Abstract: According to an embodiment, an apparatus for a plasma processing system is provided. The apparatus includes a conductive conical frustum having an open top base, an open bottom base, and a surface area coupling the open top base to the open bottom base. A conductive cylinder is positioned within the conductive conical frustum with a closed bottom base and an open top base. The open top base of the conductive cylinder is connected to sidewalls of the open top base of the conductive conical frustum. The conductive cylinder has a height shorter than the height of the conductive conical frustum. The apparatus is configured to provide a broadband RF transition from a matching network to a resonating structure of the plasma processing system for frequencies ranging between 13 megahertz (MHz) and 220 MHz.

Abstract: A method of performing a plasma process includes generating, at an output of a signal generator, a first RF signal at a first frequency. The signal generator is coupled to a plasma chamber through a matching circuit. Based on a feedback from the first RF signal, variable components of the matching circuit are moved to fixed positions. A second RF signal is generated at a second frequency at the output of the signal generator to ignite a plasma within the plasma chamber. In response to detecting the plasma, the signal generator switches to output a third RF signal at the first frequency to sustain the plasma, which is configured to process a substrate loaded into the plasma chamber while holding the matching circuit at the fixed positions.

Abstract: According to an embodiment, a hybrid plasma processing system for generating an inductively coupled plasma is proposed. The hybrid plasma processing system includes a plasma chamber, a showerhead electrode, an RF feed structure, and an inductive element. The plasma chamber includes a center electrode, showerhead, and a coaxial RF power feed. The plasma chamber is configured as a capacitively coupled plasma (CCP) chamber. The showerhead electrode is configured to control gas flow within the capacitively coupled plasma chamber. The showerhead electrode is coupled to ground. The RF feed structure is couplable to an RF source. The inductive element is coupled to the RF feed structure configured to form a resonant circuit to generate a magnetic field to sustain the inductively coupled plasma generated within the capacitively coupled plasma chamber.

Abstract: A fluid control system for controlling flow of a process fluid can include an actuator and an energy storage system. The actuator can be configured to actuate a valve to control the flow of the process fluid and the energy storage system can drive the actuator. The energy storage system can include an accumulator in fluid communication with the actuator and a manual pump configured to charge the accumulator.

Abstract: A method of microfabrication is provided. The method includes providing a wafer having a working surface. A correction layer recipe is executed to form a correction layer over the working surface. A carbon hardmask (CHM) layer is formed over the correction layer. The correction layer recipe is determined based on the CHM layer so that the wafer has a wafer bow value within a threshold after the correction layer and the CHM layer are formed.

Abstract: A plasma processing apparatus includes a plasma processing chamber, a radio frequency waveguide, and a resonant structure. The plasma processing apparatus is configured to generate a plasma within the plasma processing chamber using a radio frequency field propagating through the radio frequency waveguide. The plasma includes a plasma sheath extending laterally along a surface of the radio frequency waveguide. The resonant structure is disposed in the radio frequency field and configured to induce localized effects in the plasma using current induced in the resonant structure by the radio frequency field.

Abstract: A plasma system includes a plasma apparatus comprising a plasma chamber and a substrate support disposed in the plasma chamber. The system includes an electromagnetic (EM) circuit block coupled to a radio frequency (RF) electrode. The EM circuit block includes a broadband RF waveform function generator, the broadband RF waveform having EM power distributed over a range of frequencies, and a broadband impedance matching network having an input coupled to an output of the broadband RF waveform function generator and an output coupled to a terminal of the RF electrode, an operating frequency range of the broadband impedance matching network including the range of frequencies. The system includes a controller programmed to adjust an input parameter of the EM circuit block.

Abstract: The present invention relates to an assembly apparatus for assembling components of spacecraft in space. The assembly apparatus includes: a core platform; and a mobile platform including an end effector configured to perform an assembly or manufacturing task. The mobile platform is connected to the core platform by a tether. The core platform includes a body and a coupling element connected to and extendable from the body such that the coupling element may be spaced from the body of the core platform. The tether connects the mobile platform to the body via the coupling element. The assembly apparatus further includes an actuator configured to vary the length of the tether extending between the coupling element and the mobile platform to control the position of the mobile platform relative to the body of the core platform.

Abstract: A matching circuit for a plasma tool including an impedance matching network configured to be coupled between a power supply and a plasma chamber, the plasma chamber being configured to operate a plasma in a predetermined frequency range, the power supply being configured to provide power for the plasma chamber, the impedance matching network including a first pi-network and a second pi-network in series coupled between an input of the plasma chamber and an output of the power supply, and the impedance matching network being configured such that, during operation of the plasma chamber in the predetermined frequency range, an impedance of the impedance matching network and the plasma chamber equals an impedance of the power supply.

Abstract: A plasma system includes a plasma apparatus comprising a plasma chamber and a substrate support disposed in the plasma chamber. The system includes an electromagnetic (EM) circuit block coupled to a radio frequency (RF) electrode. The EM circuit block includes a broadband RF waveform function generator, the broadband RF waveform having EM power distributed over a range of frequencies, and a broadband impedance matching network having an input coupled to an output of the broadband RF waveform function generator and an output coupled to a terminal of the RF electrode, an operating frequency range of the broadband impedance matching network including the range of frequencies. The system includes a controller programmed to adjust an input parameter of the EM circuit block.

Abstract: A plasma system includes a plasma apparatus including: a plasma chamber; a pedestal configured to hold a substrate in the chamber; and a radio frequency (RF) electrode configured to excite plasma in the chamber; an electromagnetic (EM) circuit block coupled to the RF electrode, the EM circuit block including: a function generator configured to output a broadband RF waveform, the waveform having EM power distributed over a range of frequencies; a broadband amplifier coupled to an output of the function generator, an operating frequency range of the amplifier including the range of frequencies; and a broadband impedance matching network having an input coupled to an output of the broadband amplifier and an output coupled to a terminal of the RF electrode, an operating frequency range of the broadband impedance matching network including the range of frequencies; and a controller configured to adjust an input parameter of the EM circuit block.

Abstract: According to an embodiment, an apparatus for a plasma processing system is provided. The apparatus includes a conductive conical frustum having an open top base, an open bottom base, and a surface area coupling the open top base to the open bottom base. A conductive cylinder is positioned within the conductive conical frustum with a closed bottom base and an open top base. The open top base of the conductive cylinder is connected to sidewalls of the open top base of the conductive conical frustum. The conductive cylinder has a height shorter than the height of the conductive conical frustum. The apparatus is configured to provide a broadband RF transition from a matching network to a resonating structure of the plasma processing system for frequencies ranging between 13 megahertz (MHz) and 220 MHz.

Abstract: A plasma system includes a plasma apparatus including: a plasma chamber; a pedestal configured to hold a substrate in the chamber; and a radio frequency (RF) electrode configured to excite plasma in the chamber; an electromagnetic (EM) circuit block coupled to the RF electrode, the EM circuit block including: a function generator configured to output a broadband RF waveform, the waveform having EM power distributed over a range of frequencies; a broadband amplifier coupled to an output of the function generator, an operating frequency range of the amplifier including the range of frequencies; and a broadband impedance matching network having an input coupled to an output of the broadband amplifier and an output coupled to a terminal of the RF electrode, an operating frequency range of the broadband impedance matching network including the range of frequencies; and a controller configured to adjust an input parameter of the EM circuit block.

Abstract: A method of performing a plasma process includes generating, at an output of a signal generator, a first RF signal at a first frequency. The signal generator is coupled to a plasma chamber through a matching circuit. Based on a feedback from the first RF signal, variable components of the matching circuit are moved to fixed positions. A second RF signal is generated at a second frequency at the output of the signal generator to ignite a plasma within the plasma chamber. In response to detecting the plasma, the signal generator switches to output a third RF signal at the first frequency to sustain the plasma, which is configured to process a substrate loaded into the plasma chamber while holding the matching circuit at the fixed positions.

Abstract: The present invention relates to an assembly apparatus for assembling components of spacecraft in space. The assembly apparatus comprises: a core platform (7); and a mobile platform (4) comprising an end effector configured to perform an assembly or manufacturing task. The mobile platform (4) is connected to the core platform (7) by a tether (6a). The core platform comprises a body and a coupling element (15a) connected to and extendable from the body (7) such that the coupling element (15a) may be spaced from the body of the core platform (7). The tether (6a) connects the mobile platform (4) to the body (7) via the coupling element (15a). The assembly apparatus further comprises an actuator configured to vary the length of the tether extending between the coupling element and the mobile platform to control the position of the mobile platform relative to the body of the core platform.

Abstract: The disclosure relates to fuel additive compositions including heavy paraffinic distillates and lighter petroleum distillates, in particular with the heavy paraffinic distillates including a mixture of hydrotreated and/or saturated components and solvent-dewaxed and/or branched components. The disclosure further relates to fuel compositions including the fuel additive composition and a liquid or solid combustible fuel. Related methods include methods of making the fuel compositions and methods of burning the fuel compositions. The resulting fuel compositions have several improved combustion properties such as improved combustion efficiency, improved combustion energy/calorie content, reduced sulfur generation, and reduced ash generation.

Abstract: An exemplary apparatus includes a chamber that includes a first window and a second window; a substrate holder configured to hold a substrate in the processing chamber; an infrared light (IR) source configured to generate a collimated IR beam; a first optical assembly configured to transmit the collimated IR beam into the chamber through the first window and direct the collimated IR beam at an incident angle of Brewster's angle with a front side of the substrate; and a second optical assembly configured to receive the collimated IR beam reflected at a back side of the substrate through the second window and direct the collimated IR beam to an optical sensor system.

Abstract: A system includes a plasma chamber coupled to a power source, and an impedance matching network coupled between the power source and the plasma chamber, wherein the impedance matching network comprises an L-shaped network and a first adjustable inductor coupled between an input of the plasma chamber and ground, and wherein the impedance matching network is configured such that, in a predetermined frequency range, an impedance of the impedance matching network and the plasma chamber is substantially equal to an impedance of the power source.

Abstract: A sequentially ordered gaming system, kit, or method that allows users to solve a mystery is disclosed, comprising a first objective and a physical package with evidence that enables a user to complete the first objective. A first envelope or other enclosure has a second objective and additional evidence necessary for completion of the second objective, and a second enclosure has a third objective and additional evidence necessary for completion of the third objective. A remote confirmation source is accessed by the user to input specific evidence-related information to determine completion of the objectives and to receive hints. Completion of the first, second, and third objectives in order solves the mystery. The enclosures are typically physical enclosures that are sealed to keep their evidence concealed until use. A final enclosure tells the story of the solved mystery. Evidence includes a combination of a wide variety of materials.

Abstract: A system includes a plasma chamber coupled to a power source, and an impedance matching network coupled between the power source and the plasma chamber, wherein the impedance matching network comprises an L-shaped network and a first adjustable inductor coupled between an input of the plasma chamber and ground, and wherein the impedance matching network is configured such that, in a predetermined frequency range, an impedance of the impedance matching network and the plasma chamber is substantially equal to an impedance of the power source.