Patents by Inventor John C. Lam

John C. Lam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Three dimensional characterization of silicon wafer Vias from combined on-top microscopic and bottom-through laser fringes measurement
    Patent number: 9513112
    Abstract: A collimated laser beam is directed towards the wafer bottom such that the impinging light is partially forward deflected along the vias' bottom edges. Concentric laser interference fringes occur on the wafer top from constructive and destructive interference between the forward deflected and directly through propagating laser. A top down optical image from a number of vias' top openings and a top down fringe image from the same vias' concentric fringe sets are processed to three dimensionally characterize the vias.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: December 6, 2016
    Assignee: n&k Technology, Inc.
    Inventors: Christopher Rush, John C. Lam
  • Method of inferring optical parameters outside of a measurement spectral range
    Patent number: 6710865
    Abstract: The present invention provides a method for inferring optical parameters of a sample in a predictive spectral range by use of the known values of the optical parameters in a predetermined measurement spectral range. The method of the present invention capitalizes on the Forouhi-Bloomer dispersion equations for the optical constants n and k.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: March 23, 2004
    Assignee: N&K Technology, Inc.
    Inventors: Abdul Rahim Forouhi, Dale A. Harrison, Erik Maiken, John C. Lam
  • Method of monitoring thin-film processes and metrology tool thereof
    Patent number: 6594025
    Abstract: The present invention provides a method for monitoring a modifying-process taking place in a thin-film sample and thereby characterizing the sample thus modified, wherein the modifying-process is performed for purpose of improving physical properties of the sample. The present invention further provides a monitoring tool for characterizing various thin-film processes. Advantages of the method of the present invention are manifest in its non-intrusive nature, fast (or real-time) response, robust sensitivity, and versatility in a variety of thin-film processes. Another inherent advantage of the present invention is that an assortment of the “n&k” parameters can be obtained by using only measurement tool, in contrast to two (or more) simultaneous measurement tools used in the prior art.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: July 15, 2003
    Assignee: N&K Technology. Inc.
    Inventors: Abdul Rahim Forouhi, Dale A. Harrison, Eric Maiken, John C. Lam
  • Method of monitoring thin-film processes and metrology tool thereof
    Publication number: 20030053081
    Abstract: The present invention provides a method for monitoring a modifying-process taking place in a thin-film sample and thereby characterizing the sample thus modified, wherein the modifying-process is performed for purpose of improving physical properties of the sample. The present invention further provides a monitoring tool for characterizing various thin-film processes. Advantages of the method of the present invention are manifest in its non-intrusive nature, fast (or real-time) response, robust sensitivity, and versatility in a variety of thin-film processes. Another inherent advantage of the present invention is that an assortment of the “n&k” parameters can be obtained by using only measurement tool, in contrast to two (or more) simultaneous measurement tools used in the prior art.
    Type: Application
    Filed: July 12, 2001
    Publication date: March 20, 2003
    Inventors: Abdul Rahim Forouhi, Dale A. Harrison, Erik Maiken, John C. Lam
  • Method of inferring optical parameters outside of a measurement spectral range
    Publication number: 20020113957
    Abstract: The present invention provides a method for inferring optical parameters of a sample in a predictive spectral range by use of the known values of the optical parameters in a predetermined measurement spectral range. The method of the present invention capitalizes on the Forouhi-Bloomer dispersion equations for the optical constants n and k.
    Type: Application
    Filed: September 14, 2001
    Publication date: August 22, 2002
    Inventors: Abdul Rahim Forouhi, Dale A. Harrison, Erik Maiken, John C. Lam