Abstract: Disclosed are apparatus and methods for the generation of a stage speed profile and/or the selection of care areas for automated wafer inspection. The stage speed profile generated corresponds to a fastest speed the inspection machine is able to inspect provided a set of care areas. The set of care areas selected correspond to specific regions on the wafer which are to be imaged in detail by the inspection machine. The apparatus and methods herein may also calculate speed of inspection and coverage (and possibly other characteristics of the inspection) for a quantity of cases, and select the best trade-off of coverage versus inspection time using a cost function. Other aspects, features, and embodiments of the invention are also disclosed.

Abstract: The present disclosure provides an electron beam column with substantially improved resolution and/or throughput for inspecting manufactured substrates. The electron beam column comprises an electron gun, a scanner, an objective lens, and a detector. In accordance with one embodiment, the electron gun includes a gun lens having a flip-up pole piece configuration. In accordance with another embodiment, the scanner comprises a dual scanner having a pre-scanner and a main scanner, and the detector may be configured between the electron gun and the pre-scanner. In accordance with another embodiment, the electron beam column includes a continuously-variable aperture configured to select a beam current. Other embodiments relate to methods of using an electron beam column for automated inspection of manufactured substrates. In one embodiment, for example, an aperture size is adjusted to achieve a minimum spot size given a selected beam current and a column-condition domain being used.

Abstract: A constant lumen output control system for providing a constant lumen output throughout the life of a lamp at the mean or preset lumen level. The lumen con system (315) coupled to a lamp driver (310) initially reduces the power to the lamp (330) to prevent the lamp from being operated at power levels that result excess mean or preset lumen levels. With increased lamp usage, the lumen control system gradually increases power to the lamp to compensate for lamp lumen depreciation due to light-reducing mechanisms. By compensating for lamp lumen depreciation the lamp is operated at a constant mean or preset lumen output throughout the life of the lamp.

Abstract: One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.

Abstract: One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.

Abstract: A constant lumen output control system for providing a constant lumen output throughout the life of a lamp at the mean or preset lumen level. The lumen con system (315) coupled to a lamp driver (310) initially reduces the power to the lamp (330) to prevent the lamp from being operated at power levels that result excess mean or preset lumen levels. With increased lamp usage, the lumen control system gradually increases power to the lamp to compensate for lamp lumen depreciation due to light-reducing mechanisms. By compensating for lamp lumen depreciation the lamp is operated at a constant mean or preset lumen output throughout the life of the lamp.

Abstract: Disclosed are methods and apparatus for detecting a relatively wide dynamic range of intensity values from a beam (e.g., scattered light, reflected light, or secondary electrons) originating from a sample, such as a semiconductor wafer. In other words, the inspection system provides detected output signals having wide dynamic ranges. The detected output signals may then be analyzed to determine whether defects are present on the sample. For example, the intensity values from a target die are compared to the intensity values from a corresponding portion of a reference die, where a significant intensity difference may be defined as a defect. In a specific embodiment, an inspection system for detecting defects on a sample is disclosed. The system includes a beam generator for directing an incident beam towards a sample surface and a detector positioned to detect a detected beam originating from the sample surface in response to the incident beam.

Abstract: Disclosed are methods and apparatus for detecting a relatively wide dynamic range of intensity values from a beam (e.g., scattered light, reflected light, or secondary electrons) originating from a sample, such as a semiconductor wafer. In other words, the inspection system provides detected output signals having wide dynamic ranges. The detected output signals may then be analyzed to determine whether defects are present on the sample. For example, the intensity values from a target die are compared to the intensity values from a corresponding portion of a reference die, where a significant intensity difference may be defined as a defect. In a specific embodiment, an inspection system for detecting defects on a sample is disclosed. The system includes a beam generator for directing an incident beam towards a sample surface and a detector positioned to detect a detected beam originating from the sample surface in response to the incident beam.

Abstract: A system for promoting passive end of life light source failure in response to thermal cycling of the light source includes an automatic relay in communication with a ballast or groups thereof for interrupting power to the associated light sources. Alternatively, the relay may be configured to short out the light source directly. The automatic relays are configured to turn off associated light sources at predetermined or random times for predetermined or random durations.

Abstract: A system and method for providing an alternate AC voltage to an electrical load having a main AC voltage. The system and method include a signal generator for generating a main AC voltage signal representing the value of the main AC voltage, and a processor for processing the main AC voltage signal to determine a status of the main AC voltage, a main AC voltage failure time period, and a main AC voltage restoration time period. The system and method also include a control signal generator for generating a control signal in response to the main AC voltage signal, the main AC voltage failure time period, the main AC voltage restoration time period, and a pre-selected delay time period, and a switch for switching the electrical load between the main AC voltage and the alternate AC voltage in response to the control signal.

Abstract: A system and method for controlling a DC to AC voltage inverter. The system and method include an inverter for generating a pulse width modulated (PWM) waveform to convert a DC input voltage to an AC output voltage suitable for use with a non-linear electrical load, and a signal generator for generating a AC output voltage signal representing the AC output voltage. The system and method further include a processor for processing the AC output voltage signal to select the PWM waveform, and a control signal generator for generating a control signal based on the PWM waveform selected operative to control the inverter for generating a PWM waveform.

Abstract: A method and system of converting a wide range of DC input voltages from a DC power source to a substantially lower regulated DC output voltage is disclosed. A pulse width modulated (PWM) signal is generated from an applied DC input voltage to obtain a desired regulated DC output voltage. The PWM signal has a fixed frequency and a variable duty cycle. The PWM signal is filtered to provide a DC output voltage proportional to the amount of time the PWM signal spent in the ON or HIGH state. The duty cycle of the PWM signal is controlled based on an error signal generated by comparing an error voltage level that is proportional to the output voltage to a voltage reference. High voltage protection is provided to the controller during the period the PWM signal is in the OFF or LOW state.

Abstract: In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and second patterns in a region of the surface of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern.

Abstract: In each configuration, at least one TDI sensor is used to image the portions of interest of the substrate that are substantially uniformly or critically illuminated. In one configuration, the substrate is compared to the expected characteristic features prestored in memory. In a second configuration, a first and second pattern in a region of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern. With each comparison whether there has been agreement between the two patterns is noted.

Abstract: In a method of making lengths of smoking-material rod, particularly cigaret lengths, smoking material and wrapper-web material are each continuously fed to a rod maker operable to wrap and seam-seal the wrapper material about the smoking material to provide smoking material rod which is then fed to a cutter for cutting the rod into lengths. Smoke-modifying agent is applied by spray intermittently to one of the materials during their feeding to the rod maker so that, in each of the lengths, the smoke-modifying agent is distributed over one end zone which is accounted for by a few puffs, in the smoking of the length. The smoke modifying agent is of low volatility and low porosity migration.

Abstract: Substrate inspection apparatus and methods, and illumination apparatus. The inspection apparatus and method includes memory for storing the desired features of the surface of the substrate, focussed illuminator for substantially uniformly illuminating a region of the surface of the substrate to be inspected. Additionally there is a sensor for imaging the region of the substrate illuminated by the illuminator, and a comparator responsive to the memory and sensor for comparing the imaged region of the substrate with the stored desired features of the substrate. The illumination apparatus is designed to provide substantially uniform focussed illumination along a narrow linear region. This apparatus includes first, second and third reflectors elliptically cylindrical in shape, each with its long axis substantially parallel to the long axes of each of the others.

Abstract: A smoking article, such as a cigarette, has a filter which incorporates a volatile smoke-modifying agent. The filter comprises zeolite granules impregnated with the volatile agent. A cavity-type of filter may contain between 10 and 200 mg of mentholated zeolite granules. The loading level of a menthol on the zeolite granules may be within a range of from 3 to 60 mg/g. Cellulose-acetate plugs may be provided at the ends of the filter cavity.

Abstract: A single lighting fixture for mounting in front of a large billboard having a horizontal length approximately two times as long as its vertical length is disclosed. The lighting fixture comprises a lamp housing having a lamp positioned therein with the lamp being approximately horizontally positioned in the housing. A new and novel reflector is positioned on one side of the lamp is designed to reflect the light radiating from the lamp in such a manner that the bottom surface of the reflector is utilized to light up the approximate central portion of the billboard while the sides of the reflector are used to light triangular shaped side corners of the billboard. A refractor is positioned on the lamp housing to totally enclose the lamp with the refractor comprising in part three phase light control prism elements for stray light control.

Abstract: Substrate inspection apparatus and methods, and illumination apparatus. The inspection apparatus and method includes memory for storing the desired features of the surface of the substrate, focussed illuminator for substantially uniformly illuminating a region of the surface of the substrate to be inspected. Additionally there is a sensor for imaging the region of the substrate illuminated by the illuminator, and a comparator responsive to the memory and sensor for comparing the imaged region of the substrate with the stored desired features of the substrate. The illumination apparatus is designed to provide substantially uniform focussed illumination along a narrow linear region. This apparatus includes first, second and third reflectors elliptically cylindrical in shape, each with its long axis substantially parallel to the long axes of each of the others.