Patents by Inventor John H. Coleman
John H. Coleman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6064511Abstract: Structured materials for photonic devices, at wavelengths of X-ray, ultraviolet, visible, infrared and microwave radiation, can be made using layer growth techniques. Such a structure can be made layer by layer, by homogeneous deposition followed by localized modification for refractive index differentiation. Alternatively, the structure can be made by simultaneous growth of regions whose refractive index differs. The structures can be used as selective bandpass filters, and in photovoltaic solar cells, for example.Type: GrantFiled: March 31, 1998Date of Patent: May 16, 2000Assignee: The Research Foundation of State University of New YorkInventors: Charles M. Fortmann, John H. Coleman, Serge Luryi, Ronald J. Tonucci
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Patent number: 5543634Abstract: In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting properties. Electrodes having concave and cylindrical configurations are used to produce a spacially varying electric field. Twin electrodes are used to enable the use of an AC power supply and collect a substantial part of the coating on the substrate. Solid semiconductor material is evaporated and sputtered into the glow discharge to control the discharge and improve the coating. Schottky barrier and solar cell structures are fabricated from the semiconductor coating. Activated nitrogen species is used to increase the barrier height of Schottky barriers.Type: GrantFiled: June 2, 1994Date of Patent: August 6, 1996Assignee: Plasma Physics Corp.Inventor: John H. Coleman
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Patent number: 5470784Abstract: In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting properties. Electrodes having concave and cylindrical configurations are used to produce a spacially varying electric field. Twin electrodes are used to enable the use of an AC power supply and collect a substantial part of the coating on the substrate. Solid semiconductor material is evaporated and sputtered into the glow discharge to control the discharge and improve the coating. Schottky barrier and solar cell structures are fabricated from the semiconductor coating. Activated nitrogen species is used to increase the barrier height of Schottky barriers.Type: GrantFiled: September 23, 1992Date of Patent: November 28, 1995Assignee: Plasma Physics Corp.Inventor: John H. Coleman
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Patent number: 5187115Abstract: In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting properties. Electrodes having concave and cylindrical configurations are used to produce a spacially varying electric field. Twin electrodes are used to enable the use of an AC power supply and collect a substantial part of the coating on the substrate. Solid semiconductor material is evaporated and sputtered into the glow discharge to control the discharge and improve the coating. Schottky barrier and solar cell structures are fabricated from the semiconductor coating. Activated nitrogen species is used to increase the barrier height of Schottky barriers.Type: GrantFiled: March 11, 1991Date of Patent: February 16, 1993Assignee: Plasma Physics Corp.Inventor: John H. Coleman
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Patent number: 5073804Abstract: In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting properties. Electrodes having concave and cylindrical configurations are used to produce a spacially varying electric field. Twin electrodes are used to enable the use of an AC power supply and collect a substantial part of the coating on the substrate. Solid semiconductor material is evaporated and sputtered into the glow discharge to control the discharge and improve the coating. Schottky barrier and solar cell structures are fabricated from the semiconductor coating. Activated nitrogen species is used to increase the barrier height of Schottky barriers.Type: GrantFiled: August 16, 1988Date of Patent: December 17, 1991Assignee: Plasma Physics Corp.Inventor: John H. Coleman
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Patent number: 5049523Abstract: In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting properties. Electrodes having concave and cylindrical configurations are used to produce a spacially varying electric field. Twin electrodes are used to enable the use of an AC power supply and collect a substantial part of the coating on the substrate. Solid semiconductor material is evaporated and sputtered into the glow discharge to control the discharge and improve the coating. Schottky barrier and solar cell structures are fabricated from the semiconductor coating. Activated nitrogen species is used to increase the barrier height of Schottky barriers.Type: GrantFiled: August 16, 1989Date of Patent: September 17, 1991Assignee: Plasma Physics Corp.Inventor: John H. Coleman
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Patent number: 4741801Abstract: Glow discharge method and apparatus useful for coating photoresponsive devices in the form of drums and plates are described. Improved photoresponsive devices using amorphous silicon which accepts a high surface voltage in the dark and discharges to a low residual voltage under illumination are also described.Type: GrantFiled: February 7, 1986Date of Patent: May 3, 1988Assignee: Plasma Physics Corp.Inventor: John H. Coleman
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Patent number: 4569719Abstract: Glow discharge method and apparatus useful for coating electrophotographic photoreceptors in the form of drums and plates are described. Improved photoreceptors using amorphous silicon which accepts a high surface voltage in the dark and discharges to a low residual voltage under illumination are also described.Type: GrantFiled: August 2, 1984Date of Patent: February 11, 1986Assignee: Plasma Physics CorporationInventor: John H. Coleman
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Patent number: 4484809Abstract: Glow discharge method and apparatus useful for coating electrophotographic photoreceptors in the form of drums and plates are described. Improved photoreceptors using amorphous silicon which accepts a high surface voltage in the dark and discharges to a low residual voltage under illumination are also described.Type: GrantFiled: July 17, 1981Date of Patent: November 27, 1984Assignee: Plasma Physics CorporationInventor: John H. Coleman
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Patent number: 4330182Abstract: Photovoltaic junctions useful for solar energy conversion and for electrophotographic image formation are fabricated from a layer of amorphous boron in contact with a layer of amorphous silicon. The amorphous boron is preferably deposited at a reduced temperature on the amorphous silicon; or, alternatively, the amorphous silicon is deposited on a boron-bearing body previously deposited on an opaque metallic substrate.Type: GrantFiled: April 9, 1980Date of Patent: May 18, 1982Assignee: Plasma Physics CorporationInventor: John H. Coleman
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Patent number: 4328258Abstract: In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting properties. Electrodes having concave and cylindrical configurations are used to produce a spacially varying electric field. Twin electrodes are used to enable the use of an AC power supply and collect a substantial part of the coating on the substrate. Solid semiconductor material is evaporated and sputtered into the glow discharge to control the discharge and improve the coating. Schottky barrier and solar cell structures are fabricated from the semiconductor coating. Activated nitrogen species is used to increase the barrier height of Schottky barriers.Type: GrantFiled: October 24, 1979Date of Patent: May 4, 1982Assignee: Plasma Physics Corp.Inventor: John H. Coleman
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Patent number: 4235284Abstract: A heat exchanger with an auxiliary cooling system capable of cooling a nuclear reactor should the normal cooling mechanism become inoperable. A cooling coil is disposed around vertical heat transfer tubes that carry secondary coolant therethrough and is located in a downward flow of primary coolant that passes in heat transfer relationship with both the cooling coil and the vertical heat transfer tubes. A third coolant is pumped through the cooling coil which absorbs heat from the primary coolant which increases the downward flow of the primary coolant thereby increasing the natural circulation of the primary coolant through the nuclear reactor.Type: GrantFiled: December 16, 1976Date of Patent: November 25, 1980Assignee: The United States of America as represented by the United States Department of EnergyInventor: John H. Coleman
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Patent number: 4226897Abstract: In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting properties. Electrodes having concave and cylindrical configurations are used to produce a spacially varying electric field. Twin electrodes are used to enable the use of an AC power supply and collect a substantial part of the coating on the substrate. Solid semiconductor material is evaporated and sputtered into the glow discharge to control the discharge and improve the coating. Schottky barrier and solar cell structures are fabricated from the semiconductor coating. Activated nitrogen species is used to increase the barrier height of Schottky barriers.Type: GrantFiled: December 5, 1977Date of Patent: October 7, 1980Assignee: Plasma Physics CorporationInventor: John H. Coleman
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Patent number: 4097384Abstract: Separation of U.sup.235 and U.sup.238 isotopes by converting a mixture of these isotopes to organic compounds or to silicon compounds and then irradiating the isotope compounds selectively to change their chemical (and/or physical) properties, thereby to facilitate separation. In a preferred embodiment of the invention the uranium compounds are selected from the group having a chemical moiety R bonded directly to the U atom, the U-R bond having a fundamental, overtone, or combination virbational absorption frequency between 900 and 1100 cm.sup.-1. The selected U mixture is then irradiated with a frequency-selective CO.sub.2 laser.Type: GrantFiled: March 22, 1976Date of Patent: June 27, 1978Assignees: Northwestern University, Plasma Physics CorporationInventors: John H. Coleman, Tobin J. Marks