Abstract: Processes of polymerizing olefin monomers using catalyst systems comprising a procatalyst having a structure according to Formula (I).

Abstract: The polymerization process of this disclosure includes includes polymerizing ethylene and one or more olefins in the presence of a catalyst system under olefin polymerization conditions to form an ethylene-based polymer.

Abstract: A polymer includes repeat units having the structure wherein R1, R2, Ar1, Ar2, and Ar3 are defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists.

Abstract: A photoresist composition includes a polymer with repeat units having the structure wherein each occurrence of R1 and R2 is independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-18 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-18 heteroaryl; and R1 and R2 are optionally covalently linked to each other to form a ring that includes —R1—C—R2—; each occurrence of Ar1, Ar2, and Ar3 is independently an unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof.

Abstract: A bis(aryl)acetal has the formula wherein Y1 and Y2 are each independently chloro, bromo, iodo, mesylate, tosylate, triflate, or Bx, provided that Y1 and Y2 are not both selected from chloro, bromo, and iodo; each occurrence of Bx is independently a boron-containing functional group bonded to Ar1 or Ar2 via a boron atom; Ar1 and Ar2 are each independently unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene; provided that Ar1 and Ar2 are not covalently linked to each other to form a ring structure that includes -Ar1-O—C—O-Ar2-; and R1 and R2 are each independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-20 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-20 heteroaryl. The bis(aryl)acetal is useful as a monomer for oligoacetal and polyacetal synthesis via Suzuki polycondensation.

Abstract: A photoresist composition includes a polymer with repeat units having the structure wherein each occurrence of R1 and R2 is independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-18 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-18 heteroaryl; and R1 and R2 are optionally covalently linked to each other to form a ring that includes —R1—C—R2—; each occurrence of Ar1, Ar2, and Ar3 is independently an unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof.

Abstract: A polymer includes repeat units having the structure wherein R1, R2, Ar1, Ar2, and Ar3 are defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists.

Abstract: A bis(aryl)acetal has the formula wherein Y1 and Y2 are each independently chloro, bromo, iodo, mesylate, tosylate, triflate, or Bx, provided that Y1 and Y2 are not both selected from chloro, bromo, and iodo; each occurrence of Bx is independently a boron-containing functional group bonded to Ar1 or Ar2 via a boron atom; Ar1 and Ar2 are each independently unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene; provided that Ar1 and Ar2 are not covalently linked to each other to form a ring structure that includes —Ar1—O—C—O—Ar2—; and R1 and R2 are each independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-20 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-20 heteroaryl. The bis(aryl)acetal is useful as a monomer for oligoacetal and polyacetal synthesis via Suzuki polycondensation.