Patents by Inventor Johannus Josephus Van Bragt

Johannus Josephus Van Bragt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
    Patent number: 7450215
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.
    Type: Grant
    Filed: September 25, 2006
    Date of Patent: November 11, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Antonius Johannes Van Der Net, Erik Johannus Josephus Van Bragt
  • Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
    Patent number: 7384149
    Abstract: A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configure to pattern the projection beam according to a desired patter. The apparatus has a substrate table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and a moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.
    Type: Grant
    Filed: July 21, 2003
    Date of Patent: June 10, 2008
    Assignees: ASML Netherlands B.V., Entegris, Inc.
    Inventors: Antonius Johannes Van Der Net, Jeffrey J. Spiegelman, Johannus Josephus Van Bragt
  • Lithographic projection apparatus, gas purging method, device manufacturing method, and purge gas supply system
    Patent number: 7113254
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.
    Type: Grant
    Filed: July 20, 2004
    Date of Patent: September 26, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Antonius Johannes Van Der Net, Jeffrey J. Spiegelman, Erik Johannus Josephus Van Bragt