Abstract: A sensor comprises a sensor layer comprising a ceramic material; an adhesion layer comprising chromium, the adhesion layer adhered to one or more portions of a liquid facing surface of the sensor layer; and an isolator film comprising a polymer, the isolator film overlaying a liquid facing surface of the adhesion layer. The isolator film may be used to protect the sensor from corrosive and high temperature fluids, for example to protect the sensor from long term exposure to hot water between 85° C. and 100° C.

Abstract: A sensor comprises a sensor layer comprising a ceramic material; an adhesion layer comprising chromium, the adhesion layer adhered to one or more portions of a liquid facing surface of the sensor layer; and an isolator film comprising a polymer, the isolator film overlaying a liquid facing surface of the adhesion layer. The isolator film may be used to protect the sensor from corrosive and high temperature fluids, for example to protect the sensor from long term exposure to hot water between 85° C. and 100° C.

Abstract: The present invention is directed to an apparatus for combining a component from a fluid composition with a reactive fluid. The apparatus includes a hollow fiber contactor (142) having a plurality of hollow fibers contained within a housing. A reactive fluid (224), which may be on the shell or lumen side of the hollow fiber membrane, is included in the apparatus and is used for combining with a component from a fluid composition which is on the opposite side of the membrane from the reactive liquid. The reactive liquid combines with one or more components from the fluid composition and can be used for purification of the fluid composition or for the preparation of chemical reagents.

Abstract: A device and method for increasing the mass transport rate of a chemical or electrochemical process at the solid and fluid interface in a fluid cell. The device includes a membrane in close contact with surface of the work piece, to separate the process cell into two chambers, so that fluid velocity at the work piece is controlled separately from the main cell flow. Thus the diffusion boundary layer is controlled and minimized by the rate that fluid is withdrawn from the work piece chamber.

Abstract: This invention relates to an apparatus for conditioning the temperature of a fluid by utilizing a thermoplastic heat exchanger (50) comprised of a plurality of hollow tubes. The apparatus controls the temperature of a process fluid inside the heat exchanger (50) via a controller (46) by adjustment of a control valve (64) that regulates the flow of an exchange fluid. The apparatus can be used to maintain the temperature of a chemical bath (12) and also to prepare discreet dispensed volumes of temperature controlled liquid.

Abstract: An apparatus and method for measuring the vapor or gas content of a vacuum chamber (1) by a vapor sensor (21) located in the fore-line of a vacuum system is provide. The gas or vapor content is determined by first providing a zero condition for the sensor using the vacuum pump (25) and them referencing the sensor response to the chamber gas during the evacuation cycle.

Abstract: The present invention provides a system and method for selectively removing one or more organic and inorganic and also preferably one or more inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or in conjunction with a catalyst to oxidize organic contaminants in the plating bath to a level such that the electroplating bath can be recovered and reused after appropriate chemical adjustment. The oxidative treatment method may be a continuous process or a batch process that is performed in a single pass. Residual organics, if desired and chloride ions in the bath are removed from the solution by a chemisorption or physisorption treatment. Inorganic contaminants are removed from the electroplating bath by selective ion exchange resins or electrodialysis, while particulate and suspended colloidal particles are removed by filtration before the treated plating bath is recycled.

Abstract: This invention relates to an apparatus for conditioning the temperature of a fluid by utilizing a thermoplastic heat exchange apparatus comprised of a plurality of hollow tubes. The apparatus controls the temperature of a process fluid inside the heat exchanger by adjustment of a control valve that regulates the flow of an exchange fluid. The apparatus can be used to maintain the temperature of chemical baths and also to prepare discreet dispensed volumes of temperature controlled liquid. The device is chemically inert and has the ability to operate at elevated temperatures and also with corrosive and oxidizing liquids.

Abstract: The present invention provides a process and liquid composition for selectively removing a metal film from a patterned substrate. The process, which is useful in the manufacture of semiconductor devices and circuits, comprises chemically reacting the metal film with a liquid and then removing the reaction product from the metal surfaces using a polishing pad. The present invention further provides a process to polish a metal surface in separate stages and at different rates by changing the chemical composition of the liquid.

Abstract: The present invention provides a process for forming inlaid patterns of metal into specified areas of a patterned substrate. The process, which is useful in the manufacture of semiconductor devices and circuits, comprises selectively removing seed layer from all surfaces save the trenches and vias and selectively electroless plating a metal into the patterned substrate where the seed layer remains. The present invention further provides an abrasive-free polishing-pad configured to planarize a metal plated surface, agitate chemical reagents and facilitate removal of gases generated by the electroless plating process.

Abstract: An apparatus and method for measuring the vapor or gas content of a vacuum chamber (1) by a vapor sensor (21) located in the fore-line of a vacuum system is provide. The gas or vapor content is determined by first providing a zero condition for the sensor using the vacuum pump (25) and them referencing the sensor response to the chamber gas during the evacuation cycle.

Abstract: A process and system are provide for determining the acceptability of a fluid dispense such as a discrete volume of fluid used to coat a substrate. The fluid dispense is exposed to an energy source and the energy transmitted by the fluid dispense is detected to determine the shape of the fluid dispense. The fluid dispense shape and the timing of the beginning and end of the dispense are compared to previously generated standard dispense profiles and used to determine the acceptability of the shape and/or timing of the fluid dispense. The output from the sensor is used to control further processing of the substrate.

Abstract: The present invention provides a system and method for selectively removing one or more organic and also preferably one or more inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or in conjunction with a catalyst to oxidize organic contaminants in the plating bath to a level such that the electroplating bath can be recovered and reused after appropriate chemical adjustment. The oxidative treatment method may be a continuous process or a batch process that is performed in a single pass and the endpoint of the oxidative process detected by a sensor. Residual organics, if desired, and chloride ions in the bath are removed from the solution by a chemisorption or physisorption treatment.

Abstract: The present invention provides a system and method for selectively removing one or more organic and inorganic and also preferably one or more inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or in conjunction with a catalyst to oxidize organic contaminants in the plating bath to a level such that the electroplating bath can be recovered and reused after appropriate chemical adjustment. The oxidative treatment method may be a continuous process or a batch process that is performed in a single pass. Residual organics, if desired and chloride ions in the bath are removed from the solution by a chemisorption or physisorption treatment. Inorganic contaminants are removed from the electroplating bath by selective ion exchange resins or electrodialysis, while particulate and suspended colloidal particles are removed by filtration before the treated plating bath is recycled.

Abstract: A process for coating a solid surface (42) with a conditioned liquid composition of substantially uniform thickness is provided. A liquid composition is conditioned by a) degassing either via vacuum or by sparging with a high kinematic viscosity gas; and b) substantially maintaining the viscosity of the liquid composition. The conditioned liquid may then be dispensed onto a solid surface (42) positioned in a sub-atmospheric environment (37) or in a helium-rich environment (37). The solid surface (42) is rotated so that the liquid composition forms a uniformly thick coating free from bubbles on the solid surface (42) and thereby produces a thin film of uniform thickness.

Abstract: The present invention provides a system and method for selectively removing organic and inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or in conjunction with a catalyst to oxidize organic contaminants in the plating bath to a level such that the electroplating bath can be recovered and reused after appropriate chemical adjustment. The oxidative treatment method may be a continuous process or a batch process that is performed in a single pass and the endpoint of the oxidative process detected by a sensor. Residual organics, and chloride ions in the bath are removed from the solution by a chemisorption or physisorption treatment. Inorganic contaminants are removed from the electroplating bath by selective ion exchange resins or electrodialysis, while particulate and suspended colloidal particles are removed by filtration before the treated plating bath is recycled.

Abstract: A device for measuring moisture concentration in a gas is provided which includes a sensing device capable of producing physical response to an energy input and having at least one surface coated with a metal hydroxide capable of adsorbing moisture. The metal hydroxide is derived from a metal coating on the sensing device.