Abstract: A nickel-chromium alloy etching composition comprising sulfuric acid, a source of chloride ions, including hydrochloric acid or sodium, potassium or ammonium chloride, and a sulfur compound comprising a sulfur atom with an oxidation state between ?2 to +5, such as thiosulfate, sulfide, sulfite, bisulfite, metabisulfite and phosphorus pentasulfide that can efficiently remove nickel-chromium alloy in the presence of copper circuits is disclosed.

Abstract: A nickel-chromium alloy etching composition comprising sulfuric acid, a source of chloride ions, including hydrochloric acid or sodium, potassium or ammonium chloride, and a sulfur compound comprising a sulfur atom with an oxidation state between ?2 to +5, such as thiosulfate, sulfide, sulfite, bisulfite, metabisulfite and phosphorus pentasulfide that can efficiently remove nickel-chromium alloy in the presence of copper circuits is disclosed.

Abstract: A process for creating an image in a dry-film resist laminate. The dry-film resist laminate comprises in order, a peelable top layer, a layer of dry-film resist, a clear or translucent coating layer, and a peelable bottom layer. The top layer is peeled from the laminate and the laminate is applied to a surface using heat and pressure. Thereafter, an image is created in the layer of dry-film resist and the resist is developed to remove uncured portions of the layer of photoresist along with the clear or translucent coating layer.

Abstract: A UV curable, etch-resistant ink composition for ink jet printing of variable information on printed circuit boards and for printing the circuit boards themselves. The ink composition of the invention includes a novel thermal stabilizer for preventing the ink composition from hardening and gelling in the print head when heated.

Abstract: The invention relates to a method of providing two distinct photoimageable film compositions, in particular, two distinct dry film compositions, on a substrate. Each of the two photoimageable film compositions is selected to have a different developing speed and/or curing speed so that, after development, the top layer of photoimageable film overhangs the bottom layer of photoimageable film. A metal layer is subsequently deposited over the surface of the substrate. The overhang allows for the clean removal of the photoimageable film layers, without damage to the subsequently applied metal layer, because the overhang prevents the metal layer from making intimate contact with the photoimageable film layers along the interface of the substrate with the photoimageable film layers.

Abstract: The invention relates to a method of providing two distinct photoimageable film compositions, in particular, two distinct dry film compositions, on a substrate. Each of the two photoimageable film compositions is selected to have a different developing speed and/or curing speed so that, after development, the top layer of photoimageable film overhangs the bottom layer of photoimageable film. A metal layer is subsequently deposited over the surface of the substrate. The overhang allows for the clean removal of the photoimageable film layers, without damage to the subsequently applied metal layer, because the overhang prevents the metal layer from making intimate contact with the photoimageable film layers along the interface of the substrate with the photoimageable film layers.