Abstract: One aspect provides a system for generating a layout for dual patterning technologies. In one embodiment, the system includes: (1) a deterministic boundary interconnect feature generator configured to generate a deterministic boundary interconnect feature for a cell based on at least one dual patterning design rule; and (2) cell placement and interconnect routing tools associated with the deterministic boundary interconnect feature generator and configured to place the deterministic boundary interconnect feature.

Abstract: Described embodiments provide for a semiconductor device comprising a core and one or more input/output (I/O) buffers surrounding the core. The I/O buffers are adapted to transfer signals associated with core circuitry of the core. The I/O buffers comprise I/O cells having a first orientation and I/O cells having a second orientation. Each I/O cell has a corresponding translator having low voltage transistors in a corresponding footprint. The low voltage transistors in the first orientation I/O cells have the first orientation, and the low voltage transistors in the second orientation I/O cells have the first orientation. The footprints of the first orientation I/O cells and the second orientation I/O cells are compatible with one another.