Patents by Inventor John C. Gonzales

John C. Gonzales has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Conditioning of a reaction chamber
    Patent number: 7273817
    Abstract: A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber during the etching of a photoresist layer of a semiconductor wafer within the reaction chamber and the environment is regulated to form the polymer on the interior surface of the chamber. The polymer thus formed reduces the standard deviation of the critical dimensions of the semiconductor wafer. A method for the manufacture of integrated circuits is also provided.
    Type: Grant
    Filed: November 14, 2005
    Date of Patent: September 25, 2007
    Assignee: Micron Technology, Inc.
    Inventors: William A. Polinsky, Bill Crane, John C. Gonzales, Steven Ott
  • Conditioning of a reaction chamber
    Patent number: 7022620
    Abstract: A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber and the environment is regulated to form the polymer on the interior surface of the chamber. Methods for the manufacture of integrated circuits, electronic devices, and electronic systems, are also provided.
    Type: Grant
    Filed: November 18, 2003
    Date of Patent: April 4, 2006
    Assignee: Micron Technology, Inc.
    Inventors: William A. Polinsky, Bill Crane, John C. Gonzales, Steven Ott