Patents by Inventor John-Henry Lipian

John-Henry Lipian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030181607
    Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula:
    Type: Application
    Filed: October 15, 2002
    Publication date: September 25, 2003
    Inventors: Larry Funderburk Rhodes, Andrew Bell, R. Ravikiran, John C. Fondran, Saikumar Jayaraman, Brian Leslie Goodall, Richard A. Mimna, John-Henry Lipian
  • Patent number: 6528598
    Abstract: A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula EnNi(C6F5)2 wherein n is 1 or 2 and E represents a neutral electron donor ligand.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: March 4, 2003
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian
  • Patent number: 6525153
    Abstract: Polymers comprising polycyclic repeating units containing pendant anhydride moieties are disclosed. The polymer can be polymerized from polycycloolefins containing pendant anhydride moieties in the presence of a nickel containing single component catalyst. In optional embodiments the polycycloolefin monomer containing the pendant anhydride functionality can be copolymerized with other polycycloolefin monomers that contain pendant functional groups to yield random copolymer products.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: February 25, 2003
    Assignees: Sumitomo Bakelite Co., Ltd., International Business Machines Corp.
    Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian, Robert David Allen, Juliann Opitz, Thomas I. Wallow
  • Publication number: 20030023013
    Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula:
    Type: Application
    Filed: July 16, 2002
    Publication date: January 30, 2003
    Applicant: The B.F.Goodrich Company
    Inventors: John-Henry Lipian, Larry F. Rhodes, Brian L. Goodall, Andrew Bell, Richard A. Mimna, John C. Fondran, Saikumar Jayaraman, April D. Hennis, Christine N. Elia, Jennifer D. Polley, Ayusman Sen
  • Patent number: 6455650
    Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R′)zM(L′)x(L″)y]b[WCA]d wherein [(R′)zM(L′)x(L″)y] is a cation complex where M represents a Group 10 transition metal; R′ represents an anionic hydrocarbyl containing ligand; L′ represents a Group 15 neutral electron donor ligand; L″ represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.
    Type: Grant
    Filed: October 5, 1999
    Date of Patent: September 24, 2002
    Assignees: The B.F. Goodrich Company, The Penn State Research Foundation
    Inventors: John-Henry Lipian, Larry F. Rhodes, Brian L. Goodall, Andrew Bell, Richard A. Mimna, John C. Fondran, Saikumar Jayaraman, April D. Hennis, Christine N. Elia, Jennifer D. Polley, Ayusman Sen
  • Publication number: 20020052454
    Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula:
    Type: Application
    Filed: October 5, 1999
    Publication date: May 2, 2002
    Inventors: JOHN-HENRY LIPIAN, LARRY F. RHODES, BRIAN L. GOODALL, ANDREW BELL, RICHARD A. MIMNA, JOHN C. FONDRAN, SAIKUMAR JAYARAMAN, APRIL D. HENNIS, CHRISTINE N. ELIA, JENNIFER D. POLLEY, AYUSMAN SEN
  • Patent number: 6232417
    Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
    Type: Grant
    Filed: September 12, 1997
    Date of Patent: May 15, 2001
    Assignee: The B. F. Goodrich Company
    Inventors: Larry F Rhodes, Andrew Bell, Saikumar Jayaraman, John-Henry Lipian, Brian L. Goodall, Robert A. Shick