Abstract: An as-deposited waveguide structure is formed by a vapor deposition process without etching of core material. A planar optical device of a lighthouse design includes a ridge-structured lower cladding layer of a low refractive index material. The lower cladding layer has a planar portion and a ridge portion extending above the planar portion. A core layer of a core material having a higher refractive index than the low refractive index material of the lower cladding layer overlies the top of the ridge portion of the lower cladding. A slab layer of the core material overlies the planar portion of the lower cladding layer. The lighthouse waveguide also includes a top cladding layer of a material having a lower refractive index than the core material, overlying the core layer and the slab layer. A method of forming an as-deposited waveguide structure includes first forming a ridge structure in a layer of low refractive index material to provide a lower cladding layer.

Abstract: An as-deposited waveguide structure is formed by a vapor deposition process without etching of core material. A planar optical device of a lighthouse design includes a ridge-structured lower cladding layer of a low refractive index material. The lower cladding layer has a planar portion and a ridge portion extending above the planar portion. A core layer of a core material having a higher refractive index than the low refractive index material of the lower cladding layer overlies the top of the ridge portion of the lower cladding. A slab layer of the core material overlies the planar portion of the lower cladding layer. The lighthouse waveguide also includes a top cladding layer of a material having a lower refractive index than the core material, overlying the core layer and the slab layer. A method of forming an as-deposited waveguide structure includes first forming a ridge structure in a layer of low refractive index material to provide a lower cladding layer.

Abstract: A novel method of in-situ cleaning a Ti target in a Ti+TiN anti-reflective coating process when such Ti and TiN deposition process are conducted in the same process chamber by the addition of a simple process step and without the use of a shutter.

Abstract: A novel method of in-situ cleaning a Ti target in a Ti+TiN anti-reflective coating process when such Ti and TiN deposition process are conducted in the same process chamber by the addition of a simple process step and without the use of a shutter.

Abstract: A surface discharge excimer light source which employs a one sided cell wherein all electrodes and the dielectric are on one side of the discharge space. The light produced by the device is neither shadowed nor attenuated by an electrode, and the electrode temperatures can be closely controlled. The construction of the device eliminates the need to maintain parallelism of the discharge space and close tolerances.

Abstract: A reaction chamber for performing a chemical vapor deposition process wherein the window through which the light must pass is prevented from becoming clouded. The chamber is divided by baffles into a reactant zone, a buffer zone, and a window zone, and the momentum flux densities of the gases flowing in the respective zones are about matched. Additionally, discontinuities are provided on the walls of the reactor to impede diffusion of the reactant gas towards the window.

Abstract: An ozone generating cell which utilizes a quartz dielectric for providing high purity ozone. The quarts dielectric is cemented to one of the electrodes of the cell, and is then ground to a desired dimension.

Abstract: A vapor source for the vacuum vaporization of a material which forms a positive meniscus with the wall of a crucible. The source comprises an electron-beam gun and a crucible for containing material to be vaporized. The crucible has a wall which makes an angle greater than about 35 degrees with the vertical; greater than 45.degree. is preferred. A molten pool of material to be vaporized has a positive meniscus which contacts the wall at an angle greater than 90.degree.. The positive meniscus enables a region of the wall just above the meniscus to be kept clear of condensed material. The source includes a means for adding molten material to the molten pool to maintain the meniscus in a desired range. If the pool level is sufficiently well controlled the meniscus can be maintained in the region free of condensed material and thus avoid the onset of a "thermal short".