Patents by Inventor John Britton Robbins

John Britton Robbins has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for patterning thick layers
    Patent number: 10811492
    Abstract: A method of fabricating an integrated circuit includes applying photoresist to a MESA dielectric layer of a semiconductor structure, to generate a photoresist layer. The method also includes exposing the photoresist layer with a grayscale mask, to generate an exposed photoresist layer. The photoresist exposed layer includes a thick photoresist pattern in a first region, a thin photoresist pattern in a second region where a height of the thin photoresist pattern is less than half a height of the thick photoresist pattern, and a gap region between the thick photoresist pattern and the thin photoresist pattern.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: October 20, 2020
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Jeffrey Alan West, Byron Lovell Williams, John Britton Robbins
  • METHOD AND DEVICE FOR PATTERNING THICK LAYERS
    Publication number: 20200135841
    Abstract: A method of fabricating an integrated circuit includes applying photoresist to a MESA dielectric layer of a semiconductor structure, to generate a photoresist layer. The method also includes exposing the photoresist layer with a grayscale mask, to generate an exposed photoresist layer. The photoresist exposed layer includes a thick photoresist pattern in a first region, a thin photoresist pattern in a second region where a height of the thin photoresist pattern is less than half a height of the thick photoresist pattern, and a gap region between the thick photoresist pattern and the thin photoresist pattern.
    Type: Application
    Filed: October 31, 2018
    Publication date: April 30, 2020
    Inventors: Jeffrey Alan West, Byron Lovell Williams, John Britton Robbins
  • Process for forming PZT or PLZT thinfilms with low defectivity
    Patent number: 10354858
    Abstract: Use of a non-solvent for the edge bead removal of spin-coated PZT or PLZT thinfilms, eliminates swelling of the exposed edges of the PZT or PLZT thinfilms and eliminates delamination and formation of particle defects in subsequent bake and anneal steps.
    Type: Grant
    Filed: August 25, 2014
    Date of Patent: July 16, 2019
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Asad Mahmood Haider, John Britton Robbins
  • PROCESS FOR FORMING PZT OR PLZT THINFILMS WITH LOW DEFECTIVITY
    Publication number: 20150187570
    Abstract: Use of a non-solvent for the edge bead removal of spin-coated PZT or PLZT thinfilms, eliminates swelling of the exposed edges of the PZT or PLZT thinfilms and eliminates delamination and formation of particle defects in subsequent bake and anneal steps.
    Type: Application
    Filed: August 25, 2014
    Publication date: July 2, 2015
    Inventors: Asad Mahmood HAIDER, John Britton ROBBINS
  • High-resistance thin-film resistor and method of forming the resistor
    Patent number: 8754741
    Abstract: The resistance of a thin-film resistor is substantially increased by forming the thin-film resistor to line one or more non-conductive trenches. By lining the one or more non-conductive trenches, the overall length of the resistor is increased while still consuming approximately the same surface area as a conventional resistor.
    Type: Grant
    Filed: October 18, 2012
    Date of Patent: June 17, 2014
    Assignee: Texas Instruments Incorporated
    Inventors: Byron Lovell Williams, John Britton Robbins
  • High-Resistance Thin-Film Resistor and Method of Forming the Resistor
    Publication number: 20140111301
    Abstract: The resistance of a thin-film resistor is substantially increased by forming the thin-film resistor to line one or more non-conductive trenches. By lining the one or more non-conductive trenches, the overall length of the resistor is increased while still consuming approximately the same surface area as a conventional resistor.
    Type: Application
    Filed: October 18, 2012
    Publication date: April 24, 2014
    Applicant: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Byron Lovell Williams, John Britton Robbins