Abstract: A method is described for forming a porous coating on the surface of a substrate such as an implantable prosthesis wherein a microstructure appliqué is made in the shape and depth of the area to be coated, adhesively attached to that area and subsequently bonded to the substrate through the application of an appropriate sintering treatment. Manufacture of the microstructure appliqué is accomplished through the transfer and deposition of one or more packed layers of uniformly-sized, metallic particles onto a shaped pattern followed by the addition of a binder solution for preserving the packing of particles and the integrity of the shaped piece. The method disclosed herein provides a means of making uniform and reproducible structures possessing uniform porosity and is adaptable to automation for producing larger quantities of appliqués, which may help in reducing costs associated with prosthetic implant production.

Abstract: A method is described for forming a porous coating on the surface of a substrate such as an implantable prosthesis wherein a microstructure appliqué is made in the shape and depth of the area to be coated, adhesively attached to that area and subsequently bonded to the substrate through the application of an appropriate sintering treatment. Manufacture of the microstructure appliqué is accomplished through the transfer and deposition of one or more packed layers of uniformly-sized, metallic particles onto a shaped pattern followed by the addition of a binder solution for preserving the packing of particles and the integrity of the shaped piece. The method disclosed herein provides a means of making uniform and reproducible structures possessing uniform porosity and is adaptable to automation for producing larger quantities of appliqués, which may help in reducing costs associated with prosthetic implant production.

Abstract: A method for producing uranium oxide includes combining uranium tetrafluoride and a phyllosilicate mineral containing a solid oxidizing agent within the mineral's structure having a lower thermodynamic stability than the uranium oxide; heating the combination below the vapor point of the uranium tetrafluoride to sufficiently react the uranium tetrafluoride and the oxidizing agent to produce uranium oxide and a non-radioactive fluorine compound; and removing the fluorine compound.

Abstract: A method for producing uranium oxide includes combining uranium oxyfluoride and a solid oxidizing agent having a lower thermodynamic stability than the uranium oxide after "oxide"; heating the combination below the vapor point of the uranium oxyfluoride to sufficiently react the uranium oxyfluoride and the oxidizing agent to produce uranium oxide and a non-radioactive fluorine compound; and removing the fluorine compound after "compound".

Abstract: A method for producing uranium oxide includes combining uranium oxyfluoride and silicon and heating the combination below the vapor point of the uranium oxyfluoride to sufficiently react the uranium oxyfluoride and silicon to produce uranium oxide and a non-radioactive fluorine compound; and removing the fluorine compound, e.g. silicon tetrafluoride.

Abstract: A method for producing silicon tetrafluoride includes combining uranium oxyfluoride and silicon dioxide; heating the combination below the melting point of the uranium oxyfluoride to sufficiently react the uranium oxyfluoride and the silicon dioxide to produce non-radioactive silicon tetrafluoride and an oxide of uranium; and removing the silicon tetrafluoride.

Abstract: A method for producing uranium oxide includes combining uranium tetrafluoride and a solid oxidizing agent having a lower thermodynamic stability than the uranium oxide; heating the combination below the vapor point of the uranium tetrafluoride to sufficiently react the uranium tetrafluoride and the oxidizing agent to produce uranium oxide and a non-radioactive fluorine compound; and removing the fluorine compound.

Abstract: A method for producing uranium oxide includes combining uranium tetrafluoride, silicon and a gaseous anhydrous oxidizing agent having a lower thermodynamic stability than any oxide of uranium produced; heating the combination below the vapor point of the uranium tetrafluoride to sufficiently react the uranium tetrafluoride, silicon and the oxidizing agent to produce uranium oxide and a non-radioactive fluorine compound; and removing the fluorine compound.

Abstract: A method for producing silicon tetrafluoride includes combining uranium tetrafluoride and silicon dioxide; heating the combination below the melting point of the uranium tetrafluoride to sufficiently react the uranium tetrafluoride and the silicon dioxide to produce non-radioactive silicon tetrafluoride and an oxide of uranium; and removing the silicon tetrafluoride.