Abstract: One aspect of the application provides a system and method for facilitating a selective extraction of design layout. During operation, the system can generate, based on an electronic circuit design, a first list of nets and a first design layout corresponding to the electronic circuit design. The system can receive, via one or more user interactive elements on a graphical user interface, a list of nets including a first subset of nets from the first list of nets. Further the system can determine, based on the second list of nets, a set of leaf-cells. The system may extract the first subset of the nets and the set of leaf-cells from the first design layout and copy them to a new display on the graphical user interface to represent a new design layout. The system can then provide the new design layout to a layout parameter extraction process.

Abstract: The present invention provides a method for performing design rule check (DRC) of an integrated circuit. A design layout of the integrated circuit is provided. The integrated circuit includes a complex circuit. A DRC tool is used to compare a portion of the design layout with a reference layout containing an accurate implementation of the complex circuit. The portion of the design layout corresponds to the complex circuit.

Abstract: A method and computer program product for parasitic extraction from a previously calculated capacitance solution include steps of: (a) receiving as input a design database for an integrated circuit design; (b) receiving as input a first set of operating conditions and a second set of operating conditions for the integrated circuit design; (c) calculating a first resistance solution and a single capacitance solution from the design database and the first set of operating conditions; (d) performing a parasitic extraction of the first resistance solution and the single capacitance solution to generate a first set of parasitic values; (e) calculating a second resistance solution from the design database and the second set of operating conditions; (f) performing a parasitic extraction of the second resistance solution and the single capacitance solution to generate a second set of parasitic values; and (g) generating as output the first set of parasitic values and the second set of parasitic values.

Abstract: A method of calculating delay for a process variation includes finding a value for each of exactly two independent variables that results in a maximum or minimum variation of estimated cell delay plus net delay, calculating a variation of resistance from the value found for each of the exactly two independent variables, calculating a variation of capacitance from the value found for each of the exactly two independent variables, adding the calculated variation of resistance to a net resistance to generate a modified net resistance for a selected net, adding the calculated variation of capacitance to a net capacitance to generate a modified net capacitance for the selected net, and calculating the cell delay plus net delay from the modified net resistance and the modified net capacitance.

Abstract: A method of calculating delay for a process variation includes finding a value for each of exactly two independent variables that results in a maximum or minimum variation of estimated cell delay plus net delay, calculating a variation of resistance from the value found for each of the exactly two independent variables, calculating a variation of capacitance from the value found for each of the exactly two independent variables, adding the calculated variation of resistance to a net resistance to generate a modified net resistance for a selected net, adding the calculated variation of capacitance to a net capacitance to generate a modified net capacitance for the selected net, and calculating the cell delay plus net delay from the modified net resistance and the modified net capacitance.