Patents by Inventor John G. Long

John G. Long has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6309969
    Abstract: The invention is directed to the use of copper as via and interconnect structures for an integrated circuit. The process in accordance with a preferred embodiment produces an interconnect layer of continuous copper with superior adhesion while requiring only a minimum number of steps for its production. This process addresses the current need in semiconductor manufacturing for reliable and performance-oriented vias and interconnect structures, while not being susceptible to many of the problems which plague the use of aluminum for similar structures. Fabrication of an integrated circuit in accordance with a preferred embodiment of the invention begins with the formation of semiconductor devices on a silicon wafer. Next, an intermetallic dielectric layer (IDL) is formed by materials such as silicon dioxide (SiO2), polymide, or silicon nitride over the devices. This step is followed by the laying of a diffusion barrier layer on the IDL surface.
    Type: Grant
    Filed: November 3, 1998
    Date of Patent: October 30, 2001
    Assignee: The John Hopkins University
    Inventors: Gerko Oskam, Peter C. Searson, Philippe M. Vereecken, John G. Long, Peter M. Hoffmann
  • Publication number: 20010001081
    Abstract: The invention is directed to the use of copper as via and interconnect structures for an integrated circuit. The process in accordance with a preferred embodiment produces an interconnect layer of continuous copper with superior adhesion while requiring only a minimum number of steps for its production. This process addresses the current need in semiconductor manufacturing for reliable and performance-oriented vias and interconnect structures, while not being susceptible to many of the problems which plague the use of aluminum for similar structures. Fabrication of an integrated circuit in accordance with a preferred embodiment of the invention begins with the formation of semiconductor devices on a silicon wafer. Next, an intermetallic dielectric layer (IDL) is formed by materials such as silicon dioxide (SiO2), polymide, or silicon nitride over the devices. This step is followed by the laying of a diffusion barrier layer on the IDL surface.
    Type: Application
    Filed: December 12, 2000
    Publication date: May 10, 2001
    Inventors: Gerko Oskam, Peter C. Searson, Philippe M. Vereecken, John G. Long, Peter M. Hoffmann
  • Patent number: 4479713
    Abstract: An exposure mask for photographic material has a measuring wheel and two adjustable mask blades. Movement of the photographic material causes rotation of the wheel, which causes a switching member to rotate. Whenever the switching member reaches a given position it operates a switch and stops the transport of the material. Adjustment of one mask blade adjusts the rate of rotation of the switching member relative to that of the measuring wheel by adjusting the axial position of a frustoconical roller that rests on the measuring wheel and drives the switching member.
    Type: Grant
    Filed: April 27, 1983
    Date of Patent: October 30, 1984
    Assignee: Durst (U.K.) Limited
    Inventor: John G. Long
  • Patent number: 4400084
    Abstract: An exposure mask 9 for photographic material 4 includes a measuring wheel 23 and two adjustable mask blades 19 and 20. Movement of the photographic material 4 causes rotation of the wheel 23, which causes a switching member 34 to approach a switch 42. When the switching member 34 reaches the switch 42 it stops the transport of the material 4. Adjustment of one mask blade 20 adjusts the initial distance between the switching member 34 and the switch 42.
    Type: Grant
    Filed: December 7, 1981
    Date of Patent: August 23, 1983
    Assignee: Durst (U.K.) Limited
    Inventor: John G. Long
  • Patent number: 4239382
    Abstract: A photographic printing or enlarging apparatus incorporates a negative carrier, a lens stage, and a positioning device for positioning the lens stage toward and away from a negative carrier. The positioning device comprises a body and one or more push rods each of which is mounted on, and releasably secured to, the body for movement in the direction of its length. A selected push rod is positioned to engage the lens stage, or a part of the apparatus connected to the lens stage, to fix the position of the stage relative to the negative carrier in accordance with the predetermined setting of the selected push rod. The positioning device may incorporate a plurality of push rods or may incorporate a single push rod that may selectively be extended and locked in an extended position to contact a portion of the apparatus connected to the lens stage for fixing the distance between the lens stage and the negative carrier.
    Type: Grant
    Filed: April 30, 1979
    Date of Patent: December 16, 1980
    Assignee: Durst (U.K.) Ltd.
    Inventors: Keith Aston, John G. Long
  • Patent number: 4197001
    Abstract: Photographic processing apparatus is disclosed which consists of a plurality of removable partitions mounted in a frame to form compartments. Lining bags of flexible or semi-rigid plastics sheet material are disposed in the compartments to form watertight tanks for the processing liquids into which the photographic materials to be developed are dipped. There is also disclosed a flexible or semi-rigid plastics bag for use in the apparatus which includes an integral compartment in the region of its bottom provided with perforations wherethrough agitating gas passed into the compartment can pass into the processing liquid.
    Type: Grant
    Filed: April 8, 1977
    Date of Patent: April 8, 1980
    Assignee: Durst (UK) Ltd.
    Inventors: John G. Long, Roy Downing, Bernard P. E. Wolbarst
  • Patent number: 4132478
    Abstract: A light-diffuser for a photographic copier such as an enlarger incorporates a closely contacting parallel row of elongated glass rods held between a pair of tracks. The rods are preferably of heat-resistant glass of round cross section. An additional row of such rods may be disposed parallel to the first row and staggered therefrom to improve the diffusion of a beam of light passing through them.
    Type: Grant
    Filed: July 6, 1977
    Date of Patent: January 2, 1979
    Assignee: Durst (U.K.) Limited
    Inventors: John G. Long, Nicholas P. Watts