Abstract: A method of removing photoresist (20) from a metal layer (16) formed on a substrate (1) and having a pattern defined by means of a corrosive gas plasma etch. The method consists of etching the resist (20) in an oxygen gas plasma for a period of time and at a sufficiently high temperature to remove all residual corrosive gas absorbed in the photoresist and below the temperature at which the metal beings to flow. An etching time of 3 minutes at 300.degree. C. is typically used.

Abstract: Triazole compounds useful as plant growth regulators of the formula ##STR1## and stereoisomers thereof, wherein R.sup.1 is selected from alkyl and haloalkyl groups, R.sup.2 is hydrogen, and R.sup.3 is a tertiary butyl group optionally substituted by halogen; and acid addition salts, and metal complexes thereof.

Abstract: A triazole derivative having the general formula (I): ##STR1## and stereoisomers thereof, wherein R.sup.1 is an alkyl group containing from 3 to 6 carbon atoms, or a haloalkyl group containing from 2 to 5 carbon atoms, or a group --CH.sub.2 --Z where in Z is a cycloalkyl group containing from 3 to 5 carbon atoms, R.sup.1 containing primary or secondary carbon atoms only; R.sup.2 is hydrogen or an alkyl group containing from 1 to 4 carbon atoms; and R.sup.3 is a tertiary butyl group optionally substituted by halogen; and salts, esters and metal complexes of the compound of formula (I) wherein R.sup.2 is hydrogen. These compounds are useful as plant growth regulating agents.

Abstract: Compounds having the general formula (I): ##STR1## and stereoisomers thereof, wherein R.sup.1 and R.sup.2 are each hydrogen, a cation, alkyl, cycloalkyl, aryl or aralkyl optionally substituted with halogen, nitro, alkyl, haloalkyl, alkoxy, haloalkoxy, phenyl, phenoxy, halophenyl or halophenoxy, or together form a ring; R.sup.3 and R.sup.4 are each hydrogen, alkyl, cycloalkyl, heterocyclyl, aryl or aralkyl optionally substituted with halogen, nitro, alkyl, haloalkyl, alkoxy, haloalkoxy, phenyl, phenoxy, halophenyl or halophenoxy; W is N or CH; X is oxygen or sulphur; ester and ether derivatives of the alcohol; and its acid addition salts and metal complexes. The compounds are useful as fungicides and for plant growth regulation.

Abstract: Compounds useful as plant growth regulators and fungicides and having the formula ##STR1## and stereoisomers thereof, wherein W is --CH.dbd. or .dbd.N--; Q is optionally substituted aryl, especially optionally substituted phenyl, or optionally substituted aralkyl or alkyl; R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6, which may be the same or different, are H, optionally substituted alkyl, cycloalkyl, aralkyl or phenyl; R.sup.7 and R.sup.8 are H, alkyl or optionally substituted phenyl; and acid addition salts and metal complexes thereof, and processes and intermediates for their preparation.