Patents by Inventor John Anthony Schultz

John Anthony Schultz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8580915
    Abstract: A micro electromechanical system having incorporated therein a composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom; (f) removing any residual first and second solvents from said polymer to form said stable polymer.
    Type: Grant
    Filed: May 23, 2012
    Date of Patent: November 12, 2013
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: William Richard Russell, John Anthony Schultz
  • Publication number: 20120264857
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.
    Type: Application
    Filed: May 23, 2012
    Publication date: October 18, 2012
    Inventors: WILLIAM RICHARD RUSSELL, John Anthony Schultz
  • Patent number: 8207278
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals there from.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: June 26, 2012
    Assignee: Dupont Electronic Polymers LP
    Inventors: William Richard Russell, John Anthony Schultz
  • Publication number: 20110082255
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals there from.
    Type: Application
    Filed: December 9, 2010
    Publication date: April 7, 2011
    Inventors: William Richard Russell, John Anthony Schultz
  • Patent number: 7862983
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.
    Type: Grant
    Filed: May 6, 2010
    Date of Patent: January 4, 2011
    Assignee: DuPont Electronic Polymers L.P.
    Inventors: William Richard Russell, John Anthony Schultz
  • Publication number: 20100221653
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.
    Type: Application
    Filed: May 6, 2010
    Publication date: September 2, 2010
    Applicant: DuPont Electronic Polymers L>P>
    Inventors: William Richard Russell, John Anthony Schultz
  • Patent number: 7741429
    Abstract: A method of making a stable photoresist solution containing a polymer from a solution of a polymer containing trace metals, said method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom; (f) adding a compatible photoresist solvent to said solid polymer cake from step e and mixing the two in order to dissolve said polymer in said photoresist solvent and thereby forming a
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: June 22, 2010
    Assignee: DuPont Electronic Polymers L.P.
    Inventors: William Richard Russell, John Anthony Schultz
  • Publication number: 20070148587
    Abstract: A method of making a stable photoresist solution containing a polymer from a solution of a polymer containing trace metals, said method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom; (f) adding a compatible photoresist solvent to said solid polymer cake from step e and mixing the two in order to dissolve said polymer in said photoresist solvent and thereby forming a
    Type: Application
    Filed: November 17, 2006
    Publication date: June 28, 2007
    Inventors: William Richard Russell, John Anthony Schultz