Abstract: By monitoring the output voltage of a mass flow controller (MFC) there is no way to detect when a MFC is starting to degrade (or beginning to fail) as long as the MFC output voltage is driven to match the MFC setpoint voltage. Only when the MFC actually fails, and the MFC output voltage is unable to be driven to match the MFC setpoint voltage, is the failure detectable. A predictive failure monitoring system for a mass flow controller (MFC) is disclosed which monitors the “valve voltage” of the MFC as well as the MFC output voltage. By knowing the normal relationship between the MFC setpoint voltage and the respective valve voltage, then degradation or other changes may be noticed before the MFC actually fails, and importantly, before production material is ruined by the failing MFC. Such a real-time monitoring capability may be transparently implemented as an add-on module between the MFC and the system controller for the MFC.

Abstract: A process run card encoded with bar-code information and providing controllers with scanners which can scan the bar-code information and configure the controller accordingly is disclosed. Such a system advantageously provides a semiconductor manufacturing system controller which minimizes or reduces the problems associated with having to reprogram controllers for various lots. Such a system also provides a mechanism for preventing the erroneous re-processing of semiconductor material which has already received a timed processing step.

Abstract: A polysilicon diffusion doping method which employs a deposited dopant-rich oxide layer with a highly uniform distribution of dopant atoms and thickness. Polysilicon layers 1,500 angstroms thick have been doped, achieving average resistance values of 60 ohms and non-uniformity values of 5 percent. Resistance values were measured using the four-point probe method with probe spacings of 0.10 cm. After a polysilicon layer has been formed upon a surface of a silicon wafer, a dopant-rich oxide layer is deposited upon the polysilicon layer at reduced pressure. The dopant-rich oxide layer is deposited, and serves as a source of dopant atoms during the subsequent diffusion process. The dopant-rich oxide layer is a phosphosilicate glass (PSG) including phosphorus pentoxide (P.sub.2 O.sub.5) and phosphorus trioxide (P.sub.2 O.sub.3) and deposited using a PECVD technique.

Abstract: A process run card encoded with bar-code information and providing controllers with scanners which can scan the bar-code information and configure the controller accordingly is disclosed. Such a system advantageously provides a semiconductor manufacturing system controller which minimizes or reduces the problems associated with having to reprogram controllers for various lots. Such a system also provides a mechanism for preventing the erroneous re-processing of semiconductor material which has already received a timed processing step.

Abstract: A temperature sensing system contains a plurality of thermocouple pairs which are connected to an interface. The interface contains a microprocessor and a memory and provides for fault tolerance within the system by comparing measurements from each thermocouple within a thermocouple pair to a predetermined threshold value. If the difference between the thermocouple readings is greater than the threshold value, a malfunction is identified and corrective action is taken. The system determines which thermocouple has malfunctioned by comparing the readings of each of the thermocouples to a projected value based on historical data contained in the memory. The thermocouple whose reading varies to the greatest degree from its associated projected value is identified as the malfunctioning thermocouple. The reading from the properly functioning thermocouple is then used to produce an output signal.

Abstract: Method and apparatus for a utility for monitoring, tracking and scheduling the performance of periodic activities in a manufacturing environment is disclosed. In a preferred embodiment, the monitor utility of present invention is a VAX-based menu-driven program that is used to schedule and track periodic activities. erformed on tools and machines, or "entities." In one aspect of the invention, a user may create a family of entities to be monitored and may schedule various monitor items to be performed in connection with each entity, which items may be "triggered" by the occurrence of a designated event a designated number of times or by the elapse of a designated period of time. In another aspect of the invention, the utility may be used easily to generate and display and/or print reports in various formats showing the status of monitor items for a particular family and/or entity.

Abstract: An improved wafer transfer and monitoring system is described which utilizes a robotic interface unit. The robotic interface unit includes at least one wafer storage location placed proximate to a wafer stepper unit. A robotic arm attached to the interface unit is moveable in three dimensions to move wafers between the wafer storage location and the wafer stepper unit. The robotic interface unit can be placed between a wafer stepper unit and a coater/developer unit to transfer wafers between each unit and to store and monitor wafers placed upon the units and/or upon the wafer storage location. Accordingly, the robotic interface unit can operate in a stand-alone configuration with the wafer stepper or can be integrated between a wafer stepper and a wafer coater/developer. By using a robotic arm, less contaminates are associated with the exposed and readily cleaned arm.