Patents by Inventor John Chao

John Chao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090075234
    Abstract: The present invention relates generally to methods of performing periodontal surgeries, and instruments for performing said surgeries. A method of performing periodontal surgery to correct a gingival defect of a patient according to a general embodiment comprises the steps of making an incision at or near a fornix of the patient near the gingival defect, inserting an instrument into the incision to detach a flap, advancing the flap horizontally without enlarging the incision, elevating a papilla within the flap, stretching the flap to cover the gingival defect, and pressing against the flap to promote fibrin formation. An instrument for performing periodontal surgery according to one general embodiment comprises a handle, a first shank connecting to and extending from the handle, a connector section, and a blade section.
    Type: Application
    Filed: September 17, 2008
    Publication date: March 19, 2009
    Inventor: John Chao
  • Publication number: 20080115949
    Abstract: This invention is directed to an improvement in a process for producing a fire suppressing mist comprised of finely divided water droplets and a fire suppressing gas in response to fires in an enclosed area. The improvement resides in the finding that one can reduce the size of water droplets generated in a nozzle system designed for generating said fire suppressing mist at low pressure by using deionized water as the water source. The fire suppressing mist can also include a low concentration of surfactant.
    Type: Application
    Filed: November 14, 2007
    Publication date: May 22, 2008
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Xianming Jimmy Li, Pingping Ma, Vincent Louis Magnotta, John Chao-Chiang Tao
  • Publication number: 20080080509
    Abstract: Customer Edge (CE) network elements can automatically learn IPSec tunnel endpoints for other CEs connected to sites in a Virtual Private Network (VPN) so that manual configuration of IPSec tunnel endpoints is not required and so that a centralized database of IPSec tunnel endpoints is not required to be separately maintained. According to an embodiment of the invention, a BGP export route policy is set on all CEs, so that when they announce their VPN routes in the standard format, the application of this export route policy changes the announcement to replace the BGP peering point address that would ordinarily be advertised with the IPSec tunnel endpoint address. When any given site receives a VPN route update formatted in this manner, it processes the VPN route update and learns from the update the IPSec tunnel endpoint as well as the associated VPN routes.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 3, 2008
    Applicant: Nortel Networks Limited
    Inventors: Bakul Khanna, John Chao, Ramasamy Jesuraj, Robert Lee
  • Publication number: 20070202460
    Abstract: An instrument for performing periodontal surgery, the instrument comprising a handle, a connector section comprising a first end and a second end, the first end connecting to the handle and a bracing member connecting to the second end of the connector section where the handle and the first end of the connector section forms a first angle; and the second end of the connector section and the planar section forms a second angle in the same direction as the second angle.
    Type: Application
    Filed: February 22, 2007
    Publication date: August 30, 2007
    Inventor: John Chao
  • Publication number: 20070031788
    Abstract: The present invention relates generally to methods of performing periodontal surgeries, and instruments for performing said surgeries. A method of performing periodontal surgery to correct a gingival defect of a patient according to a general embodiment comprises the steps of making an incision at or near a fornix of the patient near the gingival defect, inserting an instrument into the incision to detach a flap, advancing the flap horizontally without enlarging the incision, elevating a papilla within the flap, stretching the flap to cover the gingival defect, and pressing against the flap to promote fibrin formation. An instrument for performing periodontal surgery according to one general embodiment comprises a handle, a first shank connecting to and extending from the handle, a connector section, and a blade section.
    Type: Application
    Filed: August 3, 2006
    Publication date: February 8, 2007
    Inventor: John Chao
  • Publication number: 20050258183
    Abstract: A dispensing system for individual bandages includes a pack of separable adhesive bandages releasably joined at one end, and having separation strips joining adjacent bandages. A dispenser holds the pack at the one end so that individual bandages can be pulled manually out through a slot in the dispenser. The separation strip pulls the next bandage in the pack into position in the slot when one bandage is removed. The dispenser comprises a base and a cover, hinged about an axis such that the cover swings towards the opening slot. A flange element extends inwardly from the front wall of said dispenser, overlying a portion of said bandage pack so as to prevent removal of the pack from the slotted opening of said dispenser, but permit retrieval of individual bandages.
    Type: Application
    Filed: May 20, 2004
    Publication date: November 24, 2005
    Inventors: William Fienup, John Chao, Paula Echeverri, Brian Hennessey, Christopher McFadden, Frances Rivera-Myers, Andrey Slivinskiy
  • Patent number: 6599842
    Abstract: A method for processing a substrate disposed in a substrate processing chamber to modify the contour of a trench formed on the substrate. The substrate processing chamber is the type that has a coil and a plasma generation system including a source power system operatively coupled to the coil and a bias power system operatively coupled to the substrate process chamber. The method includes transferring the substrate into the substrate process chamber. Thereafter, the substrate is exposed to a plasma formed from a first process gas consisting essentially of a sputtering agent by applying RF energy from the source power system to the coil. The plasma is biased toward the substrate by applying bias power to the substrate process chamber. Thereafter, the substrate is exposed to a plasma formed from a second process gas without applying bias power or applying minimal bias power to the substrate process chamber.
    Type: Grant
    Filed: November 29, 1999
    Date of Patent: July 29, 2003
    Assignee: Applied Materials, Inc.
    Inventors: John Chao, Mohit Jain, Jeffrey D. Chinn
  • Patent number: 6491835
    Abstract: The present disclosure provides a method for etching trenches, contact vias, or similar features to a depth of 100 &mgr;m and greater while permitting control of the etch profile (the shape of the sidewalls surrounding the etched opening). The method requires the use of a metal-comprising masking material in combination with a fluorine-comprising plasma etchant. The byproduct produced by a combination of the metal with reactive fluorine species must be essentially non-volatile under etch process conditions, and sufficiently non-corrosive to features on the substrate being etched, that the substrate remains unharmed by the etch process. Although aluminum is a preferred metal for the metal-comprising mask, other metals can be used for the masking material, so long as they produce an essentially non-volatile, non-corrosive etch byproduct under etch process conditions.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: December 10, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Ajay Kumar, Anisul Khan, Wei Liu, John Chao, Jeff Chinn
  • Publication number: 20020106845
    Abstract: A method for processing a substrate disposed in a substrate processing chamber to modify the contour of a trench formed on the substrate. The substrate processing chamber is the type that has a coil and a plasma generation system including a source power system operatively coupled to the coil and a bias power system operatively coupled to the substrate process chamber. The method includes transferring the substrate into the substrate process chamber. Thereafter, the substrate is exposed to a plasma formed from a first process gas consisting essentially of a sputtering agent by applying RF energy from the source power system to the coil. The plasma is biased toward the substrate by applying bias power to the substrate process chamber. Thereafter, the substrate is exposed to a plasma formed from a second process gas without applying bias power or applying minimal bias power to the substrate process chamber.
    Type: Application
    Filed: November 29, 1999
    Publication date: August 8, 2002
    Inventors: JOHN CHAO, MOHIT JAIN, JEFFREY D. CHINN