Publication number: 20070149437
Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit Compositions are provided that include a substrate having a RF-composition thereover.
Type:
Application
Filed:
January 28, 2005
Publication date:
June 28, 2007
Inventors:
Janet Boggs, Stephan Brandstadter, John Chien, Vimal Sharma, E. Bradley Edwards, Victoria Hedrick, Andrew Jackson, Gregory Leman, Edward Norman, Robert Kaufman