Patents by Inventor John C. C. Fan

John C. C. Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4357183
    Abstract: A method and apparatus is described for producing Ge or a Ge.sub.1-x Si.sub.x heteroepitaxy film on Si by depositing films of Ge or Ge.sub.1-x Si.sub.x on Si and subjecting the body so formed to a controlled temperature environment, wherein the body is rapidly (within a time period t.sub.o of more than about 100 microseconds) brought to a predetermined temperature within the alloy range of the deposited film but less than the melting point of Si. The body is then held at such temperature for a relatively short time not to exceed about 3 minutes, including the time period t.sub.o.
    Type: Grant
    Filed: August 13, 1980
    Date of Patent: November 2, 1982
    Assignee: Massachusetts Institute of Technology
    Inventors: John C. C. Fan, Ronald P. Gale
  • Patent number: 4337990
    Abstract: Transparent heat-mirrors are disclosed which are comprised of composite films. These films include a discrete and continuous layer of metallic silver sandwiched between a transparent, outer, protective, anti-reflection layer and a transparent, phase-matching layer. This combination of layers is chosen to provide high solar transmission with minimum loss of thermal radiation. Transparent heat-mirrors are useful in the collection and trapping of solar energy, and in other applications where it is desired or necessary to have high infrared reflectivity with high solar transmission.
    Type: Grant
    Filed: May 27, 1976
    Date of Patent: July 6, 1982
    Assignee: Massachusetts Institute of Technology
    Inventors: John C. C. Fan, Frank J. Bachner
  • Patent number: 4312915
    Abstract: A selective-black absorber capable of operation at elevated temperatures and high efficiency as a solar energy absorber is described. A cermet of MgO/Au, MgO/Pt, and Cr.sub.2 O.sub.3 /Cr having high solar energy absorptance and low infrared energy emissivity is coated on a substrate having high infrared reflectivity such as Mo coated on stainless steel; Ni coated on Cu, or steel; aluminum, or steel. Typically an absorption coefficient of about 0.93 with an emissivity of about 0.09 is obtained and operation at a temperature of 300.degree.-400.degree. C. is possible depending on the cermet and substrate materials.
    Type: Grant
    Filed: November 15, 1979
    Date of Patent: January 26, 1982
    Assignee: Massachusetts Institute of Technology
    Inventor: John C. C. Fan
  • Patent number: 4309225
    Abstract: An improved method for crystallizing amorphous material with a moving beam of energy is disclosed. In this method, the energy beam is scanned in a manner to provide controlled, continuous motion of the crystallization front.
    Type: Grant
    Filed: February 22, 1980
    Date of Patent: January 5, 1982
    Assignee: Massachusetts Institute of Technology
    Inventors: John C. C. Fan, Herbert J. Zieger
  • Patent number: 4248687
    Abstract: Transparent heat-mirrors are disclosed which are formed from tin-doped indium oxide films or antimony-doped tin oxide films deposited onto polymeric substrates. Low temperature deposition processes, such as ion-beam sputtering, are employed to preserve the polymeric substrates, and films having high transparency to visible radiation and high reflectivity to infrared radiation are deposited on the polymeric substrates by carefully controlling the partial pressure of oxygen during deposition.
    Type: Grant
    Filed: July 23, 1979
    Date of Patent: February 3, 1981
    Assignee: Massachusetts Institute of Technology
    Inventor: John C. C. Fan
  • Patent number: 4248675
    Abstract: A method of applying an electrical contact and an anodic reflection coating to an n.sup.+ layer of a direct gap semiconductor device, comprising applying an anodizable metal contact to the n.sup.+ layer and thereafter anodizing the n.sup.+ layer whereby its thickness is reduced and an antireflection layer is formed thereover.
    Type: Grant
    Filed: February 25, 1980
    Date of Patent: February 3, 1981
    Assignee: Massachusetts Institute of Technology
    Inventors: Carl O. Bozler, Ralph L. Chapman, John C. C. Fan, Robert W. McClelland
  • Patent number: 4227941
    Abstract: Improvements in shallow-homojunction solar cells based upon a plurality of layers of a direct gap semiconductor material such as GaAs, as well as their fabrication, are disclosed. The shallow-homojunction solar cells have a n.sup.+ /p/p.sup.+ structure in which the n.sup.+ top layer is limited to a thickness which permits significant carrier generation to occur in a lower semiconductor layer. An anodic antireflection coating is applied over the n.sup.+ top layer, and a particularly preferred method for applying the antireflection coating is by anodization. These solar cells can be grown on relatively inexpensive substrates, if desired, such as silicon or germanium.
    Type: Grant
    Filed: March 21, 1979
    Date of Patent: October 14, 1980
    Assignee: Massachusetts Institute of Technology
    Inventors: Carl O. Bozler, Ralph L. Chapman, John C. C. Fan, Robert W. McClelland
  • Patent number: 4197141
    Abstract: A method of passivating imperfections, such as grain boundaries and/or dislocations, in semiconductor materials is disclosed which comprises selectively passing electrical current along the imperfections by employing the semiconductor material as an electrode in an electrolytic cell.
    Type: Grant
    Filed: January 31, 1978
    Date of Patent: April 8, 1980
    Assignee: Massachusetts Institute of Technology
    Inventors: Carl O. Bozler, John C. C. Fan
  • Patent number: 4115228
    Abstract: Thick, finely-grained films of cermets are fabricated using conventional techniques of sputtering the ceramic and the metal onto a substrate. The cermet is then subjected to differential sputtering in which the metal is sputtered away faster than the ceramic to leave a ceramic-rich surface layer having excellent secondary-electron-emission properties for low-energy incident electrons. Typical of such cermets are MgO/Au, MgO/Pt and MgO/Ag. The presence of metallic particles in the bulk of the films and the small size of the ceramic particles greatly reduce surface charging while allowing the emitter film to be made thick enough to have a long operating life under adverse device conditions.
    Type: Grant
    Filed: May 31, 1977
    Date of Patent: September 19, 1978
    Assignee: Massachusetts Institute of Technology
    Inventors: Victor E. Henrich, John C. C. Fan
  • Patent number: 4059461
    Abstract: A method is disclosed for improving the crystallinity of semiconductor films by scanning the surface of such films with a shaped, focused laser beam. The laser is matched to the film so that the beam delivers sufficient energy thereto to heat the film above a temperature at which crystallization occurs along the scan track.
    Type: Grant
    Filed: December 10, 1975
    Date of Patent: November 22, 1977
    Assignee: Massachusetts Institute of Technology
    Inventors: John C. C. Fan, Herbert J. Zeiger
  • Patent number: 4038216
    Abstract: Thick, finely-grained films of cermets are fabricated using conventional techniques of sputtering the ceramic and the metal onto a substrate. The cermet is then subjected to differential sputtering in which the metal is sputtered away faster than the ceramic to leave a ceramic-rich surface layer having excellent secondary-electron-emission properties for low-energy incident electrons. Typical of such cermets are MgO/Au, MgO/Pt and MgO/Ag. The presence of metallic particles in the bulk of the films and the small size of the ceramic particles greatly reduce surface charging while allowing the emitter film to be made thick enough to have a long operating life under adverse device conditions.
    Type: Grant
    Filed: August 13, 1975
    Date of Patent: July 26, 1977
    Assignee: Massachusetts Institute of Technology
    Inventors: Victor E. Henrich, John C. C. Fan