Abstract: Organometallic antimony compounds having increased stability that are use in chemical vapor deposition processes are provided which comprise stibines containing sterically-demanding ligands, stibines lacking beta hydrogen atoms, or aromatic stibines. These compounds will generally have the formula:SbR.sub.n X.sub.3-nwherein R is selected from the group consisting of neopentyl, 2-ethylbutyl, 1-ethylpropyl, perhaloalkanes having 3-5 carbon atoms, benzyl, fluoro-substituted phenyl, cyclopentyl, and pentamethylcyclopentadienyl; X is selected from the group consisting of Br, Cl, I and H; and wherein n is an integer from 1 to 3. These compounds exhibit increased thermal stability and are thus advantageously used as substitutes for arsenic or other group V metals in chemical vapor deposition processes.