Patents by Inventor John Edmond
John Edmond has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11518931Abstract: A method for minimizing the creation and existence of frac hits in an oil field comprising the step of pumping treatment fluids into the Parent well before performing the frac on the Child well wherein the treatment fluids contain brine resistant silica nanoparticles is described and claimed.Type: GrantFiled: January 29, 2020Date of Patent: December 6, 2022Assignee: Nissan Chemical America CorporationInventors: Joshua Edward Duncan, Juergen M. Lukas, James Christian Dale Rankin, John Edmond Southwell, Edwin Ray Templeton
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Patent number: 11512070Abstract: Provided herein are 6-carboxylic acids of benzimidazoles and 4-aza-, 5-aza-, 7-aza- and 4,7-diaza-benzimidazoles as GLP-1R agonists, processes to make said compounds, and methods comprising administering said compounds to a mammal in need thereof.Type: GrantFiled: October 30, 2020Date of Patent: November 29, 2022Assignee: Pfizer Inc.Inventors: Gary Erik Aspnes, Scott W. Bagley, John M. Curto, Matthew S. Dowling, David Edmonds, Mark E. Flanagan, Kentaro Futatsugi, David A. Griffith, Kim Huard, Gajendra Ingle, Wenhua Jiao, Chris Limberakis, Alan M. Mathiowetz, David W. Piotrowski, Roger B. Ruggeri
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Publication number: 20220271017Abstract: At least one array of LEDs (e.g., in a flip chip configuration) is supported by a substrate having a light extraction surface overlaid with at least one lumiphoric material. Light segregation elements registered with gaps between LEDs are configured to reduce interaction between emissions of different LEDs and/or lumiphoric material regions to reduce scattering and/or optical crosstalk, thereby preserving pixel-like resolution of the resulting emissions. Light segregation elements may be formed by mechanical sawing or etching to define grooves or recesses in a substrate, and filling the grooves or recesses with light-reflective or light-absorptive material. Light segregation elements external to a substrate may be defined by photolithographic patterning and etching of a sacrificial material, and/or by 3D printing.Type: ApplicationFiled: May 10, 2022Publication date: August 25, 2022Inventors: John Edmond, Matthew Donofrio, Jesse Reiherzer, Peter Scott Andrews, Joseph G. Clark, Kevin Haberern
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Patent number: 11401454Abstract: A hydrocarbon formation treatment micellar solution fluid and its use in treating underperforming hydrocarbon formations is described and claimed. A hydrocarbon formation treatment micellar solution fluid wherein the micellar solution fluid comprises water, a non-terpene oil-based moiety, a brine resistant aqueous colloidal silica sol; and optionally a terpene or a terpenoid, wherein the brine resistant aqueous colloidal silica sol has silica particles with a surface that is functionalized with at least one moiety selected from the group consisting of a hydrophilic organosilane, a mixture of hydrophilic and hydrophobic organosilanes, or a polysiloxane oligomer, wherein the brine resistant aqueous colloidal silica sol passes at least two of three of these brine resistant tests: API Brine Visual, 24 Hour Seawater Visual and API Turbidity Meter, and wherein, when a terpene or terpenoid is present, the ratio of total water to terpene or terpenoid is at least about 15 to 1.Type: GrantFiled: April 12, 2021Date of Patent: August 2, 2022Assignee: Nissan Chemical America CorporationInventors: John Edmond Southwell, Yusra Khan Ahmad
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Patent number: 11387221Abstract: At least one array of LEDs (e.g., in a flip chip configuration) is supported by a substrate having a light extraction surface overlaid with at least one lumiphoric material. Light segregation elements registered with gaps between LEDs are configured to reduce interaction between emissions of different LEDs and/or lumiphoric material regions to reduce scattering and/or optical crosstalk, thereby preserving pixel-like resolution of the resulting emissions. Light segregation elements may be formed by mechanical sawing or etching to define grooves or recesses in a substrate, and filling the grooves or recesses with light-reflective or light-absorptive material. Light segregation elements external to a substrate may be defined by photolithographic patterning and etching of a sacrificial material, and/or by 3D printing.Type: GrantFiled: November 17, 2020Date of Patent: July 12, 2022Assignee: CREELED, INC.Inventors: John Edmond, Matthew Donofrio, Jesse Reiherzer, Peter Scott Andrews, Joseph G. Clark, Kevin Haberern
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Publication number: 20220213072Abstract: The present invention provides compounds of Formula XA-1, XA-2, XA-3, XA-4, XA-5, or XA-6, or metabolites of Compound 1 or metabolites of a compound of Formula I, PA-I, or PA-III, including compositions and salts thereof, which are useful in the prevention and/or treatment of a disease or disorder such as T2DM, obesity, or NASH, as well as analytical methods related to the administration of Compound 1 or a compound of Formula I, PA-1, or PA-III.Type: ApplicationFiled: December 9, 2021Publication date: July 7, 2022Applicant: Pfizer Inc.Inventors: Andrew John Bessire, David James Edmonds, David Andrew Griffith, Amit Sumant Kalgutkar, Timothy Frank Ryder
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Patent number: 11342313Abstract: At least one array of LEDs (e.g., in a flip chip configuration) is supported by a substrate having a light extraction surface overlaid with at least one lumiphoric material. Light segregation elements registered with gaps between LEDs are configured to reduce interaction between emissions of different LEDs and/or lumiphoric material regions to reduce scattering and/or optical crosstalk, thereby preserving pixel-like resolution of the resulting emissions. Light segregation elements may be formed by mechanical sawing or etching to define grooves or recesses in a substrate, and filling the grooves or recesses with light-reflective or light-absorptive material. Light segregation elements external to a substrate may be defined by photolithographic patterning and etching of a sacrificial material, and/or by 3D printing.Type: GrantFiled: November 17, 2020Date of Patent: May 24, 2022Assignee: CREELED, INC.Inventors: John Edmond, Matthew Donofrio, Jesse Reiherzer, Peter Scott Andrews, Joseph G. Clark, Kevin Haberern
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Patent number: 11332659Abstract: Provided herein are methods of increasing production from a hydrocarbon containing formation by adding a proppant to the formation, wherein a treatment fluid comprising a colloidal silica nanoparticle is added to the formation before, during or after the time the proppant is added to the formation.Type: GrantFiled: March 1, 2021Date of Patent: May 17, 2022Assignee: Nissan Chemical America CorporationInventors: John Edmond Southwell, Yusra Khan Ahmad, David Holcomb
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Publication number: 20220135871Abstract: A method for minimizing the creation and existence of frac hits in an oil field comprising the step of pumping treatment fluids into the Parent well before performing the frac on the Child well wherein the treatment fluids contain brine resistant silica nanoparticles is described and claimed.Type: ApplicationFiled: January 29, 2020Publication date: May 5, 2022Inventors: Joshua Edward DUNCAN, Juergen M. LUKAS, James Christian Dale RANKIN, John Edmond SOUTHWELL, Edwin Ray TEMPLETON
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Publication number: 20220126395Abstract: A crystalline material processing method includes forming subsurface laser damage at a first average depth position to form cracks in the substrate interior propagating outward from at least one subsurface laser damage pattern, followed by imaging the substrate top surface, analyzing the image to identify a condition indicative of presence of uncracked regions within the substrate, and taking one or more actions responsive to the analyzing. One potential action includes changing an instruction set for producing subsequent laser damage formation (at second or subsequent average depth positions), without necessarily forming additional damage at the first depth position. Another potential action includes forming additional subsurface laser damage at the first depth position.Type: ApplicationFiled: January 10, 2022Publication date: April 28, 2022Inventors: Matthew Donofrio, John Edmond, Harshad Golakia, Eric Mayer
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Patent number: 11274244Abstract: This invention describes and claims the stimulation of several Wolfcamp and Bone Springs targeted wells in the northern Delaware Basin using fracturing treatments and a new method employing relatively small pre-pad pill volumes of Brine Resistant Silicon Dioxide Nanoparticle Dispersions ahead of each stage of treatment have been successfully performed. The invention includes a method of extending an oil and gas system ESRV comprising the steps of adding a Brine Resistant Silicon Dioxide Nanoparticle Dispersion (“BRINE RESISTANT SDND”) to conventional oil well treatment fluids. The invention also includes a method of increasing initial production rates of an oil well by over 20.0% as compared to wells either not treated with the BRINE RESISTANT SDND technology or treated by conventional nano-emulsion surfactants. The Method focuses on the steps of adding a Brine Resistant Silicon Dioxide Nanoparticle Dispersion to conventional oil well treatment fluids.Type: GrantFiled: October 27, 2020Date of Patent: March 15, 2022Assignee: Nissan Chemical America CorporationInventors: David L. Holcomb, Yusra Khan Ahmad, John Edmond Southwell
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Patent number: 11219966Abstract: A crystalline material processing method includes forming subsurface laser damage at a first average depth position to form cracks in the substrate interior propagating outward from at least one subsurface laser damage pattern, followed by imaging the substrate top surface, analyzing the image to identify a condition indicative of presence of uncracked regions within the substrate, and taking one or more actions responsive to the analyzing. One potential action includes changing an instruction set for producing subsequent laser damage formation (at second or subsequent average depth positions), without necessarily forming additional damage at the first depth position. Another potential action includes forming additional subsurface laser damage at the first depth position.Type: GrantFiled: February 16, 2020Date of Patent: January 11, 2022Assignee: WOLFSPEED, INC.Inventors: Matthew Donofrio, John Edmond, Harshad Golakia, Eric Mayer
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Patent number: 11180692Abstract: This invention describes and claims the stimulation of several Wolfcamp and Bone Springs targeted wells in the northern Delaware Basin using fracturing treatments and a new method employing relatively small pre-pad pill volumes of Brine Resistant Silicon Dioxide Nanoparticle Dispersions ahead of each stage of treatment have been successfully performed. The invention includes a method of extending an oil and gas system ESRV comprising the steps of adding a Brine Resistant Silicon Dioxide Nanoparticle Dispersion (“BRINE RESISTANT SDND”) to conventional oil well treatment fluids. The invention also includes a method of increasing initial production rates of an oil well by over 20.0% as compared to wells either not treated with the BRINE RESISTANT SDND technology or treated by conventional nano-emulsion surfactants. The Method focuses on the steps of adding a Brine Resistant Silicon Dioxide Nanoparticle Dispersion to conventional oil well treatment fluids.Type: GrantFiled: October 27, 2020Date of Patent: November 23, 2021Assignee: Nissan Chemical America CorporationInventors: David L. Holcomb, Yusra Khan Ahmad, John Edmond Southwell
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Patent number: 11130906Abstract: A brine resistant silica sol is described and claimed. This brine resistant silica sol comprises an aqueous colloidal silica mixture that has been surface functionalized with at least one moiety selected from the group consisting of a monomeric hydrophilic organosilane, a mixture of monomeric hydrophilic organosilane(s) and monomeric hydrophobic organosilane(s), or a polysiloxane oligomer, wherein the surface functionalized brine resistant aqueous colloidal silica sol passes at least two of three of these brine resistant tests: API Brine Visual, 24 Hour Seawater Visual and API Turbidity Meter.Type: GrantFiled: December 19, 2019Date of Patent: September 28, 2021Assignee: Nissan Chemical America CorporationInventor: John Edmond Southwell
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Publication number: 20210238471Abstract: A hydrocarbon formation treatment micellar solution fluid and its use in treating underperforming hydrocarbon formations is described and claimed. A hydrocarbon formation treatment micellar solution fluid wherein the micellar solution fluid comprises water, a non-terpene oil-based moiety, a brine resistant aqueous colloidal silica sol; and optionally a terpene or a terpenoid, wherein the brine resistant aqueous colloidal silica sol has silica particles with a surface that is functionalized with at least one moiety selected from the group consisting of a hydrophilic organosilane, a mixture of hydrophilic and hydrophobic organosilanes, or a polysiloxane oligomer, wherein the brine resistant aqueous colloidal silica sol passes at least two of three of these brine resistant tests: API Brine Visual, 24 Hour Seawater Visual and API Turbidity Meter, and wherein, when a terpene or terpenoid is present, the ratio of total water to terpene or terpenoid is at least about 15 to 1.Type: ApplicationFiled: April 12, 2021Publication date: August 5, 2021Inventors: John Edmond SOUTHWELL, Yusra Khan AHMAD
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Publication number: 20210225652Abstract: A method for removing a portion of a crystalline material (e.g., SiC) substrate includes joining a surface of the substrate to a rigid carrier (e.g., >800 ?m thick), with a subsurface laser damage region provided within the substrate at a depth relative to the surface. Adhesive material having a glass transition temperature above 25° C. may bond the substrate to the carrier. The crystalline material is fractured along the subsurface laser damage region to produce a bonded assembly including the carrier and a portion of the crystalline material. Fracturing of the crystalline material may be promoted by (i) application of a mechanical force proximate to at least one carrier edge to impart a bending moment in the carrier; (ii) cooling the carrier when the carrier has a greater coefficient of thermal expansion than the crystalline material; and/or (iii) applying ultrasonic energy to the crystalline material.Type: ApplicationFiled: April 8, 2021Publication date: July 22, 2021Inventors: Matthew Donofrio, John Edmond, Hua-Shuang Kong, Elif Balkas
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Publication number: 20210222059Abstract: A method of increasing production from a hydrocarbon containing formation by adding a proppant to the formation, wherein a treatment fluid comprising a colloidal silica nanoparticle is added to the formation before, during or after the time the proppant is added to the formation is described and claimed.Type: ApplicationFiled: March 1, 2021Publication date: July 22, 2021Inventors: John Edmond SOUTHWELL, Yusra Khan AHMAD, David HOLCOMB
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Patent number: 11034056Abstract: Silicon carbide (SiC) wafers and related methods are disclosed that include intentional or imposed wafer shapes that are configured to reduce manufacturing problems associated with deformation, bowing, or sagging of such wafers due to gravitational forces or from preexisting crystal stress. Intentional or imposed wafer shapes may comprise SiC wafers with a relaxed positive bow from silicon faces thereof. In this manner, effects associated with deformation, bowing, or sagging for SiC wafers, and in particular for large area SiC wafers, may be reduced. Related methods for providing SiC wafers with relaxed positive bow are disclosed that provide reduced kerf losses of bulk crystalline material. Such methods may include laser-assisted separation of SiC wafers from bulk crystalline material.Type: GrantFiled: February 7, 2020Date of Patent: June 15, 2021Assignee: Cree, Inc.Inventors: Simon Bubel, Matthew Donofrio, John Edmond, Ian Currier
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Publication number: 20210170632Abstract: Silicon carbide (SiC) wafers and related methods are disclosed that include intentional or imposed wafer shapes that are configured to reduce manufacturing problems associated with deformation, bowing, or sagging of such wafers due to gravitational forces or from preexisting crystal stress. Intentional or imposed wafer shapes may comprise SiC wafers with a relaxed positive bow from silicon faces thereof. In this manner, effects associated with deformation, bowing, or sagging for SiC wafers, and in particular for large area SiC wafers, may be reduced. Related methods for providing SiC wafers with relaxed positive bow are disclosed that provide reduced kerf losses of bulk crystalline material. Such methods may include laser-assisted separation of SiC wafers from bulk crystalline material.Type: ApplicationFiled: February 18, 2021Publication date: June 10, 2021Inventors: Simon Bubel, Matthew Donofrio, John Edmond, Ian Currier
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Patent number: 11024501Abstract: A method for removing a portion of a crystalline material (e.g., SiC) substrate includes joining a surface of the substrate to a rigid carrier (e.g., >800 ?m thick), with a subsurface laser damage region provided within the substrate at a depth relative to the surface. Adhesive material having a glass transition temperature above 25° C. may bond the substrate to the carrier. The crystalline material is fractured along the subsurface laser damage region to produce a bonded assembly including the carrier and a portion of the crystalline material. Fracturing of the crystalline material may be promoted by (i) application of a mechanical force proximate to at least one carrier edge to impart a bending moment in the carrier; (ii) cooling the carrier when the carrier has a greater coefficient of thermal expansion than the crystalline material; and/or (iii) applying ultrasonic energy to the crystalline material.Type: GrantFiled: February 12, 2019Date of Patent: June 1, 2021Assignee: CREE, INC.Inventors: Matthew Donofrio, John Edmond, Hua-Shuang Kong, Elif Balkas