Patents by Inventor John Carscadden
John Carscadden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240136152Abstract: A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a nanosecond pulser having a nanosecond pulser input; a plurality of switches coupled with the nanosecond pulser input; one or more transformers coupled with the plurality of switches; and an output coupled with the one or more transformers and providing a high voltage waveform with a amplitude greater than 2 kV and a frequency greater than 1 kHz based on the nanosecond pulser input. The nanosecond pulser system may also include a control module coupled with the nanosecond pulser input; and an control system coupled with the nanosecond pulser at a point between the transformer and the output, the control system providing waveform data regarding an high voltage waveform produced at the point between the transformer and the output.Type: ApplicationFiled: October 23, 2023Publication date: April 25, 2024Inventors: Kenneth Miller, John Carscadden, Ilia Slobodov, Timothy Ziemba, Huatsern Yeager, Eric Hanson, TaiSheng Yeager, Kevin Muggli, Morgan Quinley, James Prager, Connor Liston
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Publication number: 20240048056Abstract: Some embodiments include methods and systems for wafer biasing in a plasma chamber. A method, for example, may include: generating a first high voltage by a first pulsed voltage source using DC voltages and coupling the first high voltage to a wafer in the plasma chamber via at least one direct connection, the at least one direct connection enabling ion energy control in the plasma chamber; generating one or more of low and medium voltages by a second pulsed voltage source; coupling, capacitively, the one or more of low and medium voltages to the wafer; and pulsing the first high voltage and the one or more of low and medium voltages to achieve a configurable ion energy distribution in the wafer.Type: ApplicationFiled: August 16, 2023Publication date: February 8, 2024Inventors: Kenneth Miller, Timothy Ziemba, John Carscadden, Ilia Slobodov, James Prager
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Patent number: 11824454Abstract: Some embodiments include methods and systems for wafer biasing in a plasma chamber. A method, for example, may include: generating a first high voltage by a first pulsed voltage source using DC voltages and coupling the first high voltage to a wafer in the plasma chamber via at least one direct connection, the at least one direct connection enabling ion energy control in the plasma chamber; generating one or more of low and medium voltages by a second pulsed voltage source; coupling, capacitively, the one or more of low and medium voltages to the wafer; and pulsing the first high voltage and the one or more of low and medium voltages to achieve a configurable ion energy distribution in the wafer.Type: GrantFiled: July 1, 2021Date of Patent: November 21, 2023Assignee: Eagle Harbor Technologies, Inc.Inventors: Kenneth Miller, Timothy Ziemba, John Carscadden, Ilia Slobodov, James Prager
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Patent number: 11810761Abstract: A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a nanosecond pulser having a nanosecond pulser input; a plurality of switches coupled with the nanosecond pulser input; one or more transformers coupled with the plurality of switches; and an output coupled with the one or more transformers and providing a high voltage waveform with a amplitude greater than 2 kV and a frequency greater than 1 kHz based on the nanosecond pulser input. The nanosecond pulser system may also include a control module coupled with the nanosecond pulser input; and an control system coupled with the nanosecond pulser at a point between the transformer and the output, the control system providing waveform data regarding an high voltage waveform produced at the point between the transformer and the output.Type: GrantFiled: August 24, 2021Date of Patent: November 7, 2023Assignee: Eagle Harbor Technologies, Inc.Inventors: Ilia Slobodov, John Carscadden, Kenneth Miller, Timothy Ziemba, Huatsern Yeager, Eric Hanson, TaiSheng Yeager, Kevin Muggli, Morgan Quinley, James Prager, Connor Liston
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Publication number: 20230336085Abstract: A high voltage power system is disclosed. In some embodiments, the high voltage power system includes a high voltage pulsing power supply; a transformer electrically coupled with the high voltage pulsing power supply; an output electrically coupled with the transformer and configured to output high voltage pulses with an amplitude greater than 1 kV and a frequency greater than 1 kHz; and a bias compensation circuit arranged in parallel with the output. In some embodiments, the bias compensation circuit can include a blocking diode; and a DC power supply arranged in series with the blocking diode.Type: ApplicationFiled: June 24, 2023Publication date: October 19, 2023Inventors: Timothy Ziemba, Ilia Slobodov, Alex Henson, Morgan Quinley, John Carscadden, James Prager, Kenneth Miller
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Patent number: 11689107Abstract: A high voltage power system is disclosed. In some embodiments, the high voltage power system includes a high voltage pulsing power supply; a transformer electrically coupled with the high voltage pulsing power supply; an output electrically coupled with the transformer and configured to output high voltage pulses with an amplitude greater than 1 kV and a frequency greater than 1 kHz; and a bias compensation circuit arranged in parallel with the output. In some embodiments, the bias compensation circuit can include a blocking diode; and a DC power supply arranged in series with the blocking diode.Type: GrantFiled: March 26, 2021Date of Patent: June 27, 2023Assignee: Eagle Harbor Technologies, Inc.Inventors: Timothy Ziemba, Ilia Slobodov, Alex Henson, Morgan Quinley, John Carscadden, James Prager, Kenneth Miller
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Patent number: 11636998Abstract: Some embodiments include a high voltage pulsing power supply. A high voltage pulsing power supply may include: a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width greater than about 1 ?s, and a pulse repetition frequency greater than about 20 kHz; a plasma chamber; and an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce a pulsing an electric field within the chamber.Type: GrantFiled: January 5, 2021Date of Patent: April 25, 2023Assignee: Eagle Harbor Technologies, Inc.Inventors: Timothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, Morgan Quinley
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Patent number: 11587768Abstract: Some embodiments include a thermal management system for a nanosecond pulser. In some embodiments, the thermal management system may include a switch cold plates coupled with switches, a core cold plate coupled with one or more transformers, resistor cold plates coupled with resistors, or tubing coupled with the switch cold plates, the core cold plates, and the resistor cold plates. The thermal management system may include a heat exchanger coupled with the resistor cold plates, the core cold plate, the switch cold plate, and the tubing. The heat exchanger may also be coupled with a facility fluid supply.Type: GrantFiled: April 15, 2021Date of Patent: February 21, 2023Assignee: Eagle Harbor Technologies, Inc.Inventors: Timothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, Connor Liston
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Patent number: 11551908Abstract: A plasma deposition system comprising a wafer platform, a second electrode, a first electrode, a first high voltage pulser, and a second high voltage pulser. In some embodiments, the second electrode may be disposed proximate with the wafer platform. In some embodiments, the second electrode can include a disc shape with a central aperture; a central axis, an aperture diameter, and an outer diameter. In some embodiments, the first electrode may be disposed proximate with the wafer platform and within the central aperture of the second electrode. In some embodiments, the first electrode can include a disc shape, a central axis, and an outer diameter. In some embodiments, the first high voltage pulser can be electrically coupled with the first electrode. In some embodiments, the second high voltage pulser can be electrically coupled with the second electrode.Type: GrantFiled: June 25, 2021Date of Patent: January 10, 2023Assignee: Eagle Harbor Technologies, Inc.Inventors: Timothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, James Prager
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Patent number: 11404246Abstract: Some embodiments include a high voltage pulsing circuit comprising: a high voltage pulsing power supply; a transformer electrically coupled with the high voltage pulsing power supply; an output electrically coupled with the transformer and configured to output high voltage pulses with an amplitude greater than 1 kV and a pulse repetition frequency greater than 1 kHz; a bias compensation circuit arranged in parallel with the output the bias compensation circuit comprising; first inductance comprising the inductive elements and any stray inductance between the bias compensation circuit and the high voltage pulsing power supply; and second inductance comprising the inductive elements and any stray inductance between the bias compensation circuit and the output.Type: GrantFiled: November 16, 2020Date of Patent: August 2, 2022Assignee: Eagle Harbor Technologies, Inc.Inventors: Timothy Ziemba, Morgan Quinley, Ilia Slobodov, Alex Henson, John Carscadden, James Prager, Kenneth Miller
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Publication number: 20220020566Abstract: A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a nanosecond pulser having a nanosecond pulser input; a plurality of switches coupled with the nanosecond pulser input; one or more transformers coupled with the plurality of switches; and an output coupled with the one or more transformers and providing a high voltage waveform with a amplitude greater than 2 kV and a frequency greater than 1 kHz based on the nanosecond pulser input. The nanosecond pulser system may also include a control module coupled with the nanosecond pulser input; and an control system coupled with the nanosecond pulser at a point between the transformer and the output, the control system providing waveform data regarding an high voltage waveform produced at the point between the transformer and the output.Type: ApplicationFiled: August 24, 2021Publication date: January 20, 2022Inventors: Ilia Slobodov, John Carscadden, Kenneth Miller, Timothy Ziemba, Huatsern Yeager, Eric Hanson, TaiSheng Yeager, Kevin Muggli, Morgan Quinley, James Prager, Connor Liston
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Patent number: 11222767Abstract: A high voltage power system is disclosed. In some embodiments, the high voltage power system includes a high voltage pulsing power supply; a transformer electrically coupled with the high voltage pulsing power supply; an output electrically coupled with the transformer and configured to output high voltage pulses with an amplitude greater than 1 kV and a frequency greater than 1 kHz; and a bias compensation circuit arranged in parallel with the output. In some embodiments, the bias compensation circuit can include a blocking diode; and a DC power supply arranged in series with the blocking diode.Type: GrantFiled: December 20, 2019Date of Patent: January 11, 2022Assignee: Eagle Harbor Technologies, Inc.Inventors: Timothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, Morgan Quinley
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Publication number: 20210408917Abstract: Some embodiments include methods and systems for wafer biasing in a plasma chamber. A method, for example, may include: generating a first high voltage by a first pulsed voltage source using DC voltages and coupling the first high voltage to a wafer in the plasma chamber via at least one direct connection, the at least one direct connection enabling ion energy control in the plasma chamber; generating one or more of low and medium voltages by a second pulsed voltage source; coupling, capacitively, the one or more of low and medium voltages to the wafer; and pulsing the first high voltage and the one or more of low and medium voltages to achieve a configurable ion energy distribution in the wafer.Type: ApplicationFiled: July 1, 2021Publication date: December 30, 2021Inventors: Kenneth Miller, Timothy Ziemba, John Carscadden, Ilia Slobodov, James Prager
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Publication number: 20210351009Abstract: Some embodiments include a thermal management system for a nanosecond pulser. In some embodiments, the thermal management system may include a switch cold plates coupled with switches, a core cold plate coupled with one or more transformers, resistor cold plates coupled with resistors, or tubing coupled with the switch cold plates, the core cold plates, and the resistor cold plates. The thermal management system may include a heat exchanger coupled with the resistor cold plates, the core cold plate, the switch cold plate, and the tubing. The heat exchanger may also be coupled with a facility fluid supply.Type: ApplicationFiled: April 15, 2021Publication date: November 11, 2021Inventors: Timothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, Connor Liston
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Publication number: 20210327682Abstract: A plasma deposition system comprising a wafer platform, a second electrode, a first electrode, a first high voltage pulser, and a second high voltage pulser. In some embodiments, the second electrode may be disposed proximate with the wafer platform. In some embodiments, the second electrode can include a disc shape with a central aperture; a central axis, an aperture diameter, and an outer diameter. In some embodiments, the first electrode may be disposed proximate with the wafer platform and within the central aperture of the second electrode. In some embodiments, the first electrode can include a disc shape, a central axis, and an outer diameter. In some embodiments, the first high voltage pulser can be electrically coupled with the first electrode. In some embodiments, the second high voltage pulser can be electrically coupled with the second electrode.Type: ApplicationFiled: June 25, 2021Publication date: October 21, 2021Inventors: Timothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, James Prager
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Publication number: 20210288582Abstract: A high voltage power system is disclosed. In some embodiments, the high voltage power system includes a high voltage pulsing power supply; a transformer electrically coupled with the high voltage pulsing power supply; an output electrically coupled with the transformer and configured to output high voltage pulses with an amplitude greater than 1 kV and a frequency greater than 1 kHz; and a bias compensation circuit arranged in parallel with the output. In some embodiments, the bias compensation circuit can include a blocking diode; and a DC power supply arranged in series with the blocking diode.Type: ApplicationFiled: March 26, 2021Publication date: September 16, 2021Inventors: Timothy Ziemba, Ilia Slobodov, Alex Henson, Morgan Quinley, John Carscadden, James Prager, Kenneth Miller
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Patent number: 11101108Abstract: A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a nanosecond pulser having a nanosecond pulser input; a plurality of switches coupled with the nanosecond pulser input; one or more transformers coupled with the plurality of switches; and an output coupled with the one or more transformers and providing a high voltage waveform with a amplitude greater than 2 kV and a frequency greater than 1 kHz based on the nanosecond pulser input. The nanosecond pulser system may also include a control module coupled with the nanosecond pulser input; and an control system coupled with the nanosecond pulser at a point between the transformer and the output, the control system providing waveform data regarding an high voltage waveform produced at the point between the transformer and the output.Type: GrantFiled: April 14, 2020Date of Patent: August 24, 2021Assignee: EAGLE HARBOR TECHNOLOGIES INC.Inventors: Ilia Slobodov, John Carscadden, Kenneth Miller, Timothy Ziemba, Huatsern Yeager, Eric Hanson, TaiSheng Yeager, Kevin Muggli
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Patent number: 11075058Abstract: A plasma deposition system comprising a wafer platform, a second electrode, a first electrode, a first high voltage pulser, and a second high voltage pulser. In some embodiments, the second electrode may be disposed proximate with the wafer platform. In some embodiments, the second electrode can include a disc shape with a central aperture; a central axis, an aperture diameter, and an outer diameter. In some embodiments, the first electrode may be disposed proximate with the wafer platform and within the central aperture of the second electrode. In some embodiments, the first electrode can include a disc shape, a central axis, and an outer diameter. In some embodiments, the first high voltage pulser can be electrically coupled with the first electrode. In some embodiments, the second high voltage pulser can be electrically coupled with the second electrode.Type: GrantFiled: December 19, 2019Date of Patent: July 27, 2021Assignee: Eagle Harbor Technologies, Inc.Inventors: Timothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, James Prager
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Publication number: 20210151295Abstract: Some embodiments include a high voltage pulsing circuit comprising: a high voltage pulsing power supply; a transformer electrically coupled with the high voltage pulsing power supply; an output electrically coupled with the transformer and configured to output high voltage pulses with an amplitude greater than 1 kV and a pulse repetition frequency greater than 1 kHz; a bias compensation circuit arranged in parallel with the output the bias compensation circuit comprising; first inductance comprising the inductive elements and any stray inductance between the bias compensation circuit and the high voltage pulsing power supply; and second inductance comprising the inductive elements and any stray inductance between the bias compensation circuit and the output.Type: ApplicationFiled: November 16, 2020Publication date: May 20, 2021Inventors: Timothy Ziemba, Morgan Quinley, Ilia Slobodov, Alex Henson, John Carscadden, James Prager, Kenneth Miller
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Publication number: 20210125812Abstract: Some embodiments include a high voltage pulsing power supply. A high voltage pulsing power supply may include: a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width greater than about 1 ?s, and a pulse repetition frequency greater than about 20 kHz; a plasma chamber; and an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce a pulsing an electric field within the chamber.Type: ApplicationFiled: January 5, 2021Publication date: April 29, 2021Inventors: Timothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, Morgan Quinley