Patents by Inventor John D. Kulick

John D. Kulick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5594237
    Abstract: A PIN detector for use in the communications industry having increased linearity and increased maximum optical power detection levels without distortion is disclosed herein. To this end, a PIN structure having a high carrier mobility quaternary material cap layer and a ternary photosensitive layer is disclosed that overcomes the limitations of low mobility devices as described above. The quaternary materials have much greater carrier mobility than InP material and thereby a much shorter carrier transit time across these layers. This reduced carrier transit time effect results in a much more linear response and accordingly greatly reduced intermodulation distortion.
    Type: Grant
    Filed: February 24, 1995
    Date of Patent: January 14, 1997
    Assignee: The Whitaker Corporation
    Inventors: John D. Kulick, Eric S-F. Mak
  • Patent number: 5264397
    Abstract: A method for activating the zinc dopant in an active layer of a Group III/Group V semiconductor device comprises forming a layer of zinc doped Group III/Group IV material, and thereafter annealing the layer at a predetermined temperature and for a predetermined time sufficient to convert inactive zinc in the layer to acceptor zinc. In a preferred embodiment of the invention, a method for activating zinc dopant in the active layer of an InP-InGaAsP double heterostructure comprises annealing the active layer at a temperature of about 625.degree. C. for at least about 190 seconds which converts inactive zinc to acceptor zinc without substantially decreasing the total zinc in the active layer. In another preferred embodiment, a method for increasing the power output of InP-InGaAsP optoelectronic semiconductor device, such as a laser or an LED having a zinc doped active layer, comprises annealing the active layer of the semiconductor device at a temperature of about 625.degree. C. for at least about 190 seconds.
    Type: Grant
    Filed: February 15, 1991
    Date of Patent: November 23, 1993
    Assignee: The Whitaker Corporation
    Inventors: Shwu L. Lin, John D. Kulick, Randall B. Wilson
  • Patent number: 5130762
    Abstract: An integrated semiconductor device comprising a light emitting portion and a light detecting portion is disclosed. The integrated semiconductor device comprises two multiple quantum well P-I-N structures formed on a single substrate, one of the P-I-N structures being forward biased to emit light and the other of the P-I-N structures being reverse biased to detect light. Because of the quantum confined Stark effect, the reversed biased P-I-N structures is highly absorbing to light emitted by the forward biased P-I-N structure. The integrated semiconductor device may be utilized to implement an optical feedback path for a receiver.
    Type: Grant
    Filed: November 20, 1990
    Date of Patent: July 14, 1992
    Assignee: AMP Incorporated
    Inventor: John D. Kulick