Patents by Inventor John Chern

John Chern has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7521330
    Abstract: A method for forming a capacitor includes forming a dielectric layer over a substrate. A conductive layer is formed over the dielectric layer. Dopants are implanted through at least one of the dielectric layer and the conductive layer after forming the dielectric layer so as to form a conductive region under the dielectric layer, wherein the conductive layer is a top electrode of the capacitor and the conductive region is a bottom electrode of the capacitor.
    Type: Grant
    Filed: June 4, 2007
    Date of Patent: April 21, 2009
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chun Chieh Wu, Chi-Feng Huang, Chun-Hung Chen, Chih-Ping Chao, John Chern
  • Publication number: 20080299723
    Abstract: A method for forming a capacitor includes forming a dielectric layer over a substrate. A conductive layer is formed over the dielectric layer. Dopants are implanted through at least one of the dielectric layer and the conductive layer after forming the dielectric layer so as to form a conductive region under the dielectric layer, wherein the conductive layer is a top electrode of the capacitor and the conductive region is a bottom electrode of the capacitor.
    Type: Application
    Filed: June 4, 2007
    Publication date: December 4, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: C. C. Wu, Chi-Feng Huang, Chun-Hung Chen, Chih-Ping Chao, John Chern
  • Patent number: 7071478
    Abstract: A method and system is disclosed for directing charged particles on predetermined areas on a target semiconductor substrate. After aligning a wafer mask with a semiconductor wafer, with the wafer mask having one or more mask patterns thereon, the charged particles are directed to pass through the mask patterns to land on one or more selected areas on the semiconductor wafer.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: July 4, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wen Chin Lin, Denny Tang, Li-shyue Lai, John Chern, Jyh-Chyurn Guo, Wan-Yih Lien
  • Publication number: 20050218346
    Abstract: A method and system is disclosed for directing charged particles on predetermined areas on a target semiconductor substrate. After aligning a wafer mask with a semiconductor wafer, with the wafer mask having one or more mask patterns thereon, the charged particles are directed to pass through the mask patterns to land on one or more selected areas on the semiconductor wafer.
    Type: Application
    Filed: April 2, 2004
    Publication date: October 6, 2005
    Inventors: Wen Lin, Denny Tang, Li-shyue Lai, John Chern, Jyh-Chyurn Guo, Wan-Yih Lien
  • Patent number: 6888063
    Abstract: Disclosed is a semiconductor radio frequency (RF) device having a shielding structure for minimizing coupling between RF passive components and conductive routing for active components. In one example, the device includes at least one shielding layer formed between the RF passive components and conductive routing. The shielding layer includes at least one opening. In another example, a second shielding layer may be used. The second shielding layer may also have an opening, and the openings in the first and second shielding layers may be offset from one another. The first and second shielding layers may be connected to each other through a guard ring, and may also be connected to a common voltage potential.
    Type: Grant
    Filed: April 14, 2004
    Date of Patent: May 3, 2005
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wai-Yi Lien, Chung-Long Chang, Jyh-Chyurn Guo, John Chern
  • Publication number: 20050082075
    Abstract: Disclosed is a semiconductor radio frequency (RF) device having a shielding structure for minimizing coupling between RF passive components and conductive routing for active components. In one example, the device includes at least one shielding layer formed between the RF passive components and conductive routing. The shielding layer includes at least one opening. In another example, a second shielding layer may be used. The second shielding layer may also have an opening, and the openings in the first and second shielding layers may be offset from one another. The first and second shielding layers may be connected to each other through a guard ring, and may also be connected to a common voltage potential.
    Type: Application
    Filed: April 14, 2004
    Publication date: April 21, 2005
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wai-Yi Lien, Chung-Long Chang, Jyh-Chyurn Guo, John Chern