Patents by Inventor John B. Covington

John B. Covington has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Water soluble contrast enhancement composition and method of use
    Patent number: 5173390
    Abstract: A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
    Type: Grant
    Filed: September 13, 1990
    Date of Patent: December 22, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: John B. Covington, Vic B. Marriott, Larry G. Venable, Peter Kim
  • Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol
    Patent number: 4997742
    Abstract: A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
    Type: Grant
    Filed: December 9, 1988
    Date of Patent: March 5, 1991
    Assignee: Texas Instruments Inc.
    Inventors: John B. Covington, Vic B. Marriott, Larry G. Venable, Peter Kim
  • Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
    Patent number: 4959293
    Abstract: 2-diazo-1-ones are useful deep UV photoresist solubility modification agents exhibiting improved photosensitivity allowing shorter deep UV exposure times to achieve the same extent of photoreaction as with prior art solubility modification agents. The 2-diazo-1-one solubility modification agents when used as photoactive solubility modification components in photoresist compositions permit the photoresist compositions to act as either positive or negative photoresist compositions depending upon the developer employed, namely, as a positive resist when a metal ion containing developer is employed and as a negative resist when a metal ion free developer is employed.
    Type: Grant
    Filed: October 28, 1988
    Date of Patent: September 25, 1990
    Assignee: J. T. Baker, Inc.
    Inventors: George Schwartzkopf, John B. Covington, Kathleen B. Gabriel
  • Water soluble contrast enhancement layer method of forming resist image on semiconductor chip
    Patent number: 4816380
    Abstract: A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
    Type: Grant
    Filed: June 27, 1986
    Date of Patent: March 28, 1989
    Assignee: Texas Instruments Incorporated
    Inventors: John B. Covington, Vic B. Marriott, Larry G. Venable, Peter Kim
  • Irradiation of polyacrylate films in air
    Patent number: 4323591
    Abstract: Polyacrylate materials having certain heterocyclic nuclei within the structure have been found to be readily and polymerizable by irradiation in air. Typically, polyacrylate materials are highly sensitive to the presence of oxygen and do not polymerize fully unless special precautions or conditions are undertaken.
    Type: Grant
    Filed: January 29, 1981
    Date of Patent: April 6, 1982
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Larry A. Wendling, John B. Covington
  • Process for polymerizing acrylic substituted hydantoins in air
    Patent number: 4306954
    Abstract: Acrylic substituted heterocyclic compounds have been found to be curable to a non-tacky state by radiation within the ultraviolet and visible regions of the electromagnetic spectrum.
    Type: Grant
    Filed: June 25, 1979
    Date of Patent: December 22, 1981
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Larry A. Wendling, John B. Covington
  • Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
    Patent number: 4262072
    Abstract: Abrasion resistant coatings are comprised of a crosslinked polymeric coating comprising at least 15% by weight of said polymer derived from a polyacrylate material having a heterocyclic nucleus therein.
    Type: Grant
    Filed: June 25, 1979
    Date of Patent: April 14, 1981
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Larry A. Wendling, John B. Covington