Abstract: A molecular spiral-type vacuum pumping stage comprises a rotor disk having smooth surfaces cooperating with a stator. The stator is provided with a plurality of spiral channels at least on the surface facing the rotor disk, wherein the gas to be pumped flows in centripetal direction. The cross-section area (?) of the channels is reduced from the center towards the outer periphery of the stator. Due to this arrangement, it is possible to avoid the reduction of the internal gas flow velocity along the pumping stage and the related risk of internal compression or re-expansions, this limiting the power losses. The present invention also refers to a vacuum pump comprising at least one pumping stage as described above.

Abstract: A molecular spiral-type vacuum pumping stage comprises a smooth surfaces rotor disk cooperating with a stator body. The stator body comprises a plurality of spiral channels on at least one surface facing the rotor disk. The cross-section area (?) of these channels are reduced from the center to the outer periphery of the stator body so that the condition is satisfied according to which the internal channel speed, i.e. the product of the channel cross-section area and half the rotor velocity normal to the aforesaid area, is constant throughout the channels. Due to this arrangement, it is possible to avoid the risk of internal compression or re-expansions, this limiting the power losses. The present invention also refers to a vacuum pump comprising at least one pumping stage as described above.

Abstract: A molecular spiral-type vacuum pumping stage comprises a rotor disk having smooth surfaces cooperating with a stator. The stator is provided with a plurality of spiral channels at least on the surface facing the rotor disk, wherein the gas to be pumped flows in centripetal direction. The cross-section area (?) of the channels is reduced from the center towards the outer periphery of the stator. Due to this arrangement, it is possible to avoid the reduction of the internal gas flow velocity along the pumping stage and the related risk of internal compression or re-expansions, this limiting the power losses. The present invention also refers to a vacuum pump comprising at least one pumping stage as described above.

Abstract: A molecular spiral-type vacuum pumping stage comprises a smooth surfaces rotor disk cooperating with a stator body. The stator body comprises a plurality of spiral channels on at least one surface facing the rotor disk. The cross-section area (?) of these channels are reduced from the center to the outer periphery of the stator body so that the condition is satisfied according to which the internal channel speed, i.e. the product of the channel cross-section area and half the rotor velocity normal to the aforesaid area, is constant throughout the channels. Due to this arrangement, it is possible to avoid the risk of internal compression or re-expansions, this limiting the power losses. The present invention also refers to a vacuum pump comprising at least one pumping stage as described above.

Abstract: A magentron sputtering apparatus includes a rotatable magnet which is either concave or convex. For one magnet structure, at least a portion of the centerline of the magnet lies along a curve defined by ##EQU1## where .xi.(r) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.

Abstract: Sputtering apparatus and method which are particularly suitable for forming step coatings. A workpiece is supported in a chamber, particles are emitted from a sputter source in a substantially uniform manner throughout an area of greater lateral extent than the workpiece, the pressure within the chamber is maintained at a level which is sufficiently low to prevent substantial scattering of the particles between the source and the workpiece, and the particles are passed through a collimating filter having a plurality of transmissive cells with a length to diameter ratio on the order of 1:1 to 3:1 positioned between the source and the workpiece to limit the angles at which the particles can impinge upon the workpiece.

Abstract: A sputter magnetron ion source for producing an intense plasma in a cathode container which ionizes a high and substantial percentage of the sputter cathode material and means for extracting the ions of the cathode material in a beam. The ion extraction means is implemented by a magnetic field cusp configuration with a null region adjacent to the open end of the cathode container. Ions so produced are able to be directed at right angles to a substrate being coated for efficient via filling.

Abstract: The present invention refers to a pumping stage particularly designed for turbomolecular pumps, having increased compression ratio, and capable of extending the operating range of the turbomolecular pump towards high pressure. The new pumping stage comprises a casing housing, a rotor disk, and a substantially coplanar stator ring. The stator ring consists of two plates connected with each other along their circumferential periphery, thereby defining a region of close tolerance with the opposite surfaces of the rotor. The rotor and stator cooperate to define a tapered, free annular channel having a suction port and a discharge port at the opposite ends of this channel. The channel tapers in a functional, predetermined fashion, having the largest cross-sectional area near the suction port, and converging, according to the rotational direction of the rotor, at the discharge port.

Abstract: The present invention relates to turbomolecular pumps comprising one or more tangential flow pumping stages in addition to axial flow pumping stages, so as to raise the pump exhaust pressure up to the atmospheric pressure, wherein at least one tangential flow pumping stage having a tangential flow pumping channel of improved design. The channel is located between the lateral surface of the rotor disk and the annular inner wall of stator and comprises an upper closure plate provided with suction port and a lower closure plate provided with diskharge port wherein these ports operably coupled to the tangential flow pumping channel. The cross-section area of the channel is enlarged from its periphery portion defined by the lateral surface of the rotor disk to a central portion defined by the upper and lower closure plates.

Abstract: Sputtering apparatus and method which are particularly suitable for forming step coatings. A workpiece is supported in a chamber, particles are emitted from a sputter source in a substantially uniform manner throughout an area of greater lateral extent than the workpiece, the pressure within the chamber is maintained at a level which is sufficiently low to prevent substantial scattering of the particles between the source and the workpiece, and the particles are passed through a collimating filter having a plurality of transmissive cells with a length to diameter ratio on the order of 1:1 to 3:1 positioned between the source and the workpiece to limit the angles at which the particles can impinge upon the workpiece.

Abstract: A magnetron sputter source providing a predetermined erosion distribution over the surface of a sputter target material is described. When the distribution is uniform, close coupling of the sputter target with the substrate to be coated is achieved, resulting in improved collection efficiency of the sputtered material by the wafer and improved film thickness uniformity. Elimination of erosion grooves provide for greater target consumption and longer target life. The cathode magnetron sputter source includes a rotating magnet assembly of a specific shape and a specific magnetic strength provides the desired erosion distribution. The target may be dished to improve uniformity near the periphery of the wafer.The resulting magnetron cathode is used for the deposition of thin films. Further applications of uniform magnetron erosion or preselected erosion include uniform or preselected magnetron sputter etch or reactive ion etch and concurrent deposition and etch.

Abstract: On-column optical detection apparatus and method for use with capillary separation columns are shown. The apparatus and method minimize the adverse effects of light scattered from the walls of the column, thereby improving detection sensitivity and providing greater dynamic range. Light from a conventional source is focussed onto a column. Spatial filter means are positioned in front of the column to prevent at least some light from striking the column wall. Another spatial filter is positioned in front of a light collecting means which gathers light emanating from the column. In a specific embodiment, a unique monolens design is shown comprising collecting and focussing lens formed as an integral unit with a bore for a capillary column.

Abstract: A magnetron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by ##EQU1## where .xi.(u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.

Abstract: An ion source for an intense ion beam from a solid source is formed with a cathode around a central anode. A source of magnetic field with closely spaced poles is formed around a central region of the cathode so that the most intense region of the magnetic field is a torus on the inside of the cathode and the field at the anode is weak. A torus of plasma can be formed near the inside surface of the cathode which can be coated with solid source material. An ion beam can be extracted through an aperture in the cathode.

Abstract: An improved magnetron sputter source particularly suitable for magnetic materials is provided in the forming of an unfolded Penning discharge source. The two cathodes are in the form of an inner cathode roughly coplanar with an outer cathode ring. An anode radially between the cathodes is raised above the cathode surfaces so as to block line of sight from the inner cathode surface to the outer. A magnetic flux vector is imposed which passed from one cathode surface to the other. Raising the anode surface about one-fourth inch above the cathode surfaces allows raising the applied voltage so that a source of 5 kilowatts or greater is possible. Raising the anode also spreads the distribution of discharge more uniformly over the target surface and permits low pressure operation thereby facilitating good adhesion and uniform coverage of the substrate.

Abstract: A magnetron sputter device includes a first target having an emitting surface and a second target having a concave emitting target defined by a side wall of a frustum of cone. Separate plasma discharges for the targets are confined by separate electromagnet derived magnetic fields, coupled to the targets by pole pieces.

Abstract: In a high-performance, high-pressure liquid chromatography system, gradient elution of solvent components from a plurality of component reservoirs can be accomplished according to a programmed temporally variable ratio by a single reciprocating pump. The pumping cycle comprises a plurality of fill strokes with intervening pumping strokes. During one of the fill strokes of the cycle, a proportioned mixture of solvent components is admitted to the pump chamber from the respective reservoirs by means of proportioning valves. During each of the other fill strokes of the cycle, only a single solvent component is admitted to the pump chamber. Consequently, a relatively low concentration of a particular component can be delivered by the pump with precision over a complete pumping cycle, although a comparatively higher and therefore more accurately measurable concentration of that component is admitted to the pump chamber during any given fill stroke.