Abstract: A system for predicting occurrence of earthquakes greater than magnitude 4.5 within 24-48 hours includes a plurality of sensor stations in communication with a data center. The sensor stations collect data from three induction magnetometers, two ion detectors (positive and negative), a geophone, and temperature and humidity sensors. Infrared data for the area around the station is also collected and evaluated at the data center. Other sensors may be deployed to detect, identify, and eliminate signals that are attributed to noise. Noise sources may include solar storms, lightning, vehicles, electric trains, and other local machinery or man-made sources. Using the captured data, the data center applies signal-processing algorithms to identify patterns in the collected data that match known data patterns which have immediately preceded earthquakes.

Abstract: A system for predicting occurrence of earthquakes greater than magnitude 4.5 within 24-48 hours includes a plurality of sensor stations in communication with a data center. The sensor stations collect data from three induction magnetometers, two ion detectors (positive and negative), a geophone, and temperature and humidity sensors. Infrared data for the area around the station is also collected and evaluated at the data center. Other sensors may be deployed to detect, identify, and eliminate signals that are attributed to noise. Noise sources may include solar storms, lightning, vehicles, electric trains, and other local machinery or man-made sources. Using the captured data, the data center applies signal-processing algorithms to identify patterns in the collected data that match known data patterns which have immediately preceded earthquakes.

Abstract: In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have different first and second indices of refraction, respectively. The first fluid is provided between a substrate and the transparent plate and has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided between the transparent plate and the optical element and has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction and may be equal to the first index of refraction or the second index of refraction.

Abstract: In a lithographic projection apparatus, a space between an optical element of a projection system is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided in a space between a substrate and the transparent plate and preferably has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided in a space between the transparent plate and the optical element and preferably has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction. The third index of refraction may be equal to the first index of refraction or the second index of refraction.

Abstract: In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided between a substrate and the transparent plate and has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided between the transparent plate and the optical element and has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction and may be equal to the first index of refraction or the second index of refraction. A device manufacturing method includes filling a space between the optical element and the substrate with at least two fluids having different indices of refraction.

Abstract: In a lithographic projection apparatus, a space between an optical element of a projection system is filled with a first fluid and a second fluid separated by a translucent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided in a space between a substrate and the translucent plate and preferably has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided in a space between the translucent plate and the optical element and preferably has an index of refraction similar to the index of refraction of the optical element. The translucent plate has a third index of refraction between the first and second indices of refraction. The third index of refraction may be equal to the first index of refraction or the second index of refraction.