Patents by Inventor John A. Carlisle

John A. Carlisle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160280567
    Abstract: An electrochemical system and method are disclosed for On Site Generation (OSG) of oxidants, such as free available chlorine, mixed oxidants and persulfate. Operation at high current density, using at least a diamond anode, provides for higher current efficiency, extended lifetime operation, and improved cost efficiency. High current density operation, in either a single pass or recycle mode, provides for rapid generation of oxidants, with high current efficiency, which potentially allows for more compact systems. Beneficially, operation in reverse polarity for a short cleaning cycle manages scaling, provides for improved efficiency and electrode lifetime and allows for use of impure feedstocks without requiring water softeners. Systems have application for generation of chlorine or other oxidants, including mixed oxidants providing high disinfection rate per unit of oxidant, e.g. for water treatment to remove microorganisms or for degradation of organics in industrial waste water.
    Type: Application
    Filed: April 23, 2015
    Publication date: September 29, 2016
    Applicant: Advanced Diamond Technologies, Inc.
    Inventors: Ian W. Wylie, Prabhu U. Arumugam, Hongjun Zeng, John A. Carlisle
  • Publication number: 20150140740
    Abstract: A method of fabrication, a device structure and a submount comprising high thermal conductivity (HTC) diamond on a HTC metal substrate, for thermal dissipation, are disclosed. The surface roughness of the diamond layer is controlled by depositing diamond on a sacrificial substrate, such as a polished silicon wafer, having a specific surface roughness. Following deposition of the diamond layer, an adhesion layer, e.g. comprising a refractory metal, such as tantalum, and at least one layer of HTC metal is provided. The HTC metal substrate is preferably copper or silver, and may be provided by electroforming metal onto a thin sputtered base layer, and optionally bonding another metal layer. The electrically non-conductive diamond layer has a smooth exposed surface, preferably ?10 nm RMS, suitable for patterning of contact metallization and/or bonding to a semiconductor device. Methods are also disclosed for patterning the diamond on metal substrate to facilitate dicing.
    Type: Application
    Filed: December 15, 2014
    Publication date: May 21, 2015
    Applicant: Advanced Diamond Technologies, Inc.
    Inventors: Nicolaie A. Moldovan, John A. Carlisle, Hongjun Zeng
  • Publication number: 20130299361
    Abstract: Disclosed is a system and method for treatment of wastewater to destroy organic contaminants using an electrochemical advanced oxidation process. In particular, the method comprises a multistep process, comprising a) generating a concentrated oxidant solution comprising a peroxy oxidant species, such as persulfate or hydrogen peroxide; b) mixing wastewater comprising organic contaminants with the concentrated oxidant solution to provide a mixture comprising wastewater and diluted oxidant, the wastewater and concentrated oxidant solution being mixed in a prescribed ratio to provide a desired concentration ratio of oxidant species to contaminants; and c) in an electrochemical cell comprising a diamond anode, electrolyzing the mixture of wastewater and diluted oxidant, comprising electrochemically activating the peroxy oxidant species for oxidation and destruction of the contaminants.
    Type: Application
    Filed: May 8, 2013
    Publication date: November 14, 2013
    Inventors: Ian Wylie, John A. Carlisle, Prabhu Arumugam
  • Patent number: 8525185
    Abstract: A reliable long life RF-MEMS capacitive switch is provided with a dielectric layer comprising a “fast discharge diamond dielectric layer” and enabling rapid switch recovery, dielectric layer charging and discharging that is efficient and effective to enable RF-MEMS switch operation to greater than or equal to 100 billion cycles.
    Type: Grant
    Filed: April 7, 2011
    Date of Patent: September 3, 2013
    Assignee: UChicago Argonne, LLC
    Inventors: Charles L. Goldsmith, Orlando H. Auciello, John A. Carlisle, Suresh Sampath, Anirudha V. Sumant, Robert W. Carpick, James Hwang, Derrick C. Mancini, Chris Gudeman
  • Publication number: 20120193685
    Abstract: A reliable long life RF-MEMS capacitive switch is provided with a dielectric layer comprising a “fast discharge diamond dielectric layer” and enabling rapid switch recovery, dielectric layer charging and discharging that is efficient and effective to enable RF-MEMS switch operation to greater than or equal to 100 billion cycles.
    Type: Application
    Filed: April 7, 2011
    Publication date: August 2, 2012
    Applicant: UChicago Argonne, LLC
    Inventors: Charles L. Goldsmith, Orlando H. Auciello, John A. Carlisle, Suresh Sampath, Anirudha V. Sumant, Robert W. Carpick, James Hwang, Derrick C. Mancini, Chris Gudeman
  • Patent number: 8197701
    Abstract: Diamond SPM and AFM probes which are durable, particularly for scanning hard surfaces such as diamond surfaces. Interlayers and seeding can be used to improve diamond deposition, and the diamond can be ultrananocrystalline diamond (UNCD). Tip sharpening improves resolution.
    Type: Grant
    Filed: July 11, 2008
    Date of Patent: June 12, 2012
    Assignee: Advanced Diamond Technologies, Inc.
    Inventors: John A. Carlisle, Nicolaie Moldovan
  • Patent number: 7556982
    Abstract: A method of depositing nanocrystalline diamond film on a substrate at a rate of not less than about 0.2 microns/hour at a substrate temperature less than about 500° C. The method includes seeding the substrate surface with nanocrystalline diamond powder to an areal density of not less than about 1010sites/cm2, and contacting the seeded substrate surface with a gas of about 99% by volume of an inert gas other than helium and about 1% by volume of methane or hydrogen and one or more of acetylene, fullerene and anthracene in the presence of a microwave induced plasma while maintaining the substrate temperature less than about 500° C. to deposit nanocrystalline diamond on the seeded substrate surface at a rate not less than about 0.2 microns/hour. Coatings of nanocrystalline diamond with average particle diameters of less than about 20 nanometers can be deposited with thermal budgets of 500° C.-4 hours or less onto a variety of substrates such as MEMS devices.
    Type: Grant
    Filed: July 15, 2004
    Date of Patent: July 7, 2009
    Assignee: UChicago Argonne, LLC
    Inventors: John A. Carlisle, Dieter M. Gruen, Orlando Auciello, Xingcheng Xiao
  • Publication number: 20090148652
    Abstract: Diamond SPM and AFM probes which are durable, particularly for scanning hard surfaces such as diamond surfaces. Interlayers and seeding can be used to improve diamond deposition, and the diamond can be ultrananocrystalline diamond (UNCD). Tip sharpening improves resolution.
    Type: Application
    Filed: July 11, 2008
    Publication date: June 11, 2009
    Inventors: John A. Carlisle, Nicolaie Moldovan
  • Publication number: 20090017258
    Abstract: Diamond material made by a hot filament chemical vapor deposition process, providing large film area, good growth rate, phase purity, small average grain size, smooth surfaces, and other useful properties. Low substrate temperatures can be used. Control of process variables such as pressure and filament temperature and reactant ratio allow control of the diamond properties. Applications include MEMS, wear resistance low friction coatings, biosensors, and electronics.
    Type: Application
    Filed: July 10, 2007
    Publication date: January 15, 2009
    Inventors: John A. Carlisle, Charles F. West, Jerry W. Zimmer
  • Publication number: 20070220959
    Abstract: A monolithically integrated 3-D membrane or diaphragm/tip (called 3-D tip) of substantially all UNCD having a tip with a radius of about less than 50 nm capable of measuring forces in all three dimensions or being used as single tips or in large arrays for imprint of data on memory media, fabrication of nanodots of different materials on different substrates and many other uses such as nanolithography production of nanodots of biomaterials on substrates, etc. A method of molding UNCD is disclosed including providing a substrate with a predetermined pattern and depositing an oxide layer prior to depositing a carbide-forming metallic seed layer, followed by seeding with diamond nano or micropowder in solvent suspension, or mechanically polishing with diamond powder, or any other seeding method, followed by UNCD film growth conforming to the predetermined pattern.
    Type: Application
    Filed: October 4, 2006
    Publication date: September 27, 2007
    Applicant: UChicago Argonne LLC
    Inventors: Anirudha V. Sumant, Robert W. Carpick, Orlando H. Auciello, John A. Carlisle
  • Patent number: 7128889
    Abstract: An ultrananocrystalline diamond (UNCD) having an average grain size between 3 and 5 nanometers (nm) with not more than about 8% by volume diamond having an average grain size larger than 10 nm. A method of manufacturing UNCD film is also disclosed in which a vapor of acetylene and hydrogen in an inert gas other than He wherein the volume ratio of acetylene to hydrogen is greater than 0.35 and less than 0.85, with the balance being an inert gas, is subjected to a suitable amount of energy to fragment at least some of the acetylene to form a UNCD film having an average grain size of 3 to 5 nm with not more than about 8% by volume diamond having an average grain size larger than 10 nm.
    Type: Grant
    Filed: May 13, 2004
    Date of Patent: October 31, 2006
    Inventors: John A. Carlisle, Orlando Auciello, James Birrell
  • Patent number: 6793849
    Abstract: An electrically conducting n-type ultrananocrystalline diamond (UNCD) having no less than 1019 atoms/cm3 of nitrogen is disclosed. A method of making the n-doped UNCD. A method for predictably controlling the conductivity is also disclosed.
    Type: Grant
    Filed: December 12, 2003
    Date of Patent: September 21, 2004
    Assignee: The University of Chicago
    Inventors: Dieter M. Gruen, Alan R. Krauss, Orlando H. Auciello, John A. Carlisle