005
    Publication date: September 28, 2006
    Applicant: ASML Netherland B.V.
    Inventors: Erik Buurman, Thomas Castenmiller, Johannes Wilhelmus Teeuwsen, Bearrach Moest, Mare Haast
  • Publication number: 20060170899
    Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.
    Type: Application
    Filed: December 23, 2005
    Publication date: August 3, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Robertus Cornelis De Kruif, Richard Bruls, Johannes Wilhelmus Teeuwsen, Erik Buurman