Abstract: An inspection method, and corresponding apparatus, enables classification of pupil images according to a process variable. The method comprises acquiring diffraction pupil images of a plurality of structures formed on a substrate during a lithographic process. A process variable of the lithographic process varies between formation of the structures, the variation of the process variable resulting in a variation in the diffraction pupil images. The method further comprises determining at least one discriminant function for the diffraction pupil images, the discriminant function being able to classify the pupil images in terms of the process variable.

Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured. The intensity of each of the first diffraction orders from the diffraction spectrum are compared to determine overlay (or other properties) of exposed layers on the substrate.

Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured. The intensity of each of the first diffraction orders from the diffraction spectrum are compared to determine overlay (or other properties) of exposed layers on the substrate.

Abstract: An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions.

Abstract: A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n?), p(n?) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.

Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.

Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.

Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.

Abstract: An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions.

Abstract: A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n?), p(n?) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.

Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.

Abstract: The invention relates to a method for correcting positioning errors in rock drilling, and a rock drilling equipment. Deviation of the boom position from the theoretical position is measured as a function of the position of at least one boom joint, the measured deviations are stored in the memory of the drilling rig, and when the boom is positioned to the drilling position, its position is corrected on the basis of the stored deviation. The drilling equipment includes a memory for storing the deviations between the true position of the boom and the theoretical position calculated on the basis of the joint sensor values, and a calculating device for correcting the boom position on the basis of the deviations stored in the memory of the drilling rig.

Abstract: A method and system for controlling one or more devices (104, 106, 108 and 110) in a network (100) is provided. The method includes accessing (304) weather-forecast data. Further, the method includes scheduling (306) operation of the one or more devices in the network as a function of the weather-forecast data.

Abstract: Methods, systems and apparatus for photo-processing of fluids, particularly complex fluids, such as blood products, pharmaceuticals, injectables and vaccines, are provided. The disclosed methods and systems employ non-laser light source(s) to generate monochromatic light energy, preferably in the range of 260 nm to 310 nm, for fluid treatment. Advantageous processing regimens and/or adjunct additives and/or agents may also be used to achieve desired and/or enhanced results, e.g., inactivation of pathogens, bacteria and/or viruses, modulation of immune response, and/or leukoreduction. Particularly preferred embodiments include specific wavelengths, novel temperature control systems and geometric/structural arrangements that provide enhanced processing results and/or efficiencies.

Abstract: A monitoring system includes a sensor arrangement for monitoring first and second adjacent members that are displaceable with respect to one another, The sensor includes a magnet securable to the first adjacent member and an analog magnetic transducer securable to the second adjacent member in sufficient proximity of the permanent magnet to sense a magnetic field therefrom. An analog subsystem supplies electrical power to the magnetic transducer and receives an electrical signal generated by the transducer in response to a change in the magnetic field detected by the magnetic transducer. The analog subsystem including a comparator for comparing the detected change in the magnetic field to a predefined threshold change in magnetic field and an electronic memory for storing the predefined threshold change in magnetic field.

Abstract: A method and apparatus of providing combined secure access and command execution for an electronic device is disclosed. Fingerprint representation data from a user is received. The user is authenticated when the fingerprint representation data received from the user matches user fingerprint data. A determination is made as to whether a user command is associated with the user fingerprint data when the fingerprint representation data received from the user matches the user fingerprint data. The user command is executed when the user command is associated with the user fingerprint data.

Abstract: A bridge apparatus is provided that interfaces the home network to the wireless network. The bridge apparatus is separate from the security panel module, and includes a processor that translates commands received from the home network control unit into wireless network commands and transmits the wireless network commands over a wireless network to a security monitoring service center or to a health monitoring service center, depending on whether the commands relate to detected security conditions or detected health conditions.

Abstract: An apparatus for use in a wired security system includes a bridge. The bridge includes a network interface for receiving a wired status signal from at least one sensor employed in the wired security system and a first processor for converting the wired status signal to a wireless status signal in conformance with a prescribed protocol. A wireless transmitter is provided for transmitting the wireless status signal. The apparatus also includes a controller. The controller has a receiver for receiving the wireless status signal from the bridge a second processor for interpreting the status of the wireless status signal.

Abstract: A network controller is provided. The controller includes a network interface for transmitting and receiving messages over a network between the networked controller and each of a plurality of networked devices. A first of the networked devices has a time of day event notification indicator. A processor is operatively associated with the network interface. The processor is configured to perform a method including the step of receiving a first message over the network from the first networked device. The message includes a time of day at which the event notification indicator is set. A second message is transmitted over the network to a second of the networked devices instructing the second networked device to perform a prescribed function at a desired time based on the time of day at which the event notification indictor is set. A user interface is operatively associated with the processor for adjusting user-controllable parameters.

Abstract: This invention relates to a process for the purification of phenols in a feedstock containing phenols and neutral oils and/or tar bases. The process includes liquid-liquid extraction of feedstock using a solvent and a counter-solvent, and separating the resulting solvent and counter-solvent layers. Phenols are then recovered from the separated solvent layer, and counter-solvent is recovered form the counter-solvent layer. The process also includes at least one of the following additions steps i) subjecting the separated solvent layer to distillation at atmospheric pressure; ii) subjecting the separated solvent layer to distillation, recovering an organic phase from the overheads product of the distillation step and recycling it to the liquid-liquid extraction step; and iii) recovering solvent from the counter-solvent layer.