Patents by Inventor John Allgair

John Allgair has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10488184
    Abstract: An interferometric metrology device characterizes a surface topography of a sample at different length scales by combining the interferometric data into blocks of different length scales or by filtering the interferometric data at different length scales and then determining statistical moments or surface properties of the surface topography at the different length scales. The interferometric metrology device determines a best focus position for a processing tool based on different length scales and/or based on weighting functions that are based on the structure-dependent focus budget and a variable local topography. Additionally, the topography data may be used by itself or combined with design data, design simulation depth-of-focus data and lithography scanner focus data to define regions of interest for additional characterization with a different metrology device.
    Type: Grant
    Filed: July 11, 2016
    Date of Patent: November 26, 2019
    Assignee: Nanometrics Incorporated
    Inventors: Kevin Eduard Heidrich, John Allgair, Jonathan Peak, Timothy Andrew Johnson
  • Publication number: 20170016715
    Abstract: An interferometric metrology device characterizes a surface topography of a sample at different length scales by combining the interferometric data into blocks of different length scales or by filtering the interferometric data at different length scales and then determining statistical moments or surface properties of the surface topography at the different length scales. The interferometric metrology device determines a best focus position for a processing tool based on different length scales and/or based on weighting functions that are based on the structure-dependent focus budget and a variable local topography. Additionally, the topography data may be used by itself or combined with design data, design simulation depth-of-focus data and lithography scanner focus data to define regions of interest for additional characterization with a different metrology device.
    Type: Application
    Filed: July 11, 2016
    Publication date: January 19, 2017
    Inventors: Kevin Eduard HEIDRICH, John Allgair, Jonathan Peak, Timothy Andrew Johnson