Abstract: In one aspect the present disclosure relates to a method of manufacturing a cryogenic pressure vessel. The method may include providing a metal lined, composite wrapped vessel which has a boss. The method may further include securing an inlet to the boss, and then encapsulating the metal lined, composite wrapped vessel within a metallic layer in a vacuum controlled environment to form an encapsulated inner tank subassembly. The method may further include securing at least one support to an exterior of the encapsulated inner tank subassembly, and within the controlled vacuum environment, applying a metal coating over the encapsulated inner tank subassembly and the at least one support to form a metal coated, encapsulated inner tank subassembly. The method may further include, within the controlled vacuum environment, encapsulating the metal coated, encapsulated inner tank subassembly within a metallic vacuum jacket, which forms the cryogenic pressure vessel.

Abstract: In one aspect the present disclosure relates to a method of manufacturing a cryogenic pressure vessel. The method may include providing a metal lined, composite wrapped vessel which has a boss. The method may further include securing an inlet to the boss, and then encapsulating the metal lined, composite wrapped vessel within a metallic layer in a vacuum controlled environment to form an encapsulated inner tank subassembly. The method may further include securing at least one support to an exterior of the encapsulated inner tank subassembly, and within the controlled vacuum environment, applying a metal coating over the encapsulated inner tank subassembly and the at least one support to form a metal coated, encapsulated inner tank subassembly. The method may further include, within the controlled vacuum environment, encapsulating the metal coated, encapsulated inner tank subassembly within a metallic vacuum jacket, which forms the cryogenic pressure vessel.

Abstract: The invention relates to a putter head for a golf putter and to a golf putter that includes the putter head and a putter shaft secured to the putter head. The putter head includes a first head part, that defines the striking face of the putter, and a second head part that is located operatively rearwardly of the first head part and that is displaceable on guide rods with respect to the first head part along a line extending substantially perpendicularly to the striking face defined by the first head part. Securing screws displaceable within the second head part can engage the respective guide rods for securing the location of the head parts with respect to one another.

Abstract: The present invention relates to a method and system for automatically focusing an electron beam. Such an invention is based on a Faraday Cup diagnostic system, often a Modified Faraday Cup (MFC) system that enables tomographic reconstruction of the beam so as to measure beam parameters. Such a reconstruction method and system is automated using a servo-feedback loop to determine, for example, power distributions of the beam so as to provide appropriate adjustments to system controls to enable desired beam focus conditions.

Abstract: A low power electron beam system can be utilized for micro welding, brazing, or heating a workpiece and as an imaging system for precise positioning of a micro electron beam with regard to a workpiece. A filament system produces a micro electron beam, which is then focused onto the workpiece. In the welding mode, the micro electron beam is used to melt the workpiece and produce a weld. When switched to the imaging mode, the backscattered or secondary electrons produced by the interaction between the micro electron beam and the work piece are captured and converted into an image of the workpiece. The resulting image formed from these captured electrons is used as an aid in the precise positioning of the micro electron beam and inspection of the workpiece.

Abstract: The present invention relates to a probe for determining the orientation of electron beams being profiled. To accurately time the location of an electron beam, the probe is designed to accept electrons from only a narrowly defined area. The signal produced from the probe is then used as a timing or triggering fiducial for an operably coupled data acquisition system. Such an arrangement eliminates changes in slit geometry, an additional signal feedthrough in the wall of a welding chamber and a second timing or triggering channel on a data acquisition system. As a result, the present invention improves the accuracy of the resulting data by minimizing the adverse effects of current slit triggering methods so as to accurately reconstruct electron or ion beams.

Abstract: A system for characterizing high power electron beams at power levels of 10 kW and above is described. This system is comprised of a slit disk assembly having a multitude of radial slits, a conducting disk with the same number of radial slits located below the slit disk assembly, a Faraday cup assembly located below the conducting disk, and a start-stop target located proximate the slit disk assembly. In order to keep the system from over-heating during use, a heat sink is placed in close proximity to the components discussed above, and an active cooling system, using water, for example, can be integrated into the heat sink. During use, the high power beam is initially directed onto a start-stop target and after reaching its full power is translated around the slit disk assembly, wherein the beam enters the radial slits and the conducting disk radial slits and is detected at the Faraday cup assembly.

Abstract: An apparatus for characterization of a micro beam comprising a micro modified Faraday cup assembly including a first layer of material, a second layer of material operatively connected to the first layer of material, a third layer of material operatively connected to the second layer of material, and a fourth layer of material operatively connected to the third layer of material. The first layer of material comprises an electrical conducting material and has at least one first layer radial slit extending through the first layer. An electrical ground is connected to the first layer. The second layer of material comprises an insulating material and has at least one second layer radial slit corresponding to the first layer radial slit in the first layer of material. The second layer radial slit extends through the second layer. The third layer of material comprises a conducting material and has at least one third layer radial slit corresponding to the second layer radial slit in the second layer of material.