Abstract: A process for fabricating an electrostatic chuck (20) comprising the steps of (c) forming a base (80) having an upper surface with cooling grooves (85) therein, the grooves sized and distributed for holding a coolant therein for cooling the base; and (d) pressure conforming an electrical insulator layer (45) to the grooves on the base by the steps of (i) placing the base into a pressure forming apparatus (25) and applying an electrical insulator layer over the grooves in the base; and (ii) applying a sufficiently high pressure onto the insulator layer to pressure conform the insulator layer to the grooves to form a substantially continuous layer of electrical insulator conformal to the grooves on the base.

Abstract: An electrostatic chuck (20) for holding a substrate (75) comprises (i) a base (80) having an upper surface (95) with grooves (85) therein, the grooves (85) sized and distributed for holding coolant for cooling a substrate (75), and (ii) a substantially continuous insulator film (45) conformal to the grooves (85) on upper surface (95) of the base (80). The base (80) can be electrically conductive and capable of serving as the electrode (50) of the chuck (20), or the electrode (50) can be embedded in the insulator film (45). The insulator film (45) has a dielectric breakdown strength sufficiently high that when a substrate (75) placed on the chuck (20) and electrically biased with respect to the electrode (50), electrostatic charge accumulates in the substrate (75) and in the electrode (50) forming an electrostatic force that attracts and holds the substrate (75) to the chuck (20).

Abstract: An erosion resistant electrostatic chuck 20 for holding a substrate 45 having a peripheral edge 50, in an erosive environment, comprises an electrostatic member 25 including (i) an electrode 30, and (ii) an insulator 35 covering the electrode. A barrier 55 is circumferentially disposed about the electrostatic member 25. The barrier 55 comprises a first contact surface 60 capable of being pressed against the peripheral edge 50 of the substrate 45 to form a seal around the substrate 45 to reduce exposure of the electrostatic member 25 of the chuck 20 to the erosive environment.

Abstract: An electrostatic chuck (20) for holding a substrate (40) in a process chamber (50) comprises a base (25) supporting a resilient insulator (30). The insulator (30) comprises (i) an electrode (35) embedded therein; (ii) a top surface (34) with a peripheral edge (32); and (iii) cooling grooves (45) for holding coolant in the top surface (34), the tips (125) of the cooling grooves (45) and the peripheral edge (32) of the insulator (30) defining an edge gap (130) having a width w. The width w of the edge gap (130) is sized sufficiently small that the coolant in the grooves (45) cools the perimeter (120) of the substrate (40) held on the chuck (20). The insulator (30) is sufficiently thick that when a substrate (40) is electrostatically held on the chuck (20) and coolant is held in the cooling grooves (45), the insulator (30) in the edge gap (130) resiliently conforms to the substrate (40) so that substantially no coolant leaks out from the tips (125) of the cooling grooves (45).

Abstract: An electrostatic chuck having reduced erosion in erosive process environments is described. The electrostatic chuck comprises an insulator with (i) an electrode therein, (ii) a central portion overlying the electrode, and adapted to support a substrate thereon, and (iii) a peripheral portion extending beyond the electrode. In one version of the invention, the central portion of the insulator is raised relative to the lower peripheral portion of the insulator, thereby defining a step having a height H, which is maintained at less than about 10 microns, to reduce erosion of the insulator. In another version of the chuck, the peripheral portion of the insulator extends beyond the electrode and has a width W, which is maintained at at least about 2 mm to reduce erosion of the insulator.

Abstract: An electrostatic chuck 20 for holding substrates 42 in a process chamber 40 containing a magnetic flux 43 comprises a base 22 having an upper surface adapted to support a substrate 42 thereon. An insulator 26 with an electrode 24 therein, is on the base 22. A magnetic shunt 34 comprising a ferromagnetic material is positioned (i) either on the base 22, or (ii) in the insulator 26, or (iii) directly below, and contiguous to, the base 22.

Abstract: By providing redundant interferometer laser-metering devices, either one of which is capable by itself of providing measurement data of the angular value .theta. of rotation of the X-Y movable stage of a wafer stepper about a vertical Z axis for use by a computer-controlled servo devices that controls the operation of the X-Y movable stage, the servo devices, in a calibration mode, may receive data of specific measurements defining the respective values of undesired departures from flatness or straightness of the nominally-plane mirror surfaces of the the X-Y movable stage. These specific measurements, which may be made quickly at any time without disturbing the stage's mirrors, will also include those departures induced only at the point of use of the mirror and permit the stored control data used by the computer-controlled servo devices to be modified in order to compensate for these undesired departures from flatness or straightness of the nominally-plane mirror surfaces of the X-Y movable stage.

Abstract: A dual voice coil shutter is disclosed. The shutter mechanism is utilized in a stepper system, a laser system, or other carefully channeled light device to provide for opening and closing upon an optical path. The present invention is particularly useful for controlling passage of light hitting a photoresistive wafer through a reticle in a stepper system.The present invention provides a shutter type mechanism rotatably mounted about a common axis where the mechanism includes a pair of blades having a scissors-like arrangement adapted to simultaneously open and close upon an optical path. A voice type coil means is provided for each of the blades such that when a DC electrical current is applied to the coils, a rotation of the blades is effected about a single axis of rotation in a predetermined period of time. The rotation of the coils is coplanar.

Abstract: The device accurately calculates, retains and digitally displays the average speeds of and/or distances traveled by a skier. These functions are performed non-mechanically thereby allowing the ski to perform naturally. The device can be easily installed upon and removed from the ski without the use of tools and can mount upon the ski without causing any permanent damage to the ski.