Patents by Inventor John F. Harmuth

John F. Harmuth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6960282
    Abstract: An apparatus in which opposed nozzle assemblies are utilized to clean residual material, such as a metallic paste, from an article, such as a screening mask. Each of the nozzle assemblies has a first set of nozzles for spraying a cleaning agent onto the article in a first pattern to first chemically and mechanically remove residual material from the article. At least one of the nozzle assemblies has a second set of nozzles for spraying a cleaning agent onto the article in a second pattern while simultaneously applying a voltage between the second set of nozzles and the article to then chemically and electrolytically remove the remaining residual material from the article.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: November 1, 2005
    Assignee: International Business Machines Corporation
    Inventors: Raschid Jose Bezama, John F. Harmuth, Jason Scott Miller, Randall Jason Werner
  • Publication number: 20030116428
    Abstract: An apparatus in which opposed nozzle assemblies are utilized to clean residual material, such as a metallic paste, from an article, such as a screening mask. Each of the nozzle assemblies has a first set of nozzles for spraying a cleaning agent onto the article in a first pattern to first chemically and mechanically remove residual material from the article. At least one of the nozzle assemblies has a second set of nozzles for spraying a cleaning agent onto the article in a second pattern while simultaneously applying a voltage between the second set of nozzles and the article to then chemically and electrolytically remove the remaining residual material from the article.
    Type: Application
    Filed: December 21, 2001
    Publication date: June 26, 2003
    Applicant: International Business Machines Corporation
    Inventors: Raschid Jose Bezama, John F. Harmuth, Jason Scott Miller, Randall Jason Werner
  • Patent number: 6351871
    Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
    Type: Grant
    Filed: June 17, 1999
    Date of Patent: March 5, 2002
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John T. Butler, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, James N. Humenik, John U. Knickerbocker, Daniel S. Mackin, Glenn A. Pomerantz, David E. Speed, Candace A. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 6280527
    Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: August 28, 2001
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John T. Butler, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, James N. Humenik, John U. Knickerbocker, Daniel S. Mackin, Glenn A. Pomerantz, David E. Speed, Candace A. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 6032683
    Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
    Type: Grant
    Filed: February 26, 1999
    Date of Patent: March 7, 2000
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, John U. Knickerbocker, David C. Long, Daniel S. Mackin, Glenn A. Pomerantz, Krishna G. Sachdev, David E. Speed, Candace A. Sullivan, Robert J. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 5916374
    Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
    Type: Grant
    Filed: February 9, 1998
    Date of Patent: June 29, 1999
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, John U. Knickerbocker, David C. Long, Daniel S. Mackin, Glenn A. Pomerantz, Krishna G. Sachdev, David E. Speed, Candace A. Sullivan, Robert J. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 5481675
    Abstract: A software asynchronous communication protocol between two computers allows the roles of master and slave to be switched between the computers, depending on the nature and direction of the communication. In order to avoid truncating bit strings transmitted between the computers due to a difference in the write/read cycles of the computers, the software incorporates a dwell to accommodate the slowest computer in the system.
    Type: Grant
    Filed: May 12, 1992
    Date of Patent: January 2, 1996
    Assignee: International Business Machines Corporation
    Inventors: Chris T. Kapogiannis, John F. Harmuth
  • Patent number: 5174201
    Abstract: An apparatus and method for screening a pattern of material onto a surface including detection of the instant of separation of the mask from the surface after screening. Particularly as applied to a process for making a multi-layer ceramic device with an automated apparatus, the screening process is speeded by initiating high speed movement immediately when the separation of the mask from the surface is complete. In a preferred embodiment, a shock absorber is used to limit the rate of change of motion of the mask and a sensor is placed directly on a portion of the shock absorber structure. Noise reduction is accomplished through differential sensing and thresholding to improve detection.
    Type: Grant
    Filed: June 7, 1991
    Date of Patent: December 29, 1992
    Assignee: International Business Machines Corporation
    Inventors: Gerald S. Andris, John P. Gauci, John F. Harmuth