Patents by Inventor Johannes Zellner
Johannes Zellner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230333364Abstract: The invention relates to an optical system (7) having an optical axis (OA), having a display unit (5) for displaying an image, having an eyepiece (6) for viewing the image, the eyepiece (6) comprising a lens unit (L1). The display unit (5) is designed in such away that a marginal ray light beam (9) emanates from an edge (8) of the display unit (5) and propagates to the lens unit (L1) in a light incidence direction (L). The display unit (5) is arranged first along the optical axis (OA) in the light incidence direction (L), followed by the lens unit (L1) arranged on the optical axis (OA). No further optical unit of the optical system (7) is arranged between the lens unit (L1) and a pupil of the eye (2). The marginal ray light beam (9) has a chief ray (HS). The chief ray (HS) propagates at a first chief ray height (H1) at the lens unit (L1) and at a second chief ray height (H2) at the display unit (5). The first chief ray height (H1) is at least level with the second chief ray height (H2).Type: ApplicationFiled: February 13, 2023Publication date: October 19, 2023Inventors: Alexander Epple, Johannes Zellner, David Shafer, Marco Pretorius
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Patent number: 10578972Abstract: An EUV collector serves for use in an EUV projection exposure apparatus. The collector guides EUV used light emitted by a plasma source region. An overall impingement surface of the collector is impinged upon by radiation emitted by the plasma source region. A used light portion of the overall impingement surface guides the EUV used light. An extraneous light portion of the overall impingement surface is impinged upon by extraneous light radiation, the wavelength of which differs from that of the used light. The used light portion and the extraneous light portion are not congruent. This EUV collector has increased efficiency can involve reduced production costs.Type: GrantFiled: September 20, 2018Date of Patent: March 3, 2020Assignee: Carl Zeiss SMT GmbHInventors: Holger Kierey, Johannes Zellner
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Publication number: 20190033723Abstract: An EUV collector serves for use in an EUV projection exposure apparatus. The collector guides EUV used light emitted by a plasma source region. An overall impingement surface of the collector is impinged upon by radiation emitted by the plasma source region. A used light portion of the overall impingement surface guides the EUV used light. An extraneous light portion of the overall impingement surface is impinged upon by extraneous light radiation, the wavelength of which differs from that of the used light. The used light portion and the extraneous light portion are not congruent. This EUV collector has increased efficiency can involve reduced production costs.Type: ApplicationFiled: September 20, 2018Publication date: January 31, 2019Inventors: Holger Kierey, Johannes Zellner
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Patent number: 9372411Abstract: A projection objective of a microlithographic projection exposure apparatus includes a wavefront correction device including a refractive optical element that has two opposite optical surfaces, through which projection light passes, and a circumferential rim surface extending between the two optical surfaces. A first and a second optical system are configured to direct first and second heating light to different portions of the rim surface such that at least a portion of the first and second heating light enters the refractive optical element. A temperature distribution caused by a partial absorption of the heating light results in a refractive index distribution inside the refractive optical element that corrects a wavefront error. At least the first optical system includes a focusing optical element that focuses the first heating light in a focal area such that the first heating light emerging from the focal area impinges on the rim surface.Type: GrantFiled: March 6, 2014Date of Patent: June 21, 2016Assignee: Carl Zeiss SMT GmbHInventors: Johannes Zellner, Boris Bittner, Norbert Wabra, Martin von Hodenberg, Sonja Schneider, Ricarda Schoemer, Arne Schob, Guenter Rudolph, Alexander Gratzke, Bryce Anton Moffat
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Patent number: 9304408Abstract: A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.Type: GrantFiled: December 12, 2013Date of Patent: April 5, 2016Assignee: Carl Zeiss SMT GmbHInventors: Johannes Zellner, Hans-Juergen Mann, Martin Endres
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Patent number: 9195145Abstract: An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of the illumination system are relatively low.Type: GrantFiled: October 6, 2014Date of Patent: November 24, 2015Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Armin Schoeppach, Johannes Zellner
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Patent number: 9182578Abstract: An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.Type: GrantFiled: December 15, 2011Date of Patent: November 10, 2015Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Marco Pretorius, Christoph Menke, Wilhelm Ulrich, Martin Endres
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Patent number: 9057964Abstract: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.Type: GrantFiled: September 20, 2011Date of Patent: June 16, 2015Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Claus Zahlten, Christoph Menke, Marco Pretorius, Wilhelm Ulrich, Hans-Juergen Rostalski
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Publication number: 20150022799Abstract: An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of the illumination system are relatively low.Type: ApplicationFiled: October 6, 2014Publication date: January 22, 2015Inventors: Hans-Juergen Mann, Armin Schoeppach, Johannes Zellner
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Patent number: 8873122Abstract: An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of the illumination system are relatively low.Type: GrantFiled: February 22, 2011Date of Patent: October 28, 2014Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Armin Schoeppach, Johannes Zellner
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Publication number: 20140185024Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a wavefront correction device comprising a refractive optical element that has two opposite optical surfaces, through which projection light passes, and a circumferential rim surface extending between the two optical surfaces. A first and a second optical system are configured to direct first and second heating light to different portions of the rim surface such that at least a portion of the first and second heating light enters the refractive optical element. A temperature distribution caused by a partial absorption of the heating light results in a refractive index distribution inside the refractive optical element that corrects a wavefront error. At least the first optical system comprises a focusing optical element that focuses the first heating light in a focal area such that the first heating light emerging from the focal area impinges on the rim surface.Type: ApplicationFiled: March 6, 2014Publication date: July 3, 2014Inventors: Johannes Zellner, Boris Bittner, Norbert Wabra, Martin von Hodenberg, Sonja Schneider, Ricarda Schneider, Arne Schob, Guenter Rudolph, Alexander Gratzke, Bryce Anton Moffat
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Publication number: 20140104588Abstract: A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.Type: ApplicationFiled: December 12, 2013Publication date: April 17, 2014Applicant: Carl Zeiss SMT GmbHInventors: Johannes Zellner, Hans-Juergen Mann, Martin Endres
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Patent number: 8629972Abstract: A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.Type: GrantFiled: September 17, 2010Date of Patent: January 14, 2014Assignee: Carl Zeiss SMT GmbHInventors: Johannes Zellner, Hans-Juergen Mann, Martin Endres
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Publication number: 20120147347Abstract: An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.Type: ApplicationFiled: December 15, 2011Publication date: June 14, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Marco Pretorius, Christoph Menke, Wilhelm Ulrich, Martin Endres
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Publication number: 20120069314Abstract: An imaging optics has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. A pupil plane is arranged in the imaging beam path between the object field and the image field. A stop is arranged in the pupil plane. The pupil plane is tilted at an angle (?) with respect to the object plane, where ? is greater than 0.1°. The imaging optics results allows for a manageable combination of small imaging errors, manageable production and good throughput.Type: ApplicationFiled: September 19, 2011Publication date: March 22, 2012Applicant: CARL ZEISS SMT GMBHInventors: Johannes Zellner, Aurelian Dodoc, Marco Pretorius, Christoph Menke, Wilhelm Ulrich, Hans-Juergen Mann
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Publication number: 20120069315Abstract: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.Type: ApplicationFiled: September 20, 2011Publication date: March 22, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Claus Zahlten, Christoph Menke, Marco Pretorius, Wilhelm Ulrich, Hans-Juergen Rostalski
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Patent number: 8027022Abstract: The disclosure relates a projection objective for imaging an object field in an object plane into an image field in an image plane. The disclosure also relates to a microlithographic projection exposure apparatus including such a projection objective. The disclosure further relates to methods of using such a projection exposure apparatus to fabricate microstructured or nanostructured components, such as highly integrated semiconductor components. In addition, the disclosure relates to components fabricated by such methods.Type: GrantFiled: July 16, 2008Date of Patent: September 27, 2011Assignee: Carl Zeiss SMT GmbHInventors: Johannes Zellner, Hans-Juergen Mann, Wilhelm Ulrich
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Patent number: 7999917Abstract: The disclosure relates an illumination system configured to guide illumination light from a radiation source to an object plane and to provide defined illumination of an object field in the object plane, wherein illumination light is supplied to the object field by a bundle-guiding optical pupil component which is disposed in a pupil plane of the projection objective, and wherein at least another bundle-guiding component is disposed upstream of the pupil component in the beam path of the illumination light. The disclosure further concerns a projection exposure apparatus that includes such an illumination system of this type, a method of fabricating a microstructured component using such a projection exposure apparatus, and a microstructured component fabricated using such a method.Type: GrantFiled: July 11, 2008Date of Patent: August 16, 2011Assignee: Carl Zeiss SMT GmbHInventors: Johannes Zellner, Hans-Juergen Mann
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Publication number: 20110165522Abstract: An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of the illumination system are relatively low.Type: ApplicationFiled: February 22, 2011Publication date: July 7, 2011Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Mann, Armin Schoeppach, Johannes Zellner
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Publication number: 20110026003Abstract: A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.Type: ApplicationFiled: September 17, 2010Publication date: February 3, 2011Applicant: CARL ZEISS SMT AGInventors: Johannes Zellner, Hans-Juergen Mann, Martin Endres