Patents by Inventor John Futrell

John Futrell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HIGHWAY ALERT SAFETY KIT
    Publication number: 20140104057
    Abstract: HASK 10 is configured to alert other drivers on the highway to the presence of the stationary vehicle through the use of these major components and additional components. HASK 10 is also configured to assist other drivers to evade or avoid a hazardous condition by alerting other drivers of the stationary vehicle before other drivers reach the stationary vehicle.
    Type: Application
    Filed: May 11, 2012
    Publication date: April 17, 2014
    Applicant: THE FUTURE 33 LLC
    Inventor: John Futrell
  • METHOD AND DEVICE FOR CHECKING LITHOGRAPHY DATA
    Publication number: 20060235663
    Abstract: Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.
    Type: Application
    Filed: June 8, 2006
    Publication date: October 19, 2006
    Inventors: Husayn Alvarez-Gomariz, John Futrell
  • METHOD AND DEVICE FOR CHECKING LITHOGRAPHY DATA
    Publication number: 20060234140
    Abstract: Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.
    Type: Application
    Filed: June 8, 2006
    Publication date: October 19, 2006
    Inventors: Husayn Alvarez-Gomariz, John Futrell
  • Methods of forming patterned reticles
    Publication number: 20050008950
    Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
    Type: Application
    Filed: August 4, 2004
    Publication date: January 13, 2005
    Inventors: H. Dulman, William Stanton, John Futrell
  • Methods of forming patterned reticles
    Publication number: 20050008949
    Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
    Type: Application
    Filed: August 4, 2004
    Publication date: January 13, 2005
    Inventors: H. Dulman, William Stanton, John Futrell
  • Methods of forming patterned reticles
    Publication number: 20050008952
    Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
    Type: Application
    Filed: August 4, 2004
    Publication date: January 13, 2005
    Inventors: H. Dulman, William Stanton, John Futrell
  • Methods of forming patterned reticles
    Publication number: 20050008953
    Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
    Type: Application
    Filed: August 4, 2004
    Publication date: January 13, 2005
    Inventors: H. Dulman, William Stanton, John Futrell
  • Methods of forming patterned reticles
    Publication number: 20050008951
    Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
    Type: Application
    Filed: August 4, 2004
    Publication date: January 13, 2005
    Inventors: H. Dulman, William Stanton, John Futrell