Abstract: Channel material is conformally deposited along sidewalls of one or more etched features of a mold stack in fabricating a three-terminal memory device. The channel material is deposited in recessed regions and non-recessed regions of the one or more etched features. A sacrificial liner is deposited on the channel material. A directional etch removes the sacrificial liner from non-recessed regions of the one or more etched features. An isotropic etch removes the channel material from non-recessed regions of the one or more etched features, leaving the channel material and the sacrificial liner intact in the recessed regions. The sacrificial liner is removed, leaving the channel material intact and isolated with minimal loss of channel material from over-etch.

Abstract: Assemblies, systems, and methods for inspecting vehicles are disclosed. An assembly can comprise one or more cameras, one or more light sources s, and a housing configured to attach to a railway. The one or more cameras can be configured to capture images in a generally vertical direction and can be located below a top surface of one or more ties of a railway when the inspection assembly is attached to the railway. The housing can comprise a base a base configured to at least partially support the one or more cameras and the one or more light sources and a shroud sloped downwardly in a direction extending away from the one or more cameras.

Abstract: Assemblies, systems, and methods for inspecting vehicles are disclosed. An assembly can comprise a first angled camera, a second angled camera, an upright camera, lights, and a housing configured to attach to a railway. The first angled camera can be oriented at least partially in a generally vertical direction and at least partially in a first horizontal direction, and directed to a first target region from a first viewpoint. The second angled camera can be oriented at least partially in the generally vertical direction and at least partially in a second horizontal direction, and directed to a second target region from a second viewpoint. The upright camera can be oriented substantially in a vertical direction, and configured to capture images of a third target region from a third viewpoint.

Abstract: Various embodiments herein relate to methods, apparatus, and systems for etching high aspect ratio features in dielectric material. The dielectric material is etched using a multi-layer or graded hardmask having at least two different compositions. Different etching regimes are used when the different portions of the hardmask are exposed. For example, a feature may be etched to a first depth at a first temperature while an upper portion of the hardmask is exposed, and then etched to a final depth at a second temperature while a lower portion of the hardmask is exposed, the second temperature being higher than the first temperature.

Abstract: An inspection assembly can comprise a first camera, a second camera, one or more lights, and a housing. The first camera can be angled at least partially in a vertical direction and at least partially in a horizontal direction to thereby be configured to capture images of a target region in a three-dimensional space from a first viewpoint. The second camera can be positioned apart from the first camera, angled at least partially in the vertical direction and at least partially in the horizontal direction, and directed to the target region from a second viewpoint that is different from the first viewpoint. The housing can comprise a base and a shroud and can be configured to attach to one or more rail ties and to at least partially envelop the first camera and the second camera.

Abstract: Assemblies, systems, and methods for inspecting vehicles are disclosed. An assembly can comprise a first angled camera, a second angled camera, an upright camera, lights, and a housing configured to attach to a railway between opposing rails. The first angled camera can be oriented at least partially in a vertical direction and at least partially in a first horizontal direction, and directed to a first target region from a first viewpoint. The second angled camera can be oriented at least partially in the vertical direction and at least partially in a second horizontal direction that is substantially opposite the first horizontal direction, and directed to a second target region from a second viewpoint. The upright camera can be oriented substantially in a vertical direction, and configured to capture images of a third target region from a third viewpoint.

Abstract: An inspection assembly can comprise a first camera, a second camera, one or more lights, and a housing. The first camera can be angled at least partially in a vertical direction and at least partially in a horizontal direction to thereby be configured to capture images of a target region in a three-dimensional space from a first viewpoint. The second camera can be positioned apart from the first camera, angled at least partially in the vertical direction and at least partially in the horizontal direction, and directed to the target region from a second viewpoint that is different from the first viewpoint. The housing can comprise a base and a shroud and can be configured to attach to one or more rail ties and to at least partially envelop the first camera and the second camera.

Abstract: Examples are disclosed that relate to etching features in a layer of silicon oxide doped with an etch rate-modifying dopant. One example provides a method of performing a memory device fabrication process. The method comprises placing a substrate in a processing chamber of a processing tool, the substrate comprising a first structure comprising alternating layers in a mold stack for a 3D memory structure, and the substrate also comprising a second structure comprising a silicon oxide layer doped with an etch rate-modifying dopant. The method further comprises controlling the processing tool to perform an etching cycle comprising etching at least a portion of a channel hole in the first structure of the substrate and at least a portion of a hole in the second structure of the substrate.

Abstract: Embodiments disclosed include autonomous robotic systems and methods for disinfecting an environment. An autonomous disinfecting system comprises, in a housing, a first unit comprising a first plurality of UV-C lamps attached to a first wireless base comprising a plurality of wheels. Preferably, the first unit further comprises a docking port for a second unit comprising a second plurality of UV-C lamps attached to a second wireless base, and a motion sensor configured to send a signal to a processing unit comprised in the autonomous disinfecting system wherein the processing unit is configured to shut down the system when it receives a signal indicating a detected movement.

Abstract: An inspection assembly can comprise a first camera, a second camera, one or more lights, and a housing. The first camera can be angled at least partially in a vertical direction and at least partially in a horizontal direction to thereby be configured to capture images of a target region in a three-dimensional space from a first viewpoint. The second camera can be positioned apart from the first camera, angled at least partially in the vertical direction and at least partially in the horizontal direction, and directed to the target region from a second viewpoint that is different from the first viewpoint. The housing can comprise a base and a shroud and can be configured to attach to one or more rail ties and to at least partially envelop the first camera and the second camera.

Abstract: Assemblies, systems, and methods for inspecting vehicles are disclosed. An assembly can comprise a first angled camera, a second angled camera, an upright camera, lights, and a housing configured to attach to a railway between opposing rails. The first angled camera can be oriented at least partially in a vertical direction and at least partially in a first horizontal direction, and directed to a first target region from a first viewpoint. The second angled camera can be oriented at least partially in the vertical direction and at least partially in a second horizontal direction that is substantially opposite the first horizontal direction, and directed to a second target region from a second viewpoint. The upright camera can be oriented substantially in a vertical direction, and configured to capture images of a third target region from a third viewpoint.

Abstract: Railcar inspection systems, methods, and apparatuses are disclosed, including a railcar inspection portal. The railcar inspection portal includes a physical structure positioned around a railroad track, and through which a railcar can travel. The railcar inspection portal can include wheel detection sensors along the railroad track for detecting the presence of a railcar passing over the sensors. The sensors can transmit signals, corresponding to railcars passing over the sensors, to computing devices for determining railcar speeds. The railcar inspection portal can include imaging devices configured to capture images and readings of railcars passing through the inspection portal. Based on a determined speed corresponding to a passing railcar, the computing devices can control the imaging devices to capture specific areas or components of the passing railcar, or individual cars thereon.

Abstract: Embodiments disclosed include autonomous robotic systems and methods for disinfecting an environment. An autonomous disinfecting system comprises, in a housing, a first unit comprising a first plurality of UV-C lamps attached to a first wireless base comprising a plurality of wheels. Preferably, the first unit further comprises a docking port for a second unit comprising a second plurality of UV-C lamps attached to a second wireless base, and a motion sensor configured to send a signal to a processing unit comprised in the autonomous disinfecting system wherein the processing unit is configured to shut down the system when it receives a signal indicating a detected movement.

Abstract: Methods for forming patterned multi-layer stacks including a metal-containing layer are provided herein. Methods involve using silicon-containing non-metal materials in a multi-layer stack including one sacrificial layer to be later removed and replaced with metal while maintaining etch contrast to pattern the multi-layer stack and selectively remove the sacrificial layer prior to depositing metal. Methods involve using silicon oxycarbide in lieu of silicon nitride, and a sacrificial non-metal material in lieu of a metal-containing layer, to fabricate the multi-layer stack, pattern the multi-layer stack, selectively remove the sacrificial non-metal material to leave spaces in the stack, and deposit metal-containing material into the spaces. Sacrificial non-metal materials include silicon nitride and doped polysilicon, such as boron-doped silicon.

Abstract: A layer of a chalcogenide material can be etched by providing a wafer having a layer of the chalcogenide material to a processing chamber, heating the wafer to a first temperature, modifying a surface of the layer of chalcogenide material by flowing a first chemical species comprising a fluoride or a chloride onto the wafer to create a modified layer of chalcogenide material while the wafer is at the first temperature, and removing the modified layer of chalcogenide material, without using a plasma, by flowing a second chemical species comprising a compound with a center atom that is aluminum, boron, silicon, or germanium, and with at least one chlorine, onto the wafer.

Abstract: Methods for forming patterned multi-layer stacks including a metal-containing layer are provided herein. Methods involve using silicon-containing non-metal materials in a multi-layer stack including one sacrificial layer to be later removed and replaced with metal while maintaining etch contrast to pattern the multi-layer stack and selectively remove the sacrificial layer prior to depositing metal. Methods involve using silicon oxycarbide in lieu of silicon nitride, and a sacrificial non-metal material in lieu of a metal-containing layer, to fabricate the multi-layer stack, pattern the multi-layer stack, selectively remove the sacrificial non-metal material to leave spaces in the stack, and deposit metal-containing material into the spaces. Sacrificial non-metal materials include silicon nitride and doped polysilicon, such as boron-doped silicon.

Abstract: Embodiments disclosed include autonomous robotic systems and methods for disinfecting an environment. An autonomous disinfecting system comprises, in a housing, a first unit comprising a first plurality of UV-C lamps attached to a first wireless base comprising a plurality of wheels. Preferably, the first unit further comprises a docking port for a second unit comprising a second plurality of UV-C lamps attached to a second wireless base, and a motion sensor configured to send a signal to a processing unit comprised in the autonomous disinfecting system wherein the processing unit is configured to shut down the system when it receives a signal indicating a detected movement.

Abstract: Methods and apparatuses for forming an encapsulation bilayer over a chalcogenide material on a semiconductor substrate are provided. Methods involve forming a bilayer including a barrier layer directly on chalcogenide material deposited using pulsed plasma plasma-enhanced chemical vapor deposition (PP-PECVD) and an encapsulation layer over the barrier layer deposited using plasma-enhanced atomic layer deposition (PEALD). In various embodiments, the barrier layer is formed using a halogen-free silicon precursor and the encapsulation layer deposited by PEALD is formed using a halogen-containing silicon precursor and a hydrogen-free nitrogen-containing reactant.

Abstract: A three-dimensional (3D) memory structure includes memory cells and a plurality of oxide layers and a plurality of word line layers. The plurality of oxide layers and the plurality of word line layers are alternately stacked in a first direction. A plurality of double channel holes extend through the plurality of oxide layers and the plurality of word line layers in the first direction. The plurality of double channel holes have a peanut-shaped cross-section in a second direction that is transverse to the first direction.

Abstract: Embodiments disclosed include autonomous robotic systems and methods for disinfecting an environment. An autonomous disinfecting system comprises, in a housing, a first unit comprising a first plurality of UV-C lamps attached to a first wireless base comprising a plurality of wheels. Preferably, the first unit further comprises a docking port for a second unit comprising a second plurality of UV-C lamps attached to a second wireless base, and a motion sensor configured to send a signal to a processing unit comprised in the autonomous disinfecting system wherein the processing unit is configured to shut down the system when it receives a signal indicating a detected movement.