Abstract: The invention provides a method and apparatus for depositing alloy films useful in manufacturing photovoltaic solar cells. In the preferred embodiment an alloy comprising copper, indium, and selenium is deposited on a substrate. Sputtering is utilized to provide the copper and indium, with the selenium being provided by evaporization. Other alloys may also be formed using the disclosed apparatus and techniques.

Abstract: Apparatus for finishing a molten metallic coating on metallic strip and sheet comprising means for removing excess molten coating metal by impinging an elongated jet of gas under pressure on opposite sides of the strip and sheet substantially normal thereto. An improved nozzle of high efficiency is disclosed having an elongated plenum chamber communicating directly with a pair of elongated converging lips defining an orifice of about 0.03 to about 0.20 inch, the interior surface of the plenum chamber merging smoothly into each lip with a radius of curvature substantially equal to the orifice opening. The near-field region of the nozzle is about 8-10 times the orifice opening.

Abstract: A method and apparatus for providing a completely closed plasma trap in an r.f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures.

Abstract: A method and apparatus for providing a completely closed plasma trap in an r.f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures.

Abstract: Cathode sputtering apparatus and a related method for its use in sputter cleaning and bias sputtering operations, in which work-pieces to be sputter-cleaned are secured to a cathode assembly in a configuration lending itself to the utilization of plasma traps which are highly conducive to efficient sputtering. Two basic embodiments are disclosed. In one embodiment, the cathode assembly takes the form of a hollow cylinder with inwardly projecting end flanges, the work-pieces being mounted with their surfaces to be cleaned facing inwardly, and in the other embodiment it takes the form of a cylindrical post with outwardly projecting end flanges, with the surfaces to be cleaned facing outwardly.Also disclosed are related techniques for sputter coating work-pieces immediately following a sputter cleaning step.

Abstract: A method and apparatus for providing a completely closed plasma trap in an r.f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling, and making electrical contact with various of the electrode structures.

Abstract: A method and apparatus for providing a completely closed plasma trap in an r.f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures.

Abstract: A method and apparatus for providing a completely closed plasma trap in an r.f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures.

Abstract: A method of finishing a molten metallic coating on metallic strip wherein an elongated subsonic fluid jet, preferably ambient air, is impinged across the molten coating on the upwardly moving strip, the narrow dimension of the jet being increased progressively from the center to each end thereof by contouring the nozzle orifice through which the jet is discharged, adjusting the distance from the nozzle orifice to the strip relative to the narrow dimension of the orifice adjacent the strip edge to satisfy the relation Z.sub.o = .phi.d whereZ.sub.o = distance from orifice to strip.phi. = length of near-field region, expressed as a multiple of dd = narrow dimension of orifice at strip edge,And minimizing the ratio of fluid jet pressure to ambient pressure for a desired minimum coating thickness, whereby to obtain optimum finishing performance and to minimize ripples and edge build-up of coating metal. A high efficiency nozzle is disclosed wherein .phi. = 8 to 10 in the equation Z.sub.o = .phi.d.

Abstract: A method and apparatus for providing a completely closed plasma trap in an r.f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures.

Abstract: An electrode type glow discharge method and apparatus, such as that used for sputtering material from a cathode to provide a coating or the like on materials such as a substrate or substrates. Several exemplary embodiments are disclosed involving various combinations of constructural features including a flanged or spool type cathode, anode placement with respect thereto, provision of internal and/or external magnetic fields with field lines close to and substantially parallel with the barrel of the cathode, insulator placement, efficient cooling for anode and cathode, and the like. Furthermore, the assembly is constructed in a manner such that the same can be readily disassembled for enabling change of cathode materials and for cleaning cooling fluid passageways of the cathode and anode. Embodiments are described wherein at least a portion of the cathode may be in the form of a continuously moving member, such as a wire.

Abstract: There is disclosed herein an electrode type glow discharge apparatus, such as that used for sputtering material from a cathode to provide a coating or the like on materials such as a substrate or substrates. Several exemplary embodiments are disclosed involving various combinations of constructural features including a flanged or spool type cathode, anode placement with respect thereto, provision of internal and/or external magnetic fields with field lines close to and substantially parallel with the barrel of the cathode, insulator placement, efficient cooling for anode and cathode, and the like. Furthermore, the assembly is constructed in a manner such that the same can be readily disassembled for enabling change of cathode materials and for cleaning cooling fluid passageways of the cathode and anode. Embodiments are described wherein at least a portion of the cathode may be in the form of a continuously moving member, such as a wire.

Abstract: There is disclosed herein an electrode type glow discharge apparatus, such as that used for sputtering material from a cathode to provide a coating or the like on materials such as a substrate or substrates. Several exemplary embodiments are disclosed involving various combinations of constructural features including a flanged or spool type cathode, anode placement with respect thereto, provision of internal and/or external magnetic fields with field lines close to and substantially parallel with the barrel of the cathode, insulator placement, efficient cooling for anode and cathode, and the like. Furthermore, the assembly is constructed in a manner such that the same can be readily disassembled for enabling change of cathode materials and for cleaning cooling fluid passageways of the cathode and anode. Embodiments are described wherein at least a portion of the cathode may be in the form of a continuously moving member, such as a wire.